Abstract

Multilayers prepared with electrically isolated or grounded surfaces during deposition are shown to have dramatically different hard-x-ray, soft-x-ray, and neutron reflectivity characteristics. The effect has for 〈100〉 silicon wafers, fused silica, and borate glass substrates of different sizes and with been observed different surface roughness and flatness for multilayer structures prepared by rf and dc magnetron sputtering.

© 1993 Optical Society of America

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