Abstract

Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.

© 1996 Optical Society of America

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  1. N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
    [CrossRef]
  2. T. Izawa, N. Yamamura, R. Uchimura, T. Yakuoh, “Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm,” in Laser-Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 297–308 (1994).
  3. T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).
  4. R. Chow, M. R. Kozlowski, G. E. Loomis, F. Rainer, “Damage thresholds of fluoride multilayers at 355 nm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 312–321 (1992).
  5. M. R. Kozlowski, C. R. Wolfe, M. Staggs, J. H. Campbell, “Large area laser conditioning of dielectric thin film mirrors,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 376–390 (1990).
    [CrossRef]
  6. C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
    [CrossRef]
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  8. M. Staggs, M. Balooch, M. R. Kozlowski, W. Siekhaus, “In-situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings,” in Laser-Induced Damage in Optical Materials: 1991, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1624, 375–385 (1991).
  9. L. Sheehan, M. Kozlowski, F. Rainer, M. Staggs: “Large-area conditioning of optics for high-power laser systems,” in Laser Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 559–568 (1993).
  10. M. R. Kozlowski, I. M. Thomas, “Future trends in optical coatings for high-power laser applications,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 54–59 (1994).
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  12. M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
    [CrossRef]
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  14. J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).
  15. M. Rahe, D. Ristau, H. Schmidt, “The effect of hydrogen concentration in conventional and IAD coatings on the absortion and laser-induced damage at 10.6 μm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 335–348 (1992).
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  18. K. Mann, H. Gerhardt, “Damage testing of optical components for high power excimer lasers,” in Excimer Lasers and Applications III, T. Letardi, L. Laude, eds., Proc. SPIE1503, 176–184 (1991).
  19. K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).
  20. “Test method for absorptance of optical laser components,” ISO/FDIS 11551 (International Organization for Standardization, Geneva, 1995).
  21. P. Weissbrodt, L. Raupach, E. Hacker, “Improved method for contamination control during fabrication of space equipment,” in Space Optics 1994: Space Instrumentation and Spacecraft Optics, T. Dewandre, J. Schulte-in-den-Bäumen, E. Sein, eds., Proc. SPIE2209, 672–680 (1994).
  22. M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
    [CrossRef]
  23. H. L. Gao, N. Y. Wang, “Possible damage mechanism of the dielectric coatings of a KrF laser,” Appl. Opt. 32, 7084–7088 (1993).
    [CrossRef] [PubMed]
  24. U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).
  25. U. Kaiser, N. Kaiser, “C-adsorption behaviour of thin fluoride films,” Thin Solid Films 237, 250–254 (1994).
    [CrossRef]
  26. E. Eva, K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).
    [CrossRef]
  27. A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

1996 (1)

E. Eva, K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).
[CrossRef]

1994 (2)

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

U. Kaiser, N. Kaiser, “C-adsorption behaviour of thin fluoride films,” Thin Solid Films 237, 250–254 (1994).
[CrossRef]

1993 (1)

1990 (1)

M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
[CrossRef]

1989 (1)

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Anton, B.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

Bakshi, M. H.

M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
[CrossRef]

Balooch, M.

M. Staggs, M. Balooch, M. R. Kozlowski, W. Siekhaus, “In-situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings,” in Laser-Induced Damage in Optical Materials: 1991, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1624, 375–385 (1991).

Bodemann, A.

A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

Campbell, J.

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

Campbell, J. H.

M. R. Kozlowski, C. R. Wolfe, M. Staggs, J. H. Campbell, “Large area laser conditioning of dielectric thin film mirrors,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 376–390 (1990).
[CrossRef]

Cecere, M. A.

M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
[CrossRef]

Chow, R.

R. J. Tench, M. R. Kozlowski, R. Chow, “Defect geometries and laser-induced damage in multilayer coatings,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 60–66 (1994).

R. Chow, M. R. Kozlowski, G. E. Loomis, F. Rainer, “Damage thresholds of fluoride multilayers at 355 nm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 312–321 (1992).

Deacon, D. A. G.

M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
[CrossRef]

Ebert, J.

J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).

Endo, A.

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Eva, E.

