Abstract

The thermal stability of Mo–Si multilayers prepared by magnetron sputtering is studied. It is found that degradation of x-ray reflectivity of Mo–Si multilayers under heat loading is connected with the roughening of Mo–Si interfaces and the formation of compounds MoxSiy. To avoid these degradation mechanisms we fabricated and tested MoSi2–Si multilayers under heat loading. The MoSi2–Si multilayer appeared to be much more stable both in period and x-ray reflectivity because of thermodynamic equilibrium of the components MoSi2 and Si at the interface. The working temperature of MoSi2–Si multilayers reaches 1000 K.

© 1993 Optical Society of America

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