Abstract

TiO2–SiO2 multilayer dielectric stacks that were deposited by ion-beam sputtering were found to have a granular structure. The grains were in the TiO2 layers rather than in the SiO2 layers. Their formation was due to the heating of the film during deposition. When the apparatus was modified to reduce the substrate temperature, the granularity was eliminated.

© 1996 Optical Society of America

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