Abstract

Three-dimensional microlenses were fabricated on a quartz substrate by evaporating a quartz target with a focused CO2 laser beam. The size and shape of the deposit were determined primarily by a mask placed in front of the substrate. The spherical thickness profile required for a lens was obtained by adjusting the gas pressure in the cell. The lens was typically 0.25 mm in diameter with a focal length of 8 mm. The present method is particularly suited for fabrication of microlens arrays, and as a demonstration a 3 × 5 array was produced.

© 1992 Optical Society of America

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References

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  1. M. Kubo, M. Hanabusa, “Fabrication of microlenses by laser chemical vapor deposition,” Appl. Opt. 29, 2755–2759 (1990).
    [CrossRef] [PubMed]
  2. A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses,” J. Appl. Phys. 62, 3222–3227 (1987).
    [CrossRef]
  3. M. Hanabusa, “Photoinduced deposition of thin films,” Mater. Sci. Rep. 2, 51–98 (1987).
    [CrossRef]

1990 (1)

1987 (2)

A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses,” J. Appl. Phys. 62, 3222–3227 (1987).
[CrossRef]

M. Hanabusa, “Photoinduced deposition of thin films,” Mater. Sci. Rep. 2, 51–98 (1987).
[CrossRef]

Fukuda, Y.

A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses,” J. Appl. Phys. 62, 3222–3227 (1987).
[CrossRef]

Hanabusa, M.

M. Kubo, M. Hanabusa, “Fabrication of microlenses by laser chemical vapor deposition,” Appl. Opt. 29, 2755–2759 (1990).
[CrossRef] [PubMed]

A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses,” J. Appl. Phys. 62, 3222–3227 (1987).
[CrossRef]

M. Hanabusa, “Photoinduced deposition of thin films,” Mater. Sci. Rep. 2, 51–98 (1987).
[CrossRef]

Kubo, M.

Sugimura, A.

A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses,” J. Appl. Phys. 62, 3222–3227 (1987).
[CrossRef]

Appl. Opt. (1)

J. Appl. Phys. (1)

A. Sugimura, Y. Fukuda, M. Hanabusa, “Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses,” J. Appl. Phys. 62, 3222–3227 (1987).
[CrossRef]

Mater. Sci. Rep. (1)

M. Hanabusa, “Photoinduced deposition of thin films,” Mater. Sci. Rep. 2, 51–98 (1987).
[CrossRef]

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Figures (4)

Fig. 1
Fig. 1

Experimental arrangement that was used to fabricate microlenses by laser-induced vaporization.

Fig. 2
Fig. 2

Thickness profile of deposits produced under different pressures in the cell: (a) 5 × 10−5 Torr; (b) 5 × 10−3 Torr; (c) 1 × 10−2 Torr.

Fig. 3
Fig. 3

Thickness profile of a deposit that was obtained at a pressure of 3 × 10−2 Torr. The dashed curve represents the spherical shape of a lens.

Fig. 4
Fig. 4

A 3 × 5 microlens array; the profile was measured in the middle row along (a) three lenses and (b) five lenses.

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