The use of computer generated holographic elements for implementation of free-space optical interconnection of very large scale integrated circuits is presented. The design of the holographic optical elements is based on laser source divergence, source to hologram spacing, signal fanout, and resolution of the hologram recorder. The results of a computer simulation of diffraction from the hologram are compared with the analytically predicted results, particularly to confirm the effect of spatial sampling on the performance of an on-axis interferogram hologram. Measurements taken using transmission absorption and transmission phase holograms in photographic emulsion, as well as reflective surface relief holograms on silicon, are compared to predicted results. Performance benefits expected from extension of the design process to holograms fabricated using electron-beam lithography are discussed.
© 1987 Optical Society of America
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