Abstract

A novel laser scatterometer linewidth measurement tool has been developed for critical dimension metrology of photomasks. Calculation of the linewidth is based on a rigorous theoretical model, thus eliminating the need for calibrations. In addition the effect of the glass substrate on which the photomask grating is placed is explicitly taken into account. The experimental arrangement consists of a chrome photomask diffraction grating that is illuminated with a laser. A rigorous theoretical model is used to provide a lookup table that gives the power in the transmitted zero-order beam as a function of the linewidth for a fixed pitch of the grating. The predicted linewidth values are compared with those that are obtained by using commercial optical linewidth measurement systems, and excellent agreement is obtained.

© 1992 Optical Society of America

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