Abstract

Fabrication of very-narrow-bandpass optical tunable filters [(0.3 nm full width at half-maximum) (FWHM)] is reported. To improve the film densities, the O2 ion-assisted deposition-method is used in the fabrication. In the succession of high- and low-refractive-index layers, the commonly used TiO2 material is replaced The relative thicknesses of the by Ta2O5, which suits the ion-assisted fabrication technique. filter multilayer structure of 1/2/1 are modified to 0.998/2.007/0.998, which reduces the shift difference in the central wavelengths with regard to the p and s polarizations when the filter is tilted. These improvements enabled fabrication of 0.3-nm-FWHM optical tunable filters with improved stability characteristics.

© 1994 Optical Society of America

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