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  1. P. M. Martin, W. T. Pawlewicz, D. Coult, J. Jones, “Observation of Exceptional Temperature Humidity Stability in Multilayer Filter Coatings,” Appl. Opt. 23, 2668 (1984).
    [CrossRef] [PubMed]
  2. C.-E. Morosanu, “The Preparation, Characterization and Applications of Silicon Nitride Thin Films,” Thin Solid Films 65, 171 (1980).
    [CrossRef]
  3. C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
    [CrossRef]
  4. P. M. Martin, G. J. Exarhos, “Relationships between Stress, Composition, and Microstructure in Sputtered Silicon Nitride,” J. Vac. Sci. Technol. A 3, 615 (1985).
    [CrossRef]
  5. W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).
  6. V. A. Burdovitsin, “Silicon Nitride and Oxynitride Films Prepared by Ion Beam Reactive Sputtering,” Thin Solid Films 105, 197 (1983).
    [CrossRef]
  7. T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Electron-Beam Evaporated Silicon Oxynitride Films,” Appl. Opt. 22, 3204 (1983).
    [CrossRef] [PubMed]
  8. W. Heitmann, “Properties of Evaporated SiO2, SiOxNy, and TiO2 Films,” Appl. Opt. 10, 1685 (1971).
    [CrossRef]
  9. R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
    [CrossRef]
  10. L. N. Binh, R. P. Netterfield, P. J. Martin, “Low-Loss Waveguide in Ion-Assisted Deposited Thin Films,” Appl. Surf. Sci. 22/23, 656 (1985).
    [CrossRef]
  11. H. A. Macleod, Thin-film Optical Filters (American Elsevier, New York, 1969), p. 42.
  12. M. S. Perlmutter, K. R. Martin, “Ion Beam Sputtered Antireflection Coatings of Fused Silica Substrates,” in Technical Digest, Topical Meeting on Optical Interference Coatings (Optical Society of America, Washington, DC, 1984), paper ThA-C4.

1985

P. M. Martin, G. J. Exarhos, “Relationships between Stress, Composition, and Microstructure in Sputtered Silicon Nitride,” J. Vac. Sci. Technol. A 3, 615 (1985).
[CrossRef]

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

L. N. Binh, R. P. Netterfield, P. J. Martin, “Low-Loss Waveguide in Ion-Assisted Deposited Thin Films,” Appl. Surf. Sci. 22/23, 656 (1985).
[CrossRef]

1984

1983

T. S. Eriksson, C. G. Granqvist, “Infrared Optical Properties of Electron-Beam Evaporated Silicon Oxynitride Films,” Appl. Opt. 22, 3204 (1983).
[CrossRef] [PubMed]

V. A. Burdovitsin, “Silicon Nitride and Oxynitride Films Prepared by Ion Beam Reactive Sputtering,” Thin Solid Films 105, 197 (1983).
[CrossRef]

1982

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).

1980

C.-E. Morosanu, “The Preparation, Characterization and Applications of Silicon Nitride Thin Films,” Thin Solid Films 65, 171 (1980).
[CrossRef]

1979

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

1971

Bewilogue, K.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Binh, L. N.

L. N. Binh, R. P. Netterfield, P. J. Martin, “Low-Loss Waveguide in Ion-Assisted Deposited Thin Films,” Appl. Surf. Sci. 22/23, 656 (1985).
[CrossRef]

Burdovitsin, V. A.

V. A. Burdovitsin, “Silicon Nitride and Oxynitride Films Prepared by Ion Beam Reactive Sputtering,” Thin Solid Films 105, 197 (1983).
[CrossRef]

Coult, D.

Duffy, R. M.

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

Ebersbach, V.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Eriksson, T. S.

Erler, H. J.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Exarhos, G. J.

P. M. Martin, G. J. Exarhos, “Relationships between Stress, Composition, and Microstructure in Sputtered Silicon Nitride,” J. Vac. Sci. Technol. A 3, 615 (1985).
[CrossRef]

Granqvist, C. G.

Hays, D. D.

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).

Heitmann, W.

Henny, F.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Jones, J.

Macleod, H. A.

H. A. Macleod, Thin-film Optical Filters (American Elsevier, New York, 1969), p. 42.

Mann, I. B.

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).

Martin, K. R.

M. S. Perlmutter, K. R. Martin, “Ion Beam Sputtered Antireflection Coatings of Fused Silica Substrates,” in Technical Digest, Topical Meeting on Optical Interference Coatings (Optical Society of America, Washington, DC, 1984), paper ThA-C4.

Martin, P. J.

