Abstract

Attention is called to an optical linewidth measurement procedure based on diffraction imagery by a polarizing microscope with crossed polarizers.

© 1990 Optical Society of America

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References

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  1. W. M. Bullis, D. Nyyssonen, “Optical Linewidth Measurements on Photomasks and Wafers,” in VLSI Electronics: Microstructure Science, Vol. 3, N. G. Einspruch, Ed. (Academic, New York, 1982), Chap. 7.
  2. D. Nyyssonen, R. Larrabee, “Submicrometer Linewidth Metrology in the Optical Microscope,” J. Res. Natl. Bur. Stand. 92, 187–204 (1987).
    [CrossRef]
  3. B. J. Lin, “Optical Methods for Fine Line Lithography,” in Fine Line Lithography, R. Neuman, Ed. (North-Holland, New York, 1980), Chap. 2.
  4. R. Barakat, “Incoherent Diffraction Imagery by a Polarizing Microscope with Crossed Polarizers,” Opt. Acta 27, 847–862 (1980).
    [CrossRef]
  5. Kubota, Saito, “Diffraction Images in the Polarizing Microscope,” Opt J. Soc. Am., 49, 191–198 (1959).
    [CrossRef]

1987

D. Nyyssonen, R. Larrabee, “Submicrometer Linewidth Metrology in the Optical Microscope,” J. Res. Natl. Bur. Stand. 92, 187–204 (1987).
[CrossRef]

1980

R. Barakat, “Incoherent Diffraction Imagery by a Polarizing Microscope with Crossed Polarizers,” Opt. Acta 27, 847–862 (1980).
[CrossRef]

1959

Kubota, Saito, “Diffraction Images in the Polarizing Microscope,” Opt J. Soc. Am., 49, 191–198 (1959).
[CrossRef]

Barakat, R.

R. Barakat, “Incoherent Diffraction Imagery by a Polarizing Microscope with Crossed Polarizers,” Opt. Acta 27, 847–862 (1980).
[CrossRef]

Bullis, W. M.

W. M. Bullis, D. Nyyssonen, “Optical Linewidth Measurements on Photomasks and Wafers,” in VLSI Electronics: Microstructure Science, Vol. 3, N. G. Einspruch, Ed. (Academic, New York, 1982), Chap. 7.

Kubota,

Kubota, Saito, “Diffraction Images in the Polarizing Microscope,” Opt J. Soc. Am., 49, 191–198 (1959).
[CrossRef]

Larrabee, R.

D. Nyyssonen, R. Larrabee, “Submicrometer Linewidth Metrology in the Optical Microscope,” J. Res. Natl. Bur. Stand. 92, 187–204 (1987).
[CrossRef]

Lin, B. J.

B. J. Lin, “Optical Methods for Fine Line Lithography,” in Fine Line Lithography, R. Neuman, Ed. (North-Holland, New York, 1980), Chap. 2.

Nyyssonen, D.

D. Nyyssonen, R. Larrabee, “Submicrometer Linewidth Metrology in the Optical Microscope,” J. Res. Natl. Bur. Stand. 92, 187–204 (1987).
[CrossRef]

W. M. Bullis, D. Nyyssonen, “Optical Linewidth Measurements on Photomasks and Wafers,” in VLSI Electronics: Microstructure Science, Vol. 3, N. G. Einspruch, Ed. (Academic, New York, 1982), Chap. 7.

Saito,

Kubota, Saito, “Diffraction Images in the Polarizing Microscope,” Opt J. Soc. Am., 49, 191–198 (1959).
[CrossRef]

J. Res. Natl. Bur. Stand.

D. Nyyssonen, R. Larrabee, “Submicrometer Linewidth Metrology in the Optical Microscope,” J. Res. Natl. Bur. Stand. 92, 187–204 (1987).
[CrossRef]

Opt J. Soc. Am.

Kubota, Saito, “Diffraction Images in the Polarizing Microscope,” Opt J. Soc. Am., 49, 191–198 (1959).
[CrossRef]

Opt. Acta

R. Barakat, “Incoherent Diffraction Imagery by a Polarizing Microscope with Crossed Polarizers,” Opt. Acta 27, 847–862 (1980).
[CrossRef]

Other

W. M. Bullis, D. Nyyssonen, “Optical Linewidth Measurements on Photomasks and Wafers,” in VLSI Electronics: Microstructure Science, Vol. 3, N. G. Einspruch, Ed. (Academic, New York, 1982), Chap. 7.

B. J. Lin, “Optical Methods for Fine Line Lithography,” in Fine Line Lithography, R. Neuman, Ed. (North-Holland, New York, 1980), Chap. 2.

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Figures (2)

Fig. 1
Fig. 1

Schematic of the optical system.

Fig. 2
Fig. 2

Image of bar targets of halfwidth v0 = 6 (- - -) and v0 = 10 (—) for ϕ = 0.

Equations (8)

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a ( ρ , θ ) = ρ 2 sin 2 θ .
t ( v , ϕ ) = [ J 3 ( v ) v sin 2 ϕ ] 2 ,
v = 2 π λ ( a f ) r ,
T ( ω , ϕ ) = { T c ( ω ) cos 2 2 ϕ + T s ( ω ) sin 2 2 ϕ , 0 ω 2 , 0 , ω > 2 ,
o ( v , ϕ ) = { 1 , v > 0 0 , v < 0 ϕ ,
d d v e ( v , ϕ = 0 ) = 0.
o ( v , ϕ ) = { 1 , v < v 0 0 , v > v 0 ϕ .
d d v h ( v , ϕ = 0 ) v = ± v 0 ~ 0.2736 v 0 2

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