Abstract

The chopper mask of the new dayglow photometer has been redesigned for optimum performance. The minimum detectability improves at least by a factor of 2.

© 1992 Optical Society of America

Full Article  |  PDF Article

References

  • View by:
  • |
  • |
  • |

  1. R. Narayanan, J. N. Desai, N. K. Modi, R. Raghavarao, R. Sridharan, “Dayglow photometry: a new approach,” Appl. Opt. 28, 2138–2142 (1989).
    [CrossRef] [PubMed]
  2. R. Sridharan, R. Raghavarao, S. Gurubaran, R. Narayanan, “First results of OI 630.0 nm dayglow measurements from equatorial latitudes,” J. Atmos. Terr. Phys. (to be published).
  3. J. N. Desai, B. G. Anandarao, R. Raghavarao, “Photometer for detection of lithium release in daytime,” Appl. Opt. 18, 420–421 (1979).
    [CrossRef] [PubMed]

1989 (1)

1979 (1)

Anandarao, B. G.

Desai, J. N.

Gurubaran, S.

R. Sridharan, R. Raghavarao, S. Gurubaran, R. Narayanan, “First results of OI 630.0 nm dayglow measurements from equatorial latitudes,” J. Atmos. Terr. Phys. (to be published).

Modi, N. K.

Narayanan, R.

R. Narayanan, J. N. Desai, N. K. Modi, R. Raghavarao, R. Sridharan, “Dayglow photometry: a new approach,” Appl. Opt. 28, 2138–2142 (1989).
[CrossRef] [PubMed]

R. Sridharan, R. Raghavarao, S. Gurubaran, R. Narayanan, “First results of OI 630.0 nm dayglow measurements from equatorial latitudes,” J. Atmos. Terr. Phys. (to be published).

Raghavarao, R.

Sridharan, R.

R. Narayanan, J. N. Desai, N. K. Modi, R. Raghavarao, R. Sridharan, “Dayglow photometry: a new approach,” Appl. Opt. 28, 2138–2142 (1989).
[CrossRef] [PubMed]

R. Sridharan, R. Raghavarao, S. Gurubaran, R. Narayanan, “First results of OI 630.0 nm dayglow measurements from equatorial latitudes,” J. Atmos. Terr. Phys. (to be published).

Cited By

OSA participates in CrossRef's Cited-By Linking service. Citing articles from OSA journals and other participating publishers are listed here.

Alert me when this article is cited.


Figures (2)

Fig. 1
Fig. 1

Semicircular mask system used in the dayglow photometer by Narayanan et al.1

Fig. 2
Fig. 2

New improved mask system that eliminates the problem of overlap between the inner and outer zones.

Metrics