Abstract

It is shown how light scattering provides a powerful tool for thin-film characterization. The introduction of a roughness isotropy degree permits the extraction of structural parameters of the stacks. Replication functions and residual roughnesses are given for TiO2, SiO2, and Ta2O5 materials produced by ion-assisted deposition and ion plating. Additional confirmation is given by measurements of scattering versus wavelength. The sensitivity of design to material and substrate effects is studied. At low-loss levels, surface and bulk phenomena are discussed together. Microstructure is characterized in the frequency bandwidth given by experiment.

© 1993 Optical Society of America

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