Abstract

As the demands of lithographic fabrication of computer chips push toward ever-decreasing feature sizes, projection extreme-ultraviolet (EUV) lithography becomes an increasingly attractive technology. The radiation source of choice for this approach is a laser plasma with a high repetition rate. We report an investigation of a new candidate laser plasma source for EUV lithography that is based on line emission from ice-water targets. This radiation source has the potential to meet all the strict requirements of EUV conversion, debris elimination, operation, and cost for a demonstration lithographic system.

© 1995 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
13.5 nm EUV generation from tin-doped droplets using a fiber laser

Simi A. George, Kai-Chung Hou, Kazutoshi Takenoshita, Almantas Galvanauskas, and Martin C. Richardson
Opt. Express 15(25) 16348-16356 (2007)

Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography

Martin Richardson, William T. Silfvast, Howard A. Bender, Art Hanzo, Victor P. Yanovsky, Feng Jin, and Jerry Thorpe
Appl. Opt. 32(34) 6901-6910 (1993)

Mass-limited Sn target irradiated by dual laser pulses for an extreme ultraviolet lithography source

Y. Tao, M. S. Tillack, S. S. Harilal, K. L. Sequoia, R. A. Burdt, and F. Najmabadi
Opt. Lett. 32(10) 1338-1340 (2007)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (10)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Tables (1)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (4)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription