Abstract

A new type of computer-controlled instrument has been developed to measure microviscoelastic properties of thin materials. It can independently control and measure indentation loads and depths in situ revealing information about material creep and relaxation. Sample and indenter positions are measured with a specially designed polarization interferometer. Indenter loadings can be varied between 0.5 and 10 g and held constant to ±41 mg. The resulting indentation depths can be measured in situ to ±1.2 nm. The load required to maintain constant indentation depths from 0.1 to 5.0 μm can be measured in situ to ±3.3 mg and the depth held constant to ±15 nm.

© 1988 Optical Society of America

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References

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  1. P. E. Wierenga, A. J. J. Franken, “Ultramicroindentation Apparatus for the Mechanical Characterization of Thin Films,” J. Appl. Phys. 55, 4244 (1984).
    [CrossRef]
  2. For further details, see V. S. Williams, “In situ Microviscoelastic Measurements by Polarization Interferometry,” Master’s Thesis, U. Arizona (1988).
  3. R. Brian Hooker, H. E. Morrow, R. V. Shack, “The Polarization Interferometer,” AF33613-70-C-1413 (May1971).

1984

P. E. Wierenga, A. J. J. Franken, “Ultramicroindentation Apparatus for the Mechanical Characterization of Thin Films,” J. Appl. Phys. 55, 4244 (1984).
[CrossRef]

Brian Hooker, R.

R. Brian Hooker, H. E. Morrow, R. V. Shack, “The Polarization Interferometer,” AF33613-70-C-1413 (May1971).

Franken, A. J. J.

P. E. Wierenga, A. J. J. Franken, “Ultramicroindentation Apparatus for the Mechanical Characterization of Thin Films,” J. Appl. Phys. 55, 4244 (1984).
[CrossRef]

Morrow, H. E.

R. Brian Hooker, H. E. Morrow, R. V. Shack, “The Polarization Interferometer,” AF33613-70-C-1413 (May1971).

Shack, R. V.

R. Brian Hooker, H. E. Morrow, R. V. Shack, “The Polarization Interferometer,” AF33613-70-C-1413 (May1971).

Wierenga, P. E.

P. E. Wierenga, A. J. J. Franken, “Ultramicroindentation Apparatus for the Mechanical Characterization of Thin Films,” J. Appl. Phys. 55, 4244 (1984).
[CrossRef]

Williams, V. S.

For further details, see V. S. Williams, “In situ Microviscoelastic Measurements by Polarization Interferometry,” Master’s Thesis, U. Arizona (1988).

J. Appl. Phys.

P. E. Wierenga, A. J. J. Franken, “Ultramicroindentation Apparatus for the Mechanical Characterization of Thin Films,” J. Appl. Phys. 55, 4244 (1984).
[CrossRef]

Other

For further details, see V. S. Williams, “In situ Microviscoelastic Measurements by Polarization Interferometry,” Master’s Thesis, U. Arizona (1988).

R. Brian Hooker, H. E. Morrow, R. V. Shack, “The Polarization Interferometer,” AF33613-70-C-1413 (May1971).

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Figures (4)

Fig. 1
Fig. 1

VEM layout.

Fig. 2
Fig. 2

Polarization interferometer schematic.

Fig. 3
Fig. 3

VEM control schematic.

Fig. 4
Fig. 4

Creep and relaxation tests on magnetic tape.

Tables (1)

Tables Icon

Table I Summary of Averaged Creep and Relaxation Data at Zero-Time and 50 s

Metrics