E. Eva, K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).
[CrossRef]

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

K. Mann, E. Eva, A. Hopfmüller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 731–742 (1994).

Fauchet, A. M.

M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
[CrossRef]

Gao, H. L.

Gerhardt, H.

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 39–46 (1989).

K. Mann, H. Gerhardt, “Damage testing of optical components for high power excimer lasers,” in Excimer Lasers and Applications III, T. Letardi, L. Laude, eds., Proc. SPIE1503, 176–184 (1991).

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

Gonzales, R. P.

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

Gorzellik, P.

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

Hacker, E.

U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).

A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

P. Weissbrodt, L. Raupach, E. Hacker, “Improved method for contamination control during fabrication of space equipment,” in Space Optics 1994: Space Instrumentation and Spacecraft Optics, T. Dewandre, J. Schulte-in-den-Bäumen, E. Sein, eds., Proc. SPIE2209, 672–680 (1994).

Hashimoto, I.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

Hopfmüller, A.

K. Mann, E. Eva, A. Hopfmüller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 731–742 (1994).

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

Itoh, M.

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Izawa, T.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

T. Izawa, N. Yamamura, R. Uchimura, T. Yakuoh, “Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm,” in Laser-Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 297–308 (1994).

Kaiser, N.

U. Kaiser, N. Kaiser, “C-adsorption behaviour of thin fluoride films,” Thin Solid Films 237, 250–254 (1994).
[CrossRef]

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).

A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

Kaiser, U.

U. Kaiser, N. Kaiser, “C-adsorption behaviour of thin fluoride films,” Thin Solid Films 237, 250–254 (1994).
[CrossRef]

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).

Kolbe, J.

J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).

Kozlowski, M.

L. Sheehan, M. Kozlowski, F. Rainer, M. Staggs: “Large-area conditioning of optics for high-power laser systems,” in Laser Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 559–568 (1993).

Kozlowski, M. R.

M. R. Kozlowski, M. Staggs, F. Rainer, J. Stathis, “Laser conditioning and electronic defects of HfO2 and SiO2 thin films,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 269–282 (1990).

R. J. Tench, M. R. Kozlowski, R. Chow, “Defect geometries and laser-induced damage in multilayer coatings,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 60–66 (1994).

M. R. Kozlowski, C. R. Wolfe, M. Staggs, J. H. Campbell, “Large area laser conditioning of dielectric thin film mirrors,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 376–390 (1990).
[CrossRef]

M. R. Kozlowski, I. M. Thomas, “Future trends in optical coatings for high-power laser applications,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 54–59 (1994).

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

M. Staggs, M. Balooch, M. R. Kozlowski, W. Siekhaus, “In-situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings,” in Laser-Induced Damage in Optical Materials: 1991, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1624, 375–385 (1991).

R. Chow, M. R. Kozlowski, G. E. Loomis, F. Rainer, “Damage thresholds of fluoride multilayers at 355 nm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 312–321 (1992).

Kuroda, K.

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Loomis, G. E.

R. Chow, M. R. Kozlowski, G. E. Loomis, F. Rainer, “Damage thresholds of fluoride multilayers at 355 nm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 312–321 (1992).

Mademann, D.

U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).

Mann, K.

E. Eva, K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).
[CrossRef]

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

K. Mann, E. Eva, A. Hopfmüller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 731–742 (1994).

K. Mann, H. Gerhardt, “Damage testing of optical components for high power excimer lasers,” in Excimer Lasers and Applications III, T. Letardi, L. Laude, eds., Proc. SPIE1503, 176–184 (1991).

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 39–46 (1989).

Matsumoto, Y.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

Morgan, A. J.

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

Müller, H.

J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).

Ogura, I.

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Rahe, M.

M. Rahe, D. Ristau, H. Schmidt, “The effect of hydrogen concentration in conventional and IAD coatings on the absortion and laser-induced damage at 10.6 μm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 335–348 (1992).

Rainer, F.

L. Sheehan, M. Kozlowski, F. Rainer, M. Staggs: “Large-area conditioning of optics for high-power laser systems,” in Laser Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 559–568 (1993).

