Abstract

We utilized a microwave plasma reactor based on a surface-wave-sustained discharge for uniform coating of fused silica windows with polycrystalline diamond films. Grain size and average roughness as small as 30 and 2.2 nm, respectively, were obtained, resulting in a uniform loss of transparency of only 10% over the 190–800-nm band for as-deposited 1.5-µm-thick coatings. A pretreatment procedure provides a film coating with a surface resistance to scratching that is approximately a factor of 2 higher than that of bare fused silica.

© 1997 Optical Society of America

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