Abstract

The photothermal deflection technique is used to study the infrared absorption of antireflection coatings on Ge and KCl substrates. The thin films deposited by the thermal resistance evaporation technique, both with and without ion-assisted deposition, are investigated. The experimental results show that Ar-ion bombardment with low energy can evidently reduce the absorption of the coatings.

© 1993 Optical Society of America

Measurements of absorption losses in TiO₂ films by a collinear photothermal deflection technique

Mireille Commandré and Emile Pelletier
Appl. Opt. 29(28) 4276-4283 (1990)

Broadband AR coatings on germanium substrates using ion-assisted deposition

Thomas I. Oh
Appl. Opt. 27(20) 4255-4259 (1988)

Absorption and thermal conductivity of oxide thin films measured by photothermal displacement and reflectance methods

Z. L. Wu, M. Reichling, X.-Q. Hu, K. Balasubramanian, and K. H. Guenther
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Ion beam processing for coating MgF₂ onto ambient temperature substrates

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Properties of dielectric coatings produced by ion assisted deposition

Pei-Fu Gu, Yen Ming Chen, Xue Qun Hu, and Jin-Fa Tang
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