Abstract

This special issue contains a collection of papers describing results that were presented at the Second Topical Meeting on Soft-X-Ray Projection Lithography sponsored by the Optical Society of America and held 6–8 April 1992 in Monterey, California, along with several additional papers submitted after that meeting. These papers are being published in this collection to make them readily available to a larger audience than would normally occur with a proceedings and also to take advantage of the critical review process.

© 1993 Optical Society of America

Introduction to the LACA III Feature Issue of Applied Optics

Andrzej W. Miziolek, S. Randolph Long, and David R. Crosley
Appl. Opt. 32(6) 793-793 (1993)

Front-end design issues in soft-x-ray projection lithography

Natale M. Ceglio, Andrew M. Hawryluk, and Gary E. Sommargren
Appl. Opt. 32(34) 7050-7056 (1993)

Diffractive optics: an introduction to the feature

James R. Leger and G. Michael Morris
Appl. Opt. 32(14) 2481-2482 (1993)

Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography

Gary E. Sommargren and Lynn G. Seppala
Appl. Opt. 32(34) 6938-6944 (1993)

Wavelength considerations in soft-x-ray projection lithography

Andrew M. Hawryluk and Natale M. Ceglio
Appl. Opt. 32(34) 7062-7067 (1993)