M. R. Kozlowski, M. Staggs, F. Rainer, J. Stathis, “Laser conditioning and electronic defects of HfO2 and SiO2 thin films,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 269–282 (1990).

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

R. Chow, M. R. Kozlowski, G. E. Loomis, F. Rainer, “Damage thresholds of fluoride multilayers at 355 nm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 312–321 (1992).

Raupach, L.

A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

P. Weissbrodt, L. Raupach, E. Hacker, “Improved method for contamination control during fabrication of space equipment,” in Space Optics 1994: Space Instrumentation and Spacecraft Optics, T. Dewandre, J. Schulte-in-den-Bäumen, E. Sein, eds., Proc. SPIE2209, 672–680 (1994).

Ristau, D.

M. Rahe, D. Ristau, H. Schmidt, “The effect of hydrogen concentration in conventional and IAD coatings on the absortion and laser-induced damage at 10.6 μm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 335–348 (1992).

Schallenberg, U. B.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

Schild, R.

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

Schink, H.

J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).

Schmidt, H.

M. Rahe, D. Ristau, H. Schmidt, “The effect of hydrogen concentration in conventional and IAD coatings on the absortion and laser-induced damage at 10.6 μm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 335–348 (1992).

Sheehan, L.

L. Sheehan, M. Kozlowski, F. Rainer, M. Staggs: “Large-area conditioning of optics for high-power laser systems,” in Laser Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 559–568 (1993).

Siekhaus, W.

M. Staggs, M. Balooch, M. R. Kozlowski, W. Siekhaus, “In-situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings,” in Laser-Induced Damage in Optical Materials: 1991, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1624, 375–385 (1991).

Staggs, M.

M. Staggs, M. Balooch, M. R. Kozlowski, W. Siekhaus, “In-situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings,” in Laser-Induced Damage in Optical Materials: 1991, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1624, 375–385 (1991).

L. Sheehan, M. Kozlowski, F. Rainer, M. Staggs: “Large-area conditioning of optics for high-power laser systems,” in Laser Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 559–568 (1993).

M. R. Kozlowski, M. Staggs, F. Rainer, J. Stathis, “Laser conditioning and electronic defects of HfO2 and SiO2 thin films,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 269–282 (1990).

M. R. Kozlowski, C. R. Wolfe, M. Staggs, J. H. Campbell, “Large area laser conditioning of dielectric thin film mirrors,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 376–390 (1990).
[CrossRef]

Stathis, J.

M. R. Kozlowski, M. Staggs, F. Rainer, J. Stathis, “Laser conditioning and electronic defects of HfO2 and SiO2 thin films,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 269–282 (1990).

Stöffler, W.

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

Tench, R. J.

R. J. Tench, M. R. Kozlowski, R. Chow, “Defect geometries and laser-induced damage in multilayer coatings,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 60–66 (1994).

Thomas, I. M.

M. R. Kozlowski, I. M. Thomas, “Future trends in optical coatings for high-power laser applications,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 54–59 (1994).

Uchimura, R.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

T. Izawa, N. Yamamura, R. Uchimura, T. Yakuoh, “Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm,” in Laser-Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 297–308 (1994).

Uhlig, H.

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

Uwadano, Y.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

Wagner, H.

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

Wang, N. Y.

Watanabe, S.

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Weissbrodt, P.

U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).

A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

P. Weissbrodt, L. Raupach, E. Hacker, “Improved method for contamination control during fabrication of space equipment,” in Space Optics 1994: Space Instrumentation and Spacecraft Optics, T. Dewandre, J. Schulte-in-den-Bäumen, E. Sein, eds., Proc. SPIE2209, 672–680 (1994).

Welling, H.

J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).

Wolfe, C. R.

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

M. R. Kozlowski, C. R. Wolfe, M. Staggs, J. H. Campbell, “Large area laser conditioning of dielectric thin film mirrors,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 376–390 (1990).
[CrossRef]

Yakuoh, T.

T. Izawa, N. Yamamura, R. Uchimura, T. Yakuoh, “Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm,” in Laser-Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 297–308 (1994).

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

Yamamura, N.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

T. Izawa, N. Yamamura, R. Uchimura, T. Yakuoh, “Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm,” in Laser-Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 297–308 (1994).

