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High-wavelength-resolution extreme-ultraviolet multilayer mirror

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Abstract

Multilayer mirrors with a system wavelength resolution (λ/Δλ) as high as 30–50 are required for the diagnostics of cosmic plasmas with temperatures of 1–20 MK. Such a high wavelength resolution can be realized by increasing the number of layer pairs contributing to the reflectance, by selecting less-absorbing materials for both the reflector and the spacer, and by decreasing the thickness of the reflector. We have fabricated a multilayer mirror tuned to 284 Å with a silicon carbide reflector (20% thickness of the layer period) and an aluminum spacer and achieved λ/Δλ ∼ 26.8 with a peak reflectivity of ∼13.0%. This wavelength resolution is close to the value obtained with a numerical simulation and is considerably higher than the value obtained with the conventional Mo/Si multilayer.

© 1997 Optical Society of America

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