Abstract

An electron-beam writing system that is characterized by a stationary electron beam and a continuously spinning table is proposed and developed for diffractive optic elements with axisymmetric patterns. This system allows us to fabricate continuously concentric or radialized high-density microgratings with effective areas over the electron-beam deflection limits. For a fine electron-dose distribution, we adopted multiple-revolution writing and electron-beam modulation. Several test gratings, including a rotary encoder disk with a 1.57-μm grating pitch and a 15-mm diameter and a blazed micro-Fresnel lens with a 4.5-mm diameter and a N.A. of 0.45, are successfully demonstrated with real-time data processing.

© 1994 Optical Society of America

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