Yano, M.

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

Appl. Opt. (1)

Appl. Phys. A (1)

E. Eva, K. Mann, “Calorimetric measurement of two-photon absorption and color-center formation in ultraviolet-window materials,” Appl. Phys. A 62, 143–149 (1996).
[CrossRef]

Nuclear Instrum. Methods Phys. Res. A (1)

M. H. Bakshi, M. A. Cecere, D. A. G. Deacon, A. M. Fauchet: “UV-photon induced absorption in multilayer dielectric mirrors,” Nuclear Instrum. Methods Phys. Res. A 296, 677–683 (1990).
[CrossRef]

Opt. Commun. (1)

M. Itoh, A. Endo, K. Kuroda, S. Watanabe, I. Ogura, “Laser-induced damage threshold and absorption measurements in rare-gas-halide excimer laser components,” Opt. Commun. 74, 253–260 (1989).
[CrossRef]

Thin Solid Films (2)

N. Kaiser, H. Uhlig, U. B. Schallenberg, B. Anton, U. Kaiser, K. Mann, E. Eva, “Very high damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers,” Thin Solid Films 260, 86–92 (1994).
[CrossRef]

U. Kaiser, N. Kaiser, “C-adsorption behaviour of thin fluoride films,” Thin Solid Films 237, 250–254 (1994).
[CrossRef]

Other (21)

U. Kaiser, N. Kaiser, P. Weissbrodt, D. Mademann, E. Hacker, “Investigation of inhomogeneities in fluoride coatings for high power excimer lasers,” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE1782, 426–434 (1992).

A. Bodemann, N. Kaiser, L. Raupach, P. Weissbrodt, E. Hacker, “248 nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy,” in Laser Induced Damage in Optical Materials: 1995, H. Bennett, M. Kozlaski, B. Newman, M. J. Solieu, eds. Proc. SPIE2714, 405–415 (1996).

T. Izawa, N. Yamamura, R. Uchimura, T. Yakuoh, “Damage thresholds and optical stabilities of fluoride HR coatings for 193 nm,” in Laser-Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 297–308 (1994).

T. Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Y. Uwadano, Y. Matsumoto, M. Yano, “Highly damage-resistant reflectors for 248 nm formed by fluoride multilayers,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 339–344 (1990).

R. Chow, M. R. Kozlowski, G. E. Loomis, F. Rainer, “Damage thresholds of fluoride multilayers at 355 nm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 312–321 (1992).

M. R. Kozlowski, C. R. Wolfe, M. Staggs, J. H. Campbell, “Large area laser conditioning of dielectric thin film mirrors,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 376–390 (1990).
[CrossRef]

C. R. Wolfe, M. R. Kozlowski, J. Campbell, F. Rainer, A. J. Morgan, R. P. Gonzales, “Laser conditioning of optical thin films,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 360–375 (1990).
[CrossRef]

M. R. Kozlowski, M. Staggs, F. Rainer, J. Stathis, “Laser conditioning and electronic defects of HfO2 and SiO2 thin films,” in Laser-Induced Damage in Optical Materials: 1990, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1441, 269–282 (1990).

M. Staggs, M. Balooch, M. R. Kozlowski, W. Siekhaus, “In-situ atomic force microscopy of laser-conditioned and laser-damaged HfO2/SiO2 dielectric mirror coatings,” in Laser-Induced Damage in Optical Materials: 1991, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1624, 375–385 (1991).

L. Sheehan, M. Kozlowski, F. Rainer, M. Staggs: “Large-area conditioning of optics for high-power laser systems,” in Laser Induced Damage in Optical Materials: 1993, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE2114, 559–568 (1993).

M. R. Kozlowski, I. M. Thomas, “Future trends in optical coatings for high-power laser applications,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 54–59 (1994).

R. J. Tench, M. R. Kozlowski, R. Chow, “Defect geometries and laser-induced damage in multilayer coatings,” in Optical Thin Films IV: New Developments, J. D. Rancourt, ed., Proc. SPIE2262, 60–66 (1994).

K. Mann, E. Eva, A. Hopfmüller, “Damage testing and characterization of dielectric coatings for high power excimer lasers,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 731–742 (1994).

