Abstract

A block-quantized binary-phase hologram consisting of a binary-phase hologram and a phase mask is investigated for use in optical interconnection. A simulated annealing algorithm is used to determine the phase pattern of the binary hologram and the phase of the mask required to achieve high diffraction efficiency and suppression of unwanted spots. Block-quantized binary-phase holograms encoded with the simulated annealing algorithm are fabricated using electron-beam lithography and chemical etching. The results from the optical experiments that use these holograms agree well with those from the computer simulations.

© 1993 Optical Society of America

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