Abstract

Refractive indices and extinction coefficients have been calculated for 14 oxide and fluoride thin films over a wavelength range of 0.6–12 µm. Results from adhesion, abrasion, and humidity testing have been included to characterize the durability of each film. The data allow selection of the best oxide and fluoride materials for IR antireflection coatings, and detailed optical constants are provided for the coating design.

© 1997 Optical Society of America

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References

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  1. W. Black, J. Wales, “Materials for use in the fabrication of infrared interference filters,” Infrared Phys. 8, 209–222 (1968).
    [CrossRef]
  2. H. K. Pulker, “Characterization of optical thin films,” Appl. Opt. 18, 1969–1977 (1979).
    [CrossRef] [PubMed]
  3. H. A. Mcleod, Thin Film Optical Filters (McGraw-Hill, New York, 1989), pp. 503–508.
  4. K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), Chap. 11, pp.749–750.
  5. Vacuum Deposition Chemicals Evaporation Materials (Cerac Inc., Milwaukee, Wisc., 1988).
  6. Premium-Quality Fused Silica Low Expansion Material Code 7940 (Corning Glass Works, Corning, N.Y., 1990).
  7. CVD Materials (Morton International, Specialty Chemicals Group, Advanced Materials, Woburn, Mass.1990).
  8. E. D. Palik, Handbook of Optical Constants of Solids (Academic, New York, 1985), pp. 438–440.
  9. J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k, and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976).
    [CrossRef]
  10. “TFDesigner,” Version 10.0 (Thin Film Designer Software, Albuquerque, N.M., 1990).

1979

1976

J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k, and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976).
[CrossRef]

1968

W. Black, J. Wales, “Materials for use in the fabrication of infrared interference filters,” Infrared Phys. 8, 209–222 (1968).
[CrossRef]

Black, W.

W. Black, J. Wales, “Materials for use in the fabrication of infrared interference filters,” Infrared Phys. 8, 209–222 (1968).
[CrossRef]

Chopra, K. L.

K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), Chap. 11, pp.749–750.

Fillard, J. P.

J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k, and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976).
[CrossRef]

Gasiot, J.

J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k, and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976).
[CrossRef]

Manifacier, J. C.

J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k, and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976).
[CrossRef]

Mcleod, H. A.

H. A. Mcleod, Thin Film Optical Filters (McGraw-Hill, New York, 1989), pp. 503–508.

Palik, E. D.

E. D. Palik, Handbook of Optical Constants of Solids (Academic, New York, 1985), pp. 438–440.

Pulker, H. K.

Wales, J.

W. Black, J. Wales, “Materials for use in the fabrication of infrared interference filters,” Infrared Phys. 8, 209–222 (1968).
[CrossRef]

Appl. Opt.

Infrared Phys.

W. Black, J. Wales, “Materials for use in the fabrication of infrared interference filters,” Infrared Phys. 8, 209–222 (1968).
[CrossRef]

J. Phys. E

J. C. Manifacier, J. Gasiot, J. P. Fillard, “A simple method for the determination of the optical constants n, k, and the thickness of a weakly absorbing thin film,” J. Phys. E 9, 1002–1004 (1976).
[CrossRef]

Other

“TFDesigner,” Version 10.0 (Thin Film Designer Software, Albuquerque, N.M., 1990).

H. A. Mcleod, Thin Film Optical Filters (McGraw-Hill, New York, 1989), pp. 503–508.

K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), Chap. 11, pp.749–750.

Vacuum Deposition Chemicals Evaporation Materials (Cerac Inc., Milwaukee, Wisc., 1988).

Premium-Quality Fused Silica Low Expansion Material Code 7940 (Corning Glass Works, Corning, N.Y., 1990).

CVD Materials (Morton International, Specialty Chemicals Group, Advanced Materials, Woburn, Mass.1990).

E. D. Palik, Handbook of Optical Constants of Solids (Academic, New York, 1985), pp. 438–440.

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Tables (3)

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Table 1 Durability Test Results for Films on GaAs Substrates

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Table 2 Index of Refraction and Extinction Coefficients from 0.6 to 12.0 µm

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Table 3 Index of Refraction and Extinction Coefficients from 0.6 to 12.0 µm

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