Abstract

Thin SnOx films were applied to polyester foil by reactive rf magnetron sputtering. Typical data for 0.3-μm thick films were ~150-Ω resistance/square and ~76% luminous transmittance. Deposition rates exceeding 1 nm/s were obtained.

© 1990 Optical Society of America

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References

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  1. K. Itoyama, “Properties of Sn-Doped Indium Oxide Coatings Deposited on Polyester Film by High Rate Reactive Sputtering,” J. Electrochem. Soc. 126, 691–694 (1979).
    [CrossRef]
  2. M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
    [CrossRef]
  3. Z.-C. Jin, C. G. Granqvist, “Transparent and Infrared-Reflecting ZnO:Al Films Reactively Sputtered onto Polyester Foil,” Appl. Opt. 26, 3191–3192 (1987).
    [CrossRef] [PubMed]
  4. W. D. Munz, J. Heimbach, S. R. Reineck, “Reactive High Rate Sputtering of Oxides,” Thin Solid Films 86, 175–181 (1981).
    [CrossRef]
  5. F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
    [CrossRef]
  6. G. Beensh-Marchwicka, L. Krol-Stepniewska, A. Misiuk, “Influence of Annealing on the Phase Composition, Transmission and Resistivity of SnOx Thin Films,” Thin Solid Films 113, 215–224 (1984).
    [CrossRef]
  7. R. G. Goodchild, J. B. Webb, D. F. Williams, “Electrical Properties of Highly Conducting and Transparent Thin Films of Magnetron Sputtered SnO2,” J. Appl. Phys. 57, 2308–2310 (1985).
    [CrossRef]
  8. T. Minami, H. Nanto, S. Takata, “Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates,” Jpn. J. Appl. Phys. 27, L287–L289 (1988).
    [CrossRef]
  9. B. Stjerna, C. G. Granqvist, “Electrical Conductivity and Optical Transmittance of Sputter-Deposited SnOx Thin Films,” Solar Energy Mater. to be published.
  10. T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Silicon Oxynitride Films: Experimental Data and Theoretical Interpretation,” J. Appl. Phys. 60, 2081–2091 (1986).
    [CrossRef]
  11. G. Wyszecki, W. S. Stiles, Color Science (Wiley, New York, 1982), p. 256.

1988 (1)

T. Minami, H. Nanto, S. Takata, “Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates,” Jpn. J. Appl. Phys. 27, L287–L289 (1988).
[CrossRef]

1987 (1)

1986 (1)

T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Silicon Oxynitride Films: Experimental Data and Theoretical Interpretation,” J. Appl. Phys. 60, 2081–2091 (1986).
[CrossRef]

1985 (1)

R. G. Goodchild, J. B. Webb, D. F. Williams, “Electrical Properties of Highly Conducting and Transparent Thin Films of Magnetron Sputtered SnO2,” J. Appl. Phys. 57, 2308–2310 (1985).
[CrossRef]

1984 (2)

F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
[CrossRef]

G. Beensh-Marchwicka, L. Krol-Stepniewska, A. Misiuk, “Influence of Annealing on the Phase Composition, Transmission and Resistivity of SnOx Thin Films,” Thin Solid Films 113, 215–224 (1984).
[CrossRef]

1983 (1)

M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
[CrossRef]

1981 (1)

W. D. Munz, J. Heimbach, S. R. Reineck, “Reactive High Rate Sputtering of Oxides,” Thin Solid Films 86, 175–181 (1981).
[CrossRef]

1979 (1)

K. Itoyama, “Properties of Sn-Doped Indium Oxide Coatings Deposited on Polyester Film by High Rate Reactive Sputtering,” J. Electrochem. Soc. 126, 691–694 (1979).
[CrossRef]

Affinito, J.

M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
[CrossRef]

Beensh-Marchwicka, G.

G. Beensh-Marchwicka, L. Krol-Stepniewska, A. Misiuk, “Influence of Annealing on the Phase Composition, Transmission and Resistivity of SnOx Thin Films,” Thin Solid Films 113, 215–224 (1984).
[CrossRef]

Brett, M. J.

M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
[CrossRef]

Demichelis, F.

F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
[CrossRef]

Eriksson, T. S.

T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Silicon Oxynitride Films: Experimental Data and Theoretical Interpretation,” J. Appl. Phys. 60, 2081–2091 (1986).
[CrossRef]

Goodchild, R. G.

R. G. Goodchild, J. B. Webb, D. F. Williams, “Electrical Properties of Highly Conducting and Transparent Thin Films of Magnetron Sputtered SnO2,” J. Appl. Phys. 57, 2308–2310 (1985).
[CrossRef]

Granqvist, C. G.

Z.-C. Jin, C. G. Granqvist, “Transparent and Infrared-Reflecting ZnO:Al Films Reactively Sputtered onto Polyester Foil,” Appl. Opt. 26, 3191–3192 (1987).
[CrossRef] [PubMed]

T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Silicon Oxynitride Films: Experimental Data and Theoretical Interpretation,” J. Appl. Phys. 60, 2081–2091 (1986).
[CrossRef]

B. Stjerna, C. G. Granqvist, “Electrical Conductivity and Optical Transmittance of Sputter-Deposited SnOx Thin Films,” Solar Energy Mater. to be published.

Heimbach, J.

W. D. Munz, J. Heimbach, S. R. Reineck, “Reactive High Rate Sputtering of Oxides,” Thin Solid Films 86, 175–181 (1981).
[CrossRef]

Itoyama, K.

K. Itoyama, “Properties of Sn-Doped Indium Oxide Coatings Deposited on Polyester Film by High Rate Reactive Sputtering,” J. Electrochem. Soc. 126, 691–694 (1979).
[CrossRef]

Jin, Z.-C.

Krol-Stepniewska, L.

G. Beensh-Marchwicka, L. Krol-Stepniewska, A. Misiuk, “Influence of Annealing on the Phase Composition, Transmission and Resistivity of SnOx Thin Films,” Thin Solid Films 113, 215–224 (1984).
[CrossRef]

McMahon, R. W.

M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
[CrossRef]

Minami, T.

T. Minami, H. Nanto, S. Takata, “Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates,” Jpn. J. Appl. Phys. 27, L287–L289 (1988).
[CrossRef]

Minetti-Mezzetti, E.

F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
[CrossRef]

Misiuk, A.

G. Beensh-Marchwicka, L. Krol-Stepniewska, A. Misiuk, “Influence of Annealing on the Phase Composition, Transmission and Resistivity of SnOx Thin Films,” Thin Solid Films 113, 215–224 (1984).
[CrossRef]

Munz, W. D.

W. D. Munz, J. Heimbach, S. R. Reineck, “Reactive High Rate Sputtering of Oxides,” Thin Solid Films 86, 175–181 (1981).
[CrossRef]

Nanto, H.

T. Minami, H. Nanto, S. Takata, “Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates,” Jpn. J. Appl. Phys. 27, L287–L289 (1988).
[CrossRef]

Parsons, R. R.

M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
[CrossRef]

Reineck, S. R.

W. D. Munz, J. Heimbach, S. R. Reineck, “Reactive High Rate Sputtering of Oxides,” Thin Solid Films 86, 175–181 (1981).
[CrossRef]

Stiles, W. S.

G. Wyszecki, W. S. Stiles, Color Science (Wiley, New York, 1982), p. 256.

Stjerna, B.

B. Stjerna, C. G. Granqvist, “Electrical Conductivity and Optical Transmittance of Sputter-Deposited SnOx Thin Films,” Solar Energy Mater. to be published.

Tagliaferro, A.

F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
[CrossRef]

Takata, S.

T. Minami, H. Nanto, S. Takata, “Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates,” Jpn. J. Appl. Phys. 27, L287–L289 (1988).
[CrossRef]

Tresso, E.

F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
[CrossRef]

Webb, J. B.

R. G. Goodchild, J. B. Webb, D. F. Williams, “Electrical Properties of Highly Conducting and Transparent Thin Films of Magnetron Sputtered SnO2,” J. Appl. Phys. 57, 2308–2310 (1985).
[CrossRef]

Williams, D. F.

R. G. Goodchild, J. B. Webb, D. F. Williams, “Electrical Properties of Highly Conducting and Transparent Thin Films of Magnetron Sputtered SnO2,” J. Appl. Phys. 57, 2308–2310 (1985).
[CrossRef]

Wyszecki, G.

G. Wyszecki, W. S. Stiles, Color Science (Wiley, New York, 1982), p. 256.

Appl. Opt. (1)

J. Appl. Phys. (2)

R. G. Goodchild, J. B. Webb, D. F. Williams, “Electrical Properties of Highly Conducting and Transparent Thin Films of Magnetron Sputtered SnO2,” J. Appl. Phys. 57, 2308–2310 (1985).
[CrossRef]

T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Silicon Oxynitride Films: Experimental Data and Theoretical Interpretation,” J. Appl. Phys. 60, 2081–2091 (1986).
[CrossRef]

J. Electrochem. Soc. (1)

K. Itoyama, “Properties of Sn-Doped Indium Oxide Coatings Deposited on Polyester Film by High Rate Reactive Sputtering,” J. Electrochem. Soc. 126, 691–694 (1979).
[CrossRef]

J. Vac. Sci. Technol. A (1)

M. J. Brett, R. W. McMahon, J. Affinito, R. R. Parsons, “High Rate Planar Magnetron Deposition of Transparent, Conducting, and Heat Reflecting Films on Glass and Plastic,” J. Vac. Sci. Technol. A 1, 352–355 (1983).
[CrossRef]

Jpn. J. Appl. Phys. (1)

T. Minami, H. Nanto, S. Takata, “Highly Conducting and Transparent SnO2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates,” Jpn. J. Appl. Phys. 27, L287–L289 (1988).
[CrossRef]

Nuovo Cimento D (1)

F. Demichelis, E. Minetti-Mezzetti, A. Tagliaferro, E. Tresso, “Determination of Optical Properties of SnO2 Films,” Nuovo Cimento D 4, 68–78 (1984).
[CrossRef]

Thin Solid Films (2)

G. Beensh-Marchwicka, L. Krol-Stepniewska, A. Misiuk, “Influence of Annealing on the Phase Composition, Transmission and Resistivity of SnOx Thin Films,” Thin Solid Films 113, 215–224 (1984).
[CrossRef]

W. D. Munz, J. Heimbach, S. R. Reineck, “Reactive High Rate Sputtering of Oxides,” Thin Solid Films 86, 175–181 (1981).
[CrossRef]

Other (2)

B. Stjerna, C. G. Granqvist, “Electrical Conductivity and Optical Transmittance of Sputter-Deposited SnOx Thin Films,” Solar Energy Mater. to be published.

G. Wyszecki, W. S. Stiles, Color Science (Wiley, New York, 1982), p. 256.

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Figures (2)

Fig. 1
Fig. 1

Resistance/square, luminous transmittance, and luminous absorptance for SnOx films made by sputter deposition onto polyester foil using different O2/Ar gas flows, Prf = 60 W, and p = 4 mTorr. All films were ~0.3 μm thick. The arrow denotes an off-scale data point. Curves were drawn only to guide the eye.

Fig. 2
Fig. 2

Spectral transmission T and absorptance A for a 0.3-μm thick SnOx film made by sputtering onto polyester foil in conditions giving maximum electrical conductivity. Tf denotes transmittance of the uncoated foil.

Equations (1)

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T lum = d λ T ( λ ) V ( λ ) / d λ V ( λ )

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