Abstract

Echlette gratings made by chemical etching of silicon substrates have already proved to be efficient, easy to implement, and well adapted to optical wavelength demultiplexing [ Y. Fujii, K. I. Aoyama, and J. I. Minowa, “ Optical Demultiplexer Using a Silicon Echelette Grating,” IEEE J. Quantum Electron. QE-16, 165 ( 1980).]. This paper describes a collaboration between experimentalists and theoreticians devoted to the practical construction of wavelength demultiplexers for optical communications in the 0.78–0.9 and 1.2–1.35-μm ranges. A theoretical optimization of echelette gratings on silicon substrate allows us to obtain a very high diffraction efficiency. The experimental results confirmed the theoretical predictions.

© 1985 Optical Society of America

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