Abstract

Optical constants of reactiuely sputtered tungsten oxide determined in the 0.3–0.8-μm interval using a bivariate optimization procedure.

© 1990 Optical Society of America

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References

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  1. C. M. Lampert, “Electrochromic Material for Controlled Radiant Energy Transfer in Buildings,” Sol. Energy Mater. 11, 1–27 (1984).
    [CrossRef]
  2. D. C. Green, B. A. Pailthorpe, R. E. Collins, “Preparation and Properties of Reactively Sputtered Tungsten Oxide Electrochromic Films,” presented at Eleventh Annual NZIP & AIP Condensed Matter Physics Meeting (1987).
  3. H. Kaneko, F. Nagao, K. Miyake, “Preparation and Properties of the DC Reactively Sputtered Tungsten Oxide Films,” J. Appl. Phys. 63, 510–517 (1988).
    [CrossRef]
  4. E. Leja, K. Marszalek, T. Stapinski, “Electrical and Optical Properties of Thin WO3 Electrochromic Films Part 1,” Acta Phys. Pol. A 67, 467–470 (1985).
  5. R. C. McPhedran, L. C. Botten, D. R. McKenzie, R. P. Netterfield, “Unambiguous Determination of Optical Constants of Absorbing Films by Reflectance and Transmittance Measurements,” Appl. Opt. 23, 1197–1205 (1984).
    [CrossRef] [PubMed]
  6. R. E. Denton, R. D. Campbell, S. G. Tomlin, “The Determination of the Optical Constants of Thin Films from Measurements of Reflectance and Transmittance at Normal Incidence,” J. Phys. D 5, 852–863 (1972).
    [CrossRef]
  7. D. C. Green, Ph.D. Thesis, U. Sydney, Australia (1990).
  8. S. K. Deb, “Optical and Photoelectric Properties and Colour Centres in Thin Films of Tungsten Oxide,” Philos. Mag. 27, 801–822 (1973).
    [CrossRef]
  9. G. Caskey et al., at Thirty-Fourth Symposium of American Vacuum Society, Anaheim, CA (1987).

1988 (1)

H. Kaneko, F. Nagao, K. Miyake, “Preparation and Properties of the DC Reactively Sputtered Tungsten Oxide Films,” J. Appl. Phys. 63, 510–517 (1988).
[CrossRef]

1985 (1)

E. Leja, K. Marszalek, T. Stapinski, “Electrical and Optical Properties of Thin WO3 Electrochromic Films Part 1,” Acta Phys. Pol. A 67, 467–470 (1985).

1984 (2)

1973 (1)

S. K. Deb, “Optical and Photoelectric Properties and Colour Centres in Thin Films of Tungsten Oxide,” Philos. Mag. 27, 801–822 (1973).
[CrossRef]

1972 (1)

R. E. Denton, R. D. Campbell, S. G. Tomlin, “The Determination of the Optical Constants of Thin Films from Measurements of Reflectance and Transmittance at Normal Incidence,” J. Phys. D 5, 852–863 (1972).
[CrossRef]

Botten, L. C.

Campbell, R. D.

R. E. Denton, R. D. Campbell, S. G. Tomlin, “The Determination of the Optical Constants of Thin Films from Measurements of Reflectance and Transmittance at Normal Incidence,” J. Phys. D 5, 852–863 (1972).
[CrossRef]

Caskey, G.

G. Caskey et al., at Thirty-Fourth Symposium of American Vacuum Society, Anaheim, CA (1987).

Collins, R. E.

D. C. Green, B. A. Pailthorpe, R. E. Collins, “Preparation and Properties of Reactively Sputtered Tungsten Oxide Electrochromic Films,” presented at Eleventh Annual NZIP & AIP Condensed Matter Physics Meeting (1987).

Deb, S. K.

S. K. Deb, “Optical and Photoelectric Properties and Colour Centres in Thin Films of Tungsten Oxide,” Philos. Mag. 27, 801–822 (1973).
[CrossRef]

Denton, R. E.

R. E. Denton, R. D. Campbell, S. G. Tomlin, “The Determination of the Optical Constants of Thin Films from Measurements of Reflectance and Transmittance at Normal Incidence,” J. Phys. D 5, 852–863 (1972).
[CrossRef]

Green, D. C.

D. C. Green, Ph.D. Thesis, U. Sydney, Australia (1990).

D. C. Green, B. A. Pailthorpe, R. E. Collins, “Preparation and Properties of Reactively Sputtered Tungsten Oxide Electrochromic Films,” presented at Eleventh Annual NZIP & AIP Condensed Matter Physics Meeting (1987).

Kaneko, H.

