Abstract
The design requirements for a compact electron storage ring that could be used as a soft-x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required for collecting and conditioning the radiation in divergence, uniformity, and direction to illuminate the mask correctly and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft-x-ray projection lithography system that uses an electron storage ring as a soft-x-ray source are presented. It is shown that, by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130-Å photons for production line projection x-ray lithography is possible.
© 1993 Optical Society of America
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