Abstract

The dispersive refractive index n(λ) and thickness d of chalcogenide glass thin films are usually calculated from measurements of both optical transmission and wavelength values. Many factors can influence the transmission values, leading to large errors in the values obtained for n(λ) and d. A novel optical method is used to derive n(λ) and d for AsSe semiconducting glass thin films deposited by thermal evaporation in the spectral region where k ² ≪ n ², using only wavelength values. This entails obtaining two transmission spectra: one at normal incidence and another at oblique incidence. The procedure yields values for the refractive index and average thickness of thermally evaporated chalcogenide films to an accuracy better than 3%.

© 1995 Optical Society of America

Determining refractive index and thickness of thin films from wavelength measurements only

R. Swanepoel
J. Opt. Soc. Am. A 2(8) 1339-1343 (1985)

Simultaneous measurement of the refractive index and thickness of thin films by S-polarized reflectances

Tami Kihara and Kiyoshi Yokomori
Appl. Opt. 31(22) 4482-4487 (1992)

Determination of the optical constants and thickness of thin films on slightly absorbing substrates

Rusli and G. A. J. Amaratunga
Appl. Opt. 34(34) 7914-7924 (1995)

Determining the refractive index and thickness of thin films from prism coupler measurements

Steven T. Kirsch
Appl. Opt. 20(12) 2085-2089 (1981)

Determination of refractive index, thickness, and the optical losses of thin films from prism-film coupling measurements

Julien Cardin and Dominique Leduc
Appl. Opt. 47(7) 894-900 (2008)