Abstract

A computer controlled rapid-scanning monochromator has been constructed for monitoring optical coatings in situ, determining the optical constants of films, and measuring the optical instability of filters. In this paper are given the main specifications of the apparatus, some results in the production of a number of broadband AR coatings, and characterization of some passband filters.

© 1989 Optical Society of America

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References

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  1. B. Vidal, A. Fornier, E. Pelletier, “Wideband Optical Monitoring of Nonquarterwave Multilayer Filters,” Appl. Opt. 18, 3851–3856 (1979).
    [PubMed]
  2. B. Vidal, A. Fornier, E. Pelletier, “Optical Monitoring of Nonquarterwave Multilayer Filters,” Appl. Opt. 17, 1038–1047 (1978).
    [CrossRef] [PubMed]
  3. E. Pelletier, “Monitoring of Optical Thin Films During Deposition,” Proc. Soc. Photo-Opt. Instrum. Eng. 401, 74–82 (1983).
  4. F. J. Van Milligen et al., “Development of an Automated Scanning Monochromator for Monitoring Thin Films,” Appl. Opt. 24, 1799–1802 (1985).
    [CrossRef] [PubMed]
  5. P. Bousquet, E. Pelletier, “Optical Thin Film Monitoring—Recent Advances and Limitations,” Thin Solid Films 77, 165–179 (1981).
    [CrossRef]
  6. H. A. Macleod, E. Pelletier, “Error Compensation Mechanisms in Some Thin-Film Monitoring Systems,” Opt. Acta 24, 907–930 (1977).
    [CrossRef]
  7. J. P. Borgogno, B. Lazarides, E. Pelletier, “Automatic Determination of the Optical Constants of Inhomogeneous Thin Films,” Appl. Opt. 21, 4020–4029 (1982).
    [CrossRef] [PubMed]
  8. B. Bovard, F. J. Van Milligen, M. J. Messerlu, S. G. Saxe, H. A. Macleod, “Optical Constants Derivation for an Inhomogeneous Thin Film from in situ Transmission Measurements,” Appl. Opt. 24, 1803–1807 (1985).
    [CrossRef] [PubMed]

1985 (2)

1983 (1)

E. Pelletier, “Monitoring of Optical Thin Films During Deposition,” Proc. Soc. Photo-Opt. Instrum. Eng. 401, 74–82 (1983).

1982 (1)

1981 (1)

P. Bousquet, E. Pelletier, “Optical Thin Film Monitoring—Recent Advances and Limitations,” Thin Solid Films 77, 165–179 (1981).
[CrossRef]

1979 (1)

1978 (1)

1977 (1)

H. A. Macleod, E. Pelletier, “Error Compensation Mechanisms in Some Thin-Film Monitoring Systems,” Opt. Acta 24, 907–930 (1977).
[CrossRef]

Borgogno, J. P.

Bousquet, P.

P. Bousquet, E. Pelletier, “Optical Thin Film Monitoring—Recent Advances and Limitations,” Thin Solid Films 77, 165–179 (1981).
[CrossRef]

Bovard, B.

Fornier, A.

Lazarides, B.

Macleod, H. A.

Messerlu, M. J.

Pelletier, E.

E. Pelletier, “Monitoring of Optical Thin Films During Deposition,” Proc. Soc. Photo-Opt. Instrum. Eng. 401, 74–82 (1983).

J. P. Borgogno, B. Lazarides, E. Pelletier, “Automatic Determination of the Optical Constants of Inhomogeneous Thin Films,” Appl. Opt. 21, 4020–4029 (1982).
[CrossRef] [PubMed]

P. Bousquet, E. Pelletier, “Optical Thin Film Monitoring—Recent Advances and Limitations,” Thin Solid Films 77, 165–179 (1981).
[CrossRef]

B. Vidal, A. Fornier, E. Pelletier, “Wideband Optical Monitoring of Nonquarterwave Multilayer Filters,” Appl. Opt. 18, 3851–3856 (1979).
[PubMed]

B. Vidal, A. Fornier, E. Pelletier, “Optical Monitoring of Nonquarterwave Multilayer Filters,” Appl. Opt. 17, 1038–1047 (1978).
[CrossRef] [PubMed]

H. A. Macleod, E. Pelletier, “Error Compensation Mechanisms in Some Thin-Film Monitoring Systems,” Opt. Acta 24, 907–930 (1977).
[CrossRef]

Saxe, S. G.

Van Milligen, F. J.

Vidal, B.

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Figures (6)

Fig. 1
Fig. 1

Block diagram of a wideband monitoring apparatus.

Fig. 2
Fig. 2

Flow chart of the computer program for wideband monitoring.

Fig. 3
Fig. 3

Measured performance of AR coatings using the turning value method, envelopes in dashed lines showing the variations in fifteen successive runs.

Fig. 4
Fig. 4

Measured performance of AR coatings using wideband monitoring, envelopes in dashed lines showing the variations in fifteen successive runs.

Fig. 5
Fig. 5

Measured spectral transmittance of a bandpass filter deposited by the conventional process at room temperature. Considerable peak shift caused by moisture adsorption can be observed. Design: glass/HLH3.8LHLH/air, λ0 = 632.8 nm; H: Ta2O5; L: SiO2.

Fig. 6
Fig. 6

Measured spectral transmittance of a bandpass filter deposited with ion beam assistance. No peak shift can be observed. Design: glass/HLH3.8LHLH/air, λ0 = 632.8 nm; H: Ta2O5; L: SiO2.

Tables (3)

Tables Icon

Table I Main Specifications of the Wideband Monitoring Apparatus

Tables Icon

Table II Refractive Index and Thickness of Each Film in the Filter of Fig. 5 Determined by Iteration Immediately after Deposition of Each Layer

Tables Icon

Table III Refractive Index and Thickness of Each Film in the Filter of Fig. 6 Determined by Iteration Immediately after Deposition of Each Layer

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