J. Kolbe, H. Müller, H. Schink, H. Welling, J. Ebert, “Laser induced damage thresholds of dielectric coatings at 193 nm and correlations to optical constants and process parameters,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 404–416 (1989).

M. Rahe, D. Ristau, H. Schmidt, “The effect of hydrogen concentration in conventional and IAD coatings on the absortion and laser-induced damage at 10.6 μm,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1848, 335–348 (1992).

“Test method for laser induced damage threshold of optical surfaces. Part 1: 1-on-1 test,” ISO/DIS 11254-1 (International Organization for Standardization, Geneva, 1995); “Test method for laser induced damage threshold of optical surfaces. Part 2: S-on-1 test,” ISO/DIS 11254-2 (International Organization for Standardization, Geneva, 1995).

K. Mann, H. Gerhardt, “Automated damage testing facility for excimer laser optics,” in Laser-Induced Damage in Optical Materials: 1989, H. Bennett, L. Chase, A. Guenther, B. Newnam, M. J. Soileau, eds., Proc. SPIE1438, 39–46 (1989).

K. Mann, H. Gerhardt, “Damage testing of optical components for high power excimer lasers,” in Excimer Lasers and Applications III, T. Letardi, L. Laude, eds., Proc. SPIE1503, 176–184 (1991).

K. Mann, A. Hopfmüller, H. Gerhardt, P. Gorzellik, R. Schild, W. Stöffler, H. Wagner, “Monitoring and shaping of excimer laser beam profiles,” in Laser Energy Distribution Profiles: Measurement and Applications, J. Darchuk, ed., Proc. SPIE1834, 184–194 (1992).

“Test method for absorptance of optical laser components,” ISO/FDIS 11551 (International Organization for Standardization, Geneva, 1995).

P. Weissbrodt, L. Raupach, E. Hacker, “Improved method for contamination control during fabrication of space equipment,” in Space Optics 1994: Space Instrumentation and Spacecraft Optics, T. Dewandre, J. Schulte-in-den-Bäumen, E. Sein, eds., Proc. SPIE2209, 672–680 (1994).

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Figures (8)

Fig. 1
Fig. 1

Irradiation program used for laser conditioning and damage testing (see text).

Fig. 2
Fig. 2

Conditioning of LIDT (circles) and absorptance (squares) of e-beam coatings on crystalline quartz substrates. n indicates the number of pulses per fluence level used in R-on-1 conditioning.

Fig. 3
Fig. 3

Nonconditionable boat coating.

Fig. 4
Fig. 4

Absorption conditioning for various sets of irradiation parameters.

Fig. 5
Fig. 5

C 1s peak measured by XPS in conditioned and nonconditioned LaF3 surface regions; because of charge buildup on the dielectric surface, the peaks were shifted to 4.6-eV higher binding energies; the peaks at 284.7 eV stem from nonpolar C coverage of the Au mask.

Fig. 6
Fig. 6

La 3d5/2 peak measured by XPS in conditioned and non-conditioned LaF3 surface regions; because of charge buildup on the surface, the peaks were shifted to 4.6-eV higher binding energies.

Fig. 7
Fig. 7

TEM micrograph of a C/Pt replica of a fracture edge from an unconditioned area of a LaF3/MgF2 HR system.

Fig. 8
Fig. 8

TEM micrograph of a C/Pt replica of a fracture edge from a conditioned area of a LaF3/MgF2 HR system; this area was R-on-1 conditioned up to the damage fluence of 7 J/cm2.

Tables (5)

Tables Icon

Table 1 Deposition Parameters of LaF3/MgF2 Coatings

Tables Icon

Table 2 Specifications of Laser Damage Test Facility

Tables Icon

Table 3 LIDT of Two LaF3/MgF2 248-nm HR Systems on Crystalline MgF2 Substratesa

Tables Icon

Table 4 Element Concentration in the Near-Surface Region of a LaF3 Layera

Tables Icon

Table 5 Surface Coverage of a LaF3 Layera

Equations (1)

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A ( D cum ) = A intr + A 0 exp ( - C D cum ) .

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