Abstract

The chemical composition of a (SiO2)x(Si3N4)1−x film produced by ion beam sputtering was precisely controlled by the ratio of O2 and N2 flow rates under a discharge current kept constant to within an accuracy of ±0.05 A. The reproducibility of the refractive index was improved to ±0.01. This film was applied to form antireflection coatings with extremely low reflectivity on facets of 830-nm AlGaAs double heterostructure lasers. The minimum reflectivity was 6.8 × 10−5, and a reflectivity of 1 × 10−4 was achieved reproducibly. Experimental studies show that antireflection coatings are effective for suppressing the interferometric light output variation of composite cavity lasers.

© 1990 Optical Society of America

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