Abstract

Plasma ion-assisted deposition with an advanced plasma source was investigated to produce narrow-bandpass filters in the near-infrared spectral range for telecommunication applications. The multilayer coatings were qualified by the optical performance, the vacuum-to-air behavior, the temperature stability, and the film stress. TiO2/SiO2 and Ta2O5/SiO2 material combinations were used and compared. The coating system produced low absorbing multilayers with a very low coefficient of expansion and low stress. The coefficient of expansion was in the low 10−6 °C range, and film stress values in the range between 1 and 2 × 108 N/m2 were obtained. TiO2/SiO2 was the preferred material combination. The optical monitoring system allowed the production of bandpass filters with a performance close to that of the theoretical values.

© 1996 Optical Society of America

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References

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  1. Y. Fujii, “Wavelength demultiplexer that uses an interference filter and achromatic quater-wave plates,” Opt. Lett. 16, 345–347 (1991).
    [CrossRef] [PubMed]
  2. P. J. Martin, R. P. Netterfield, “Optical films produced by ion-based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. XXIII, Chap. 3.
    [CrossRef]
  3. K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991).
    [CrossRef]
  4. A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).
  5. G. Hass, R. E. Thun, Physics of Thin Films (Academic, New York, 1966), Vol. 3, pp. 219–253.

1991

Y. Fujii, “Wavelength demultiplexer that uses an interference filter and achromatic quater-wave plates,” Opt. Lett. 16, 345–347 (1991).
[CrossRef] [PubMed]

K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991).
[CrossRef]

Beisswenger, S.

A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).

Fujii, Y.

Götzelmann, R.

K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991).
[CrossRef]

A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).

Hass, G.

G. Hass, R. E. Thun, Physics of Thin Films (Academic, New York, 1966), Vol. 3, pp. 219–253.

Martin, P. J.

P. J. Martin, R. P. Netterfield, “Optical films produced by ion-based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. XXIII, Chap. 3.
[CrossRef]

Matl, K.

K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991).
[CrossRef]

A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).

Netterfield, R. P.

P. J. Martin, R. P. Netterfield, “Optical films produced by ion-based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. XXIII, Chap. 3.
[CrossRef]

Thun, R. E.

G. Hass, R. E. Thun, Physics of Thin Films (Academic, New York, 1966), Vol. 3, pp. 219–253.

Zöller, A.

K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991).
[CrossRef]

A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).

Mater. Sci. Eng. A

K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991).
[CrossRef]

Opt. Lett.

Other

P. J. Martin, R. P. Netterfield, “Optical films produced by ion-based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. XXIII, Chap. 3.
[CrossRef]

A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).

G. Hass, R. E. Thun, Physics of Thin Films (Academic, New York, 1966), Vol. 3, pp. 219–253.

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Figures (5)

Fig. 1
Fig. 1

Plasma IAD: principle of operation.

Fig. 2
Fig. 2

Four-cavity bandpass filter with 36 λ/4 layers: solid curve, measured transmission curve; dashed curve, calculated transmission curve.

Fig. 3
Fig. 3

Temperature behavior of a narrow-band two-cavity filter with TiO2/SiO2: solid curve, measured at room temperature; short-dashed curve, measured at 60 °C; long-dashed curve, measured at 100 °C.

Fig. 4
Fig. 4

Error simulation of a two-cavity narrow-bandpass filter: solid curve, without errors; dashed curve, 0.1% thickness error of the second spacer.

Fig. 5
Fig. 5

Two-cavity filter measured with (a) a Lambda-9 spectrophotometer, (b) a fiber-optic system.

Tables (1)

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Table 1 Summary of the Results of Different Layer Systems

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