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Developing an undispersed VUV beamline for large area surface processing

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Abstract

A versatile windowless beamline for undispersed VUV radiation in the energy range between 10 eV and 100 eV is presented. An adjustable light guiding assembly with two glass capillary arrays as vacuum interfaces is constructed to assure high optical transmission (~30%) of white synchrotron light. Three differential pumping stages reduce the pressure of a reaction gas from 1 mbar to 5 × 10−9 mbar. Estimate of the optical transmission of the system are given. The beamline was designed to irradiate a large area of a semiconductor surface for synchroton photon enhanced etching and deposition processes.

© 1989 Optical Society of America

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