Abstract

The Fourteenth Annual Symposium on Optical Materials for High Power Lasers (Boulder Damage Symposium) was held at the National Bureau of Standards in Boulder, Colo., 16–17 Nov. 1982. The Symposium was held under the auspices of the ASTM Committee F-1, Subcommittee on Laser Standards, with the joint sponsorship of NBS, the Defense Advanced Research Project Agency, the Department of Energy, the Office of Naval Research, and the Air Force Office of Scientific Research. Approximately 200 scientists attended the Symposium, including representatives of the U.K., France, Japan, West Germany, and the U.S.S.R. The Symposium was divided into sessions concerning Materials and Measurements, Mirrors and Surfaces, Thin Films, and finally Fundamental Mechanisms. As in previous years, the emphasis of the papers presented at the Symposium was directed toward new frontiers and new developments. Particular emphasis was given to materials for high-power apparatus. The wavelength range of prime interest was from 10.6 μm to the UV region. Highlights included surface characterization, thin-film–substrate boundaries, and advances in fundamental laser–matter threshold interactions and damage mechanisms. Harold E. Bennett of the Naval Weapons Center, Arthur H. Guenther of the Air Force Weapons Laboratory, David Milam of the Lawrence Livermore National Laboratory, and Brian E. Newnam of the Los Alamos National Laboratory were cochairmen of the Symposium.

© 1984 Optical Society of America

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Figures (9)

Fig. 1
Fig. 1

Root-mean-square wave-front error caused by random peak-to-valley and sagittal quarterwave figure errors.

Fig. 2
Fig. 2

Ion-beam sputter-deposition apparatus.

Fig. 3
Fig. 3

Transmission electron micrograph of a replica of a neutral-solution-processed BK-7 glass surface.

Fig. 4
Fig. 4

Delayed surface damage in KD*P crystals produced by 5-nsec, 248-nm irradiation.

Fig. 5
Fig. 5

Pulse duration dependence of 1064-nm damage thresholds of gradient-index (neutral-solution-processed) antireflection surfaces on BK-7 glass.

Fig. 6
Fig. 6

Multiple-shot laser damage (248-nm, 15-nsec pulse width, 35 pps) of eight Al2O3/SiO2 maximum reflectors for three spot-size diameters.

Fig. 7
Fig. 7

Damage threshold of a ThF4 film as a function of impurity conductivity.

Fig. 8
Fig. 8

Exoemission from silicon surfaces vs multiple-shot laser fluence (1064 nm, 60–80-psec pulses). Each point represents the average of fifty exoemission events at a given damage site.

Fig. 9
Fig. 9

Mean critical number of 694-nm laser pulses to cause detectable damage in the optical polymers polymethyl methacrylate (PMMA) and modified PMMA. Intensities are normalized to I1, the single-shot damage threshold.

Tables (2)

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Table I Summary of Calorimetric Absorption Results at 1.3 μm

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Table II Laser-induced Surface-Ripple Period for a Number of Optical Materials Irradiated with Four Infrared Lasers

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