Abstract

Dielectric thin films often present microstructures that give rise to a variation of the refractive index with the distance from the substrate. We propose a method of analysis of ellipsometric data for homogeneous and slightly inhomogeneous films that are deposited on transparent substrates. Assuming a linear refractive-index gradient, we are able to determine not only the average index and the thickness but also the degree of inhomogeneity of the films by spectroscopic ellipsometry at variable angles of incidence. We apply this method to titanium dioxide films deposited on glass, which present different degrees of inhomogeneity depending on the preparation conditions.

© 1992 Optical Society of America

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