Abstract

A quarterwave-thick narrow-bandwidth antireflective coating for fused silica optical components and KDP crystals has been developed. The coating consists of porous silica prepared from a silica sol in ethanol. It is applied by dip or spin from a solution at room temperature and requires no further treatment. The laser damage threshold levels are about equal to the surface damage thresholds of the uncoated substrates.

© 1986 Optical Society of America

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References

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  1. W. H. Lowdermilk, D. Milam, “Graded-Index Antireflection Surfaces for High Power Laser Applications,” Appl. Phys. Lett. 36, 891 (1980).
    [CrossRef]
  2. L. M. Cook, W. H. Lowdermilk, D. Milam, J. E. Swain, “Antireflective Surfaces for High Energy Laser Optics Formed by Neutral-Solution Processing,” Appl. Opt. 21, 1482 (1982).
    [CrossRef] [PubMed]
  3. S. P. Mukherjee, W. H. Lowdermilk, “Gradient-Index AR Film Deposited by the Sol–Gel Process,” Appl. Opt. 21, 293 (1982).
    [CrossRef] [PubMed]
  4. M. J. Minot, “Single-Layer, Gradient Refractive Index Antireflection Films Effective from 0.35 to 2.5 μ,” J. Opt. Soc. Am. 66, 515 (1976).
    [CrossRef]
  5. L. M. Cook, K.-H. Mader, R. Schnabel, “Integral Antireflective Surfaces on Silicate Glass,” U.S. Patent Application309,149, (5Oct.1981).
  6. E. M. Pastirik, M. C. Keeling, “A Low Cost Durable AntiReflective Film for Solar Collectors,” in Proceedings, Thirteenth IEEE Photov. Special Conference, Washington, DC (June 1978).
  7. H. R. Moulton, “Composition for Reducing the Reflection of Light,” U.S. Patent2,601,123 (1952).
  8. H. R. Moulton, “Method of Producing Thin Microporous Silica Coatings Having Reflection Reducing Characteristics and the Articles So Coated,” U.S. Patent2,474,061 (1949).
  9. B. E. Yoldas, D. P. Partlow, “Wide Spectrum Antireflective Coating for Fused Silica and Other Glasses,” Appl. Opt. 23, 1418 (1984).
    [CrossRef] [PubMed]
  10. H. L. McCollister, N. L. Boling, “Process of Making Glass Articles Having Antireflective Coatings and Product,” U.S. Patent4,273,826 (1981).
  11. W. Stober, A. Fink, E. Bohn, “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,” J. Colloid Interface Sci. 26, 62 (1968).
    [CrossRef]
  12. M. A. Summers, B. C. Johnson, J. D. Williams, 1982 Laser Program Annual Report, Lawrence Livermore National Laboratory UCRL-50021-82 (1983), p. 2–7.
  13. M. C. Staggs, F. Rainer, “Damage Thresholds of Fused Silica, Plastics and KDP Crystals Measured with 0.6 ns, 355 nm Pulses,” Natl. Bur. Stand. (U.S.) Spec. Publ.688 (1985), in press;W. H. Lowdermilk, D. Milam, “Review of Ultraviolet Damage Threshold Measurements at Lawrence Livermore National Laboratory,” Proc. Soc. Photo-Opt. Instrum. Eng. 476, 143 (1984).

1984 (1)

1982 (2)

1980 (1)

W. H. Lowdermilk, D. Milam, “Graded-Index Antireflection Surfaces for High Power Laser Applications,” Appl. Phys. Lett. 36, 891 (1980).
[CrossRef]

1976 (1)

1968 (1)

W. Stober, A. Fink, E. Bohn, “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,” J. Colloid Interface Sci. 26, 62 (1968).
[CrossRef]

Bohn, E.

W. Stober, A. Fink, E. Bohn, “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,” J. Colloid Interface Sci. 26, 62 (1968).
[CrossRef]

Boling, N. L.

H. L. McCollister, N. L. Boling, “Process of Making Glass Articles Having Antireflective Coatings and Product,” U.S. Patent4,273,826 (1981).

Cook, L. M.

L. M. Cook, W. H. Lowdermilk, D. Milam, J. E. Swain, “Antireflective Surfaces for High Energy Laser Optics Formed by Neutral-Solution Processing,” Appl. Opt. 21, 1482 (1982).
[CrossRef] [PubMed]

L. M. Cook, K.-H. Mader, R. Schnabel, “Integral Antireflective Surfaces on Silicate Glass,” U.S. Patent Application309,149, (5Oct.1981).

Fink, A.

W. Stober, A. Fink, E. Bohn, “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,” J. Colloid Interface Sci. 26, 62 (1968).
[CrossRef]

Johnson, B. C.

M. A. Summers, B. C. Johnson, J. D. Williams, 1982 Laser Program Annual Report, Lawrence Livermore National Laboratory UCRL-50021-82 (1983), p. 2–7.

Keeling, M. C.

E. M. Pastirik, M. C. Keeling, “A Low Cost Durable AntiReflective Film for Solar Collectors,” in Proceedings, Thirteenth IEEE Photov. Special Conference, Washington, DC (June 1978).

Lowdermilk, W. H.

Mader, K.-H.

L. M. Cook, K.-H. Mader, R. Schnabel, “Integral Antireflective Surfaces on Silicate Glass,” U.S. Patent Application309,149, (5Oct.1981).

McCollister, H. L.

H. L. McCollister, N. L. Boling, “Process of Making Glass Articles Having Antireflective Coatings and Product,” U.S. Patent4,273,826 (1981).

