Abstract

This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm × 3 μm at a distance of 11 μm from the lens facet.

© 1992 Optical Society of America

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