H. Kaneko, F. Nagao, K. Miyake, “Preparation and Properties of the DC Reactively Sputtered Tungsten Oxide Films,” J. Appl. Phys. 63, 510–517 (1988).
[CrossRef]

Lampert, C. M.

C. M. Lampert, “Electrochromic Material for Controlled Radiant Energy Transfer in Buildings,” Sol. Energy Mater. 11, 1–27 (1984).
[CrossRef]

Leja, E.

E. Leja, K. Marszalek, T. Stapinski, “Electrical and Optical Properties of Thin WO3 Electrochromic Films Part 1,” Acta Phys. Pol. A 67, 467–470 (1985).

Marszalek, K.

E. Leja, K. Marszalek, T. Stapinski, “Electrical and Optical Properties of Thin WO3 Electrochromic Films Part 1,” Acta Phys. Pol. A 67, 467–470 (1985).

McKenzie, D. R.

McPhedran, R. C.

Miyake, K.

H. Kaneko, F. Nagao, K. Miyake, “Preparation and Properties of the DC Reactively Sputtered Tungsten Oxide Films,” J. Appl. Phys. 63, 510–517 (1988).
[CrossRef]

Nagao, F.

H. Kaneko, F. Nagao, K. Miyake, “Preparation and Properties of the DC Reactively Sputtered Tungsten Oxide Films,” J. Appl. Phys. 63, 510–517 (1988).
[CrossRef]

Netterfield, R. P.

Pailthorpe, B. A.

D. C. Green, B. A. Pailthorpe, R. E. Collins, “Preparation and Properties of Reactively Sputtered Tungsten Oxide Electrochromic Films,” presented at Eleventh Annual NZIP & AIP Condensed Matter Physics Meeting (1987).

Stapinski, T.

E. Leja, K. Marszalek, T. Stapinski, “Electrical and Optical Properties of Thin WO3 Electrochromic Films Part 1,” Acta Phys. Pol. A 67, 467–470 (1985).

Tomlin, S. G.

R. E. Denton, R. D. Campbell, S. G. Tomlin, “The Determination of the Optical Constants of Thin Films from Measurements of Reflectance and Transmittance at Normal Incidence,” J. Phys. D 5, 852–863 (1972).
[CrossRef]

Acta Phys. Pol. A (1)

E. Leja, K. Marszalek, T. Stapinski, “Electrical and Optical Properties of Thin WO3 Electrochromic Films Part 1,” Acta Phys. Pol. A 67, 467–470 (1985).

Appl. Opt. (1)

J. Appl. Phys. (1)

H. Kaneko, F. Nagao, K. Miyake, “Preparation and Properties of the DC Reactively Sputtered Tungsten Oxide Films,” J. Appl. Phys. 63, 510–517 (1988).
[CrossRef]

J. Phys. D (1)

R. E. Denton, R. D. Campbell, S. G. Tomlin, “The Determination of the Optical Constants of Thin Films from Measurements of Reflectance and Transmittance at Normal Incidence,” J. Phys. D 5, 852–863 (1972).
[CrossRef]

Philos. Mag. (1)

S. K. Deb, “Optical and Photoelectric Properties and Colour Centres in Thin Films of Tungsten Oxide,” Philos. Mag. 27, 801–822 (1973).
[CrossRef]

Sol. Energy Mater. (1)

C. M. Lampert, “Electrochromic Material for Controlled Radiant Energy Transfer in Buildings,” Sol. Energy Mater. 11, 1–27 (1984).
[CrossRef]

Other (3)

D. C. Green, B. A. Pailthorpe, R. E. Collins, “Preparation and Properties of Reactively Sputtered Tungsten Oxide Electrochromic Films,” presented at Eleventh Annual NZIP & AIP Condensed Matter Physics Meeting (1987).

D. C. Green, Ph.D. Thesis, U. Sydney, Australia (1990).

G. Caskey et al., at Thirty-Fourth Symposium of American Vacuum Society, Anaheim, CA (1987).

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Figures (4)

Fig. 1
Fig. 1

Plots of the transmission (●), front (+) reflectance, and rear (×) reflectance for a specimen which have been corrected in the manner described in Ref. 5.

Fig. 2
Fig. 2

Plots of solution branches for the real part of the refractive index as a function of wavelength for three different assumed thicknesses: (a) 0.10; (b) 0.11; and (c) 0.12 μm. The open circles and solid squares denote the solutions obtained from the two combinations of reflectance and transmittance data.

Fig. 3
Fig. 3

Plots of (a) the real part and (b) the imaginary part of the refractive index as functions of wavelength. The uncertainty estimates are standard errors in the mean values and are not decernible in plot (b). The data of Refs. 4 and 9 are also shown for comparison.

Fig. 4
Fig. 4

Plot of E 2 n k vs E for the determination of the optical bandgap by extrapolation to the x-axis.

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