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

L. N. Binh, R. P. Netterfield, P. J. Martin, “Low-Loss Waveguide in Ion-Assisted Deposited Thin Films,” Appl. Surf. Sci. 22/23, 656 (1985).
[CrossRef]

Martin, P. M.

P. M. Martin, G. J. Exarhos, “Relationships between Stress, Composition, and Microstructure in Sputtered Silicon Nitride,” J. Vac. Sci. Technol. A 3, 615 (1985).
[CrossRef]

P. M. Martin, W. T. Pawlewicz, D. Coult, J. Jones, “Observation of Exceptional Temperature Humidity Stability in Multilayer Filter Coatings,” Appl. Opt. 23, 2668 (1984).
[CrossRef] [PubMed]

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).

Morosanu, C.-E.

C.-E. Morosanu, “The Preparation, Characterization and Applications of Silicon Nitride Thin Films,” Thin Solid Films 65, 171 (1980).
[CrossRef]

Netterfield, R. P.

L. N. Binh, R. P. Netterfield, P. J. Martin, “Low-Loss Waveguide in Ion-Assisted Deposited Thin Films,” Appl. Surf. Sci. 22/23, 656 (1985).
[CrossRef]

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

Pacey, C. G.

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

Pawlewicz, W. T.

P. M. Martin, W. T. Pawlewicz, D. Coult, J. Jones, “Observation of Exceptional Temperature Humidity Stability in Multilayer Filter Coatings,” Appl. Opt. 23, 2668 (1984).
[CrossRef] [PubMed]

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).

Perlmutter, M. S.

M. S. Perlmutter, K. R. Martin, “Ion Beam Sputtered Antireflection Coatings of Fused Silica Substrates,” in Technical Digest, Topical Meeting on Optical Interference Coatings (Optical Society of America, Washington, DC, 1984), paper ThA-C4.

Reisse, G.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Sainty, W. G.

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

Shurer, C.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Weissmantel, C.

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Appl. Opt.

Appl. Surf. Sci.

L. N. Binh, R. P. Netterfield, P. J. Martin, “Low-Loss Waveguide in Ion-Assisted Deposited Thin Films,” Appl. Surf. Sci. 22/23, 656 (1985).
[CrossRef]

J. Vac. Sci. Technol. A

P. M. Martin, G. J. Exarhos, “Relationships between Stress, Composition, and Microstructure in Sputtered Silicon Nitride,” J. Vac. Sci. Technol. A 3, 615 (1985).
[CrossRef]

Proc. Soc. Photo-Opt. Instrum. Eng.

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105 (1982).

Rev. Sci. Instrum.

R. P. Netterfield, P. J. Martin, W. G. Sainty, R. M. Duffy, C. G. Pacey, “Characterization of Growing Thin Films by in-situ Ellipsometry, Spectral Reflectance and Transmittance Measurements, and Ion-Scattering Spectroscopy,” Rev. Sci. Instrum. 56, 1995 (1985).
[CrossRef]

Thin Solid Films

V. A. Burdovitsin, “Silicon Nitride and Oxynitride Films Prepared by Ion Beam Reactive Sputtering,” Thin Solid Films 105, 197 (1983).
[CrossRef]

C.-E. Morosanu, “The Preparation, Characterization and Applications of Silicon Nitride Thin Films,” Thin Solid Films 65, 171 (1980).
[CrossRef]

C. Weissmantel, G. Reisse, H. J. Erler, F. Henny, K. Bewilogue, V. Ebersbach, C. Shurer, “Preparation of Hard Coatings by Ion Beam Methods,” Thin Solid Films 63, 315 (1979).
[CrossRef]

Other

H. A. Macleod, Thin-film Optical Filters (American Elsevier, New York, 1969), p. 42.

M. S. Perlmutter, K. R. Martin, “Ion Beam Sputtered Antireflection Coatings of Fused Silica Substrates,” in Technical Digest, Topical Meeting on Optical Interference Coatings (Optical Society of America, Washington, DC, 1984), paper ThA-C4.

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Figures (2)

Fig. 1
Fig. 1

Dispersion of refractive index of a Si3N4 layer having a growth rate of 0.08 nm s−1. The N 2 + ion energy was 60 eV and the ion current density at the substrate 0.4 A m−2.

Fig. 2
Fig. 2

Ellipsometric monitoring of the two-layer normal incidence. antireflection. The solid line corresponds to the Si3N4 layer, which had a refractive index of 1.934 at 633 nm and a thickness of 46.2 nm. The dashed line shows the growth of the SiO2 layer whose index was measured at 633 nm to be 1.490 and 129.7-nm thickness.

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