Milam, D.

L. M. Cook, W. H. Lowdermilk, D. Milam, J. E. Swain, “Antireflective Surfaces for High Energy Laser Optics Formed by Neutral-Solution Processing,” Appl. Opt. 21, 1482 (1982).
[CrossRef] [PubMed]

W. H. Lowdermilk, D. Milam, “Graded-Index Antireflection Surfaces for High Power Laser Applications,” Appl. Phys. Lett. 36, 891 (1980).
[CrossRef]

Minot, M. J.

Moulton, H. R.

H. R. Moulton, “Composition for Reducing the Reflection of Light,” U.S. Patent2,601,123 (1952).

H. R. Moulton, “Method of Producing Thin Microporous Silica Coatings Having Reflection Reducing Characteristics and the Articles So Coated,” U.S. Patent2,474,061 (1949).

Mukherjee, S. P.

Partlow, D. P.

Pastirik, E. M.

E. M. Pastirik, M. C. Keeling, “A Low Cost Durable AntiReflective Film for Solar Collectors,” in Proceedings, Thirteenth IEEE Photov. Special Conference, Washington, DC (June 1978).

Rainer, F.

M. C. Staggs, F. Rainer, “Damage Thresholds of Fused Silica, Plastics and KDP Crystals Measured with 0.6 ns, 355 nm Pulses,” Natl. Bur. Stand. (U.S.) Spec. Publ.688 (1985), in press;W. H. Lowdermilk, D. Milam, “Review of Ultraviolet Damage Threshold Measurements at Lawrence Livermore National Laboratory,” Proc. Soc. Photo-Opt. Instrum. Eng. 476, 143 (1984).

Schnabel, R.

L. M. Cook, K.-H. Mader, R. Schnabel, “Integral Antireflective Surfaces on Silicate Glass,” U.S. Patent Application309,149, (5Oct.1981).

Staggs, M. C.

M. C. Staggs, F. Rainer, “Damage Thresholds of Fused Silica, Plastics and KDP Crystals Measured with 0.6 ns, 355 nm Pulses,” Natl. Bur. Stand. (U.S.) Spec. Publ.688 (1985), in press;W. H. Lowdermilk, D. Milam, “Review of Ultraviolet Damage Threshold Measurements at Lawrence Livermore National Laboratory,” Proc. Soc. Photo-Opt. Instrum. Eng. 476, 143 (1984).

Stober, W.

W. Stober, A. Fink, E. Bohn, “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,” J. Colloid Interface Sci. 26, 62 (1968).
[CrossRef]

Summers, M. A.

M. A. Summers, B. C. Johnson, J. D. Williams, 1982 Laser Program Annual Report, Lawrence Livermore National Laboratory UCRL-50021-82 (1983), p. 2–7.

Swain, J. E.

Williams, J. D.

M. A. Summers, B. C. Johnson, J. D. Williams, 1982 Laser Program Annual Report, Lawrence Livermore National Laboratory UCRL-50021-82 (1983), p. 2–7.

Yoldas, B. E.

Appl. Opt. (3)

Appl. Phys. Lett. (1)

W. H. Lowdermilk, D. Milam, “Graded-Index Antireflection Surfaces for High Power Laser Applications,” Appl. Phys. Lett. 36, 891 (1980).
[CrossRef]

J. Colloid Interface Sci. (1)

W. Stober, A. Fink, E. Bohn, “Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,” J. Colloid Interface Sci. 26, 62 (1968).
[CrossRef]

J. Opt. Soc. Am. (1)

Other (7)

L. M. Cook, K.-H. Mader, R. Schnabel, “Integral Antireflective Surfaces on Silicate Glass,” U.S. Patent Application309,149, (5Oct.1981).

E. M. Pastirik, M. C. Keeling, “A Low Cost Durable AntiReflective Film for Solar Collectors,” in Proceedings, Thirteenth IEEE Photov. Special Conference, Washington, DC (June 1978).

H. R. Moulton, “Composition for Reducing the Reflection of Light,” U.S. Patent2,601,123 (1952).

H. R. Moulton, “Method of Producing Thin Microporous Silica Coatings Having Reflection Reducing Characteristics and the Articles So Coated,” U.S. Patent2,474,061 (1949).

M. A. Summers, B. C. Johnson, J. D. Williams, 1982 Laser Program Annual Report, Lawrence Livermore National Laboratory UCRL-50021-82 (1983), p. 2–7.

M. C. Staggs, F. Rainer, “Damage Thresholds of Fused Silica, Plastics and KDP Crystals Measured with 0.6 ns, 355 nm Pulses,” Natl. Bur. Stand. (U.S.) Spec. Publ.688 (1985), in press;W. H. Lowdermilk, D. Milam, “Review of Ultraviolet Damage Threshold Measurements at Lawrence Livermore National Laboratory,” Proc. Soc. Photo-Opt. Instrum. Eng. 476, 143 (1984).

H. L. McCollister, N. L. Boling, “Process of Making Glass Articles Having Antireflective Coatings and Product,” U.S. Patent4,273,826 (1981).

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Figures (3)

Fig. 1
Fig. 1

Transmittance of coatings on fused silica substrates.

Fig. 2
Fig. 2

Transmittance of coatings on diamond-turned KDP substrates.

Fig. 3
Fig. 3

Laser damage thresholds.

Equations (1)

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Si ( OC 2 H 5 ) 4 + 2 H 2 O SiO 2 + 4 C 2 H 5 OH .

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