Abstract

An interferometric method is presented that has been successfully used to measure the alignment precision of different mask patterns superimposed on a silicon wafer in the lithographic process. Based on an extremely precise electrooptical phase measurement technique this method is capable of measuring the relative pattern displacement with precision in the nanometer region. The principle of the measurement technique is described. Results of experiments are discussed including suggestions for improving the measurement precision.

© 1984 Optical Society of America

Full Article  |  PDF Article
Related Articles
Photolithographic Mask Alignment Using Moiré Techniques

M. C. King and D. H. Berry
Appl. Opt. 11(11) 2455-2459 (1972)

Optical Method for Testing the Precision of Linear Motions

G. Makosch
Appl. Opt. 12(9) 2054-2056 (1973)

Phase-locked interferometry for automatic mask alignment in projection printers

G. Makosch and F. Prein
Appl. Opt. 26(14) 2828-2835 (1987)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (4)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription