Abstract

TiO2 and SiO2 films deposited using ion assisted deposition are investigated as a function of ion energy and current density. Optical constants, possible ion source contaminants, and optical scatter are examined for samples deposited at ambient (∼75°C) and elevated (∼250°C) substrate temperatures.

© 1985 Optical Society of America

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References

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  1. J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984).
    [CrossRef]
  2. W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coating,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).
  3. T. H. Allen, “Properties of Ion Assisted Deposited Silica and Titania Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 93 (1982).
  4. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
    [CrossRef] [PubMed]
  5. P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
    [CrossRef]
  6. J. R. McNeil, L. J. Wei, G. A. Al-Jumaily, S. Shakier, J. K. McIver, “Surface Smoothing Effects of Thin Film Deposition?,” Appl. Opt. 24, 480 (1985).
    [CrossRef] [PubMed]
  7. R. Kelly, H. M. Naguib, in Atomic Collision Phenomena in Solids, D. W. Palmer et al., Eds. (North-Holland, Amsterdam, 1970), p. 172.

1985 (1)

1984 (1)

J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984).
[CrossRef]

1983 (2)

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

1982 (2)

W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coating,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).

T. H. Allen, “Properties of Ion Assisted Deposited Silica and Titania Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 93 (1982).

1970 (1)

R. Kelly, H. M. Naguib, in Atomic Collision Phenomena in Solids, D. W. Palmer et al., Eds. (North-Holland, Amsterdam, 1970), p. 172.

Al-Jumaily, G. A.

Allen, T. H.

T. H. Allen, “Properties of Ion Assisted Deposited Silica and Titania Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 93 (1982).

Barron, A. C.

J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984).
[CrossRef]

Clark, G. J.

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

Herrmann, W. C.

J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984).
[CrossRef]

W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coating,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).

Kelly, R.

R. Kelly, H. M. Naguib, in Atomic Collision Phenomena in Solids, D. W. Palmer et al., Eds. (North-Holland, Amsterdam, 1970), p. 172.

Lanford, W. A.

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

Macleod, H. A.

Martin, P. J.

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

McIver, J. K.

McNeil, J. R.

J. R. McNeil, L. J. Wei, G. A. Al-Jumaily, S. Shakier, J. K. McIver, “Surface Smoothing Effects of Thin Film Deposition?,” Appl. Opt. 24, 480 (1985).
[CrossRef] [PubMed]

J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984).
[CrossRef]

W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coating,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).

Naguib, H. M.

R. Kelly, H. M. Naguib, in Atomic Collision Phenomena in Solids, D. W. Palmer et al., Eds. (North-Holland, Amsterdam, 1970), p. 172.

Netterfield, R. P.

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

Pacey, C. G.

Sainty, W. G.

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

Shakier, S.

Sie, S. H.

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

Wei, L. J.

Wilson, S. R.

J. R. McNeil, A. C. Barron, S. R. Wilson, W. C. Herrmann, “Ion-Assisted Deposition of Optical Thin Films: Low Energy vs High Energy Bombardment,” Appl. Opt. 23, 559 (1984).
[CrossRef]

Appl. Opt. (3)

Appl. Phys. Lett. (1)

P. J. Martin, R. P. Netterfield, W. G. Sainty, G. J. Clark, W. A. Lanford, S. H. Sie, “Ion-Assisted Deposition of Bulklike ZrO2 Films,” Appl. Phys. Lett. 43, 711 (1983).
[CrossRef]

Atomic Collision Phenomena in Solids (1)

R. Kelly, H. M. Naguib, in Atomic Collision Phenomena in Solids, D. W. Palmer et al., Eds. (North-Holland, Amsterdam, 1970), p. 172.

Proc. Soc. Photo-Opt. Instrum. Eng. (2)

W. C. Herrmann, J. R. McNeil, “Ion Beam Applications for Optical Coating,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 101 (1982).

T. H. Allen, “Properties of Ion Assisted Deposited Silica and Titania Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 93 (1982).

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Figures (4)

Fig. 1
Fig. 1

Spectral transmittance for TiO2 films on BK-7 substrates for 500-eV bombardment at different current densities. Substrate temperature was ambient (∼50–100°C).

Fig. 2
Fig. 2

Spectral transmittance for two TiO2 films on BK-7 substrates, one bombarded (E = 500 eV, J = 60 μA/cm2) during deposition and the other unbombarded. Both were evaporated at elevated substrate temperature (∼250°C).

Fig. 3
Fig. 3

Scatter characteristics (PSD) for two TiO2 samples, one bombarded (E = 500 eV, J = 15 μA/cm2) during deposition, the other unbombarded; substrates were polished Si wafers. The horizontal axis represents spatial frequency of structure responsible for scatter in units of μm−1.

Fig. 4
Fig. 4

Scatter characteristics for two SiO2 samples, one bombarded (E = 500 eV, J = 25 μA/cm2) during deposition, the other unbombarded. Substrates were Si wafers. The bottom curve is the PSD characteristic for the uncoated substrate. The horizontal axis represents the spatial frequency of structure responsible for scatter in units of μm−1.

Tables (3)

Tables Icon

Table I Experimental Conditions at the Optical Surface for Film Deposition

Tables Icon

Table II Contamination and Refractive Index for 500-eV O 2 + Bombardment of TiO2

Tables Icon

Table III Contamination and Refractive Index for 60-eV O 2 + Bombardment of TiO2

Equations (2)

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J O + / O 2 +
Γ O + / O 2 +

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