Abstract

The optical constants of evaporated MgF2 films were determined over the 1050–1600-Å wavelength range from measured transmittance and near-normal incidence reflectance measurements. The complex refractive index was studied as a function of film deposition conditions and correlated with microstructural examinations by transmission electron microscopy. Absorption by the low energy tail of an exciton band and scattering from inhomogeneities were found to account for the film’s loss in this wavelength range. Both of these factors were determined largely by substrate temperature during the film deposition.

© 1984 Optical Society of America

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References

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  1. A. Duncanson, R. W. H. Stevenson, “Some Properties of Magnesium Fluoride Crystallized from the Melt,” Proc. Phys. Soc. London, 72, 1001 (1958).
    [Crossref]
  2. W. A. Hargreaves, “Magnesium Fluoride Update and Summary of Optical Properties,” Laser Focus 18, 86 (1982).
  3. G. Hass, R. Tousey, “Reflecting Coatings for the Extreme Ultraviolet,” J. Opt. Soc. Am. 49, 593 (1959).
    [Crossref]
  4. P. H. Berning, G. Hass, R. P. Madden, “Reflectance-Increasing Coatings for the Vacuum Ultraviolet and Their Applications,” J. Opt. Soc. Am. 50, 586 (1960).
    [Crossref]
  5. L. R. Canfield, G. Hass, J. E. Waylonis, “Further Studies on MgF2-Overcoated Aluminum Mirrors with Highest Reflectance in the Vacuum Ultraviolet,” Appl. Opt. 5, 45 (1966).
    [Crossref] [PubMed]
  6. E. T. Hutcheson, G. Hass, J. T. Cox, “Effect of Deposition Rate and Substrate Temperature on the VUV Reflectance of MgF2- and LiF-Overcoated Aluminum Mirrors,” Appl. Opt. 11, 2245 (1972).
    [Crossref] [PubMed]
  7. G. Hass, J. B. Ramsey, “Vacuum Deposition of Dielectric and Semiconductor Films by a CO2 Laser,” Appl. Opt. 8, 1115 (1969).
    [Crossref] [PubMed]
  8. D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).
  9. W. R. Hunter, “Optical Constants of Metals in EUV,” J. Opt. Soc. Am. 54, 208 (1964).
    [Crossref]
  10. D. Fabre, J. Romand, “Mesures des constantes optiques de dépote évaporés de fluorure de magnesium dans l’ultraviolet de Schumann,” J. Phys. Radium 22, 324 (1961).
    [Crossref]
  11. E. Spiller, “Reflective Multilayer Coatings for the Far UV Region,” Appl. Opt. 15, 2333 (1976).
    [Crossref] [PubMed]
  12. A. Malherbe, “Interference Filters for the Far Ultraviolet,” Appl. Opt. 13, 1275 (1974).
    [Crossref] [PubMed]
  13. A. S. Barriere, A. Lachter, “Optical Transitions in Disordered Thin Films of the Ionic Compounds MgF2 and AlF3 as a Function of Their Conditions of Preparation,” Appl. Opt. 16, 2865 (1977).
    [Crossref] [PubMed]
  14. D. A. Patterson, W. H. Vaughan, “Influence of Crystal Surface on the Optical Transmission of Lithium Fluoride in the Vacuum-Ultraviolet Spectrum,” J. Opt. Soc. Am. 53, 851 (1963).
    [Crossref]
  15. D. F. Heath, P. A. Sacher, “Effects of a Simulated High-Energy Space Environment on the Ultraviolet Transmittance of Optical Materials Between 1050 Å and 3000 A,” Appl. Opt. 5, 937 (1966).
    [Crossref] [PubMed]
  16. G. Baldini, L. Rigaldi, “Thin Films in Vacuum Ultraviolet Spectroscopy,” Thin Solid Films 13, 143 (1972).
    [Crossref]
  17. M. W. Williams, R. A. MacRae, E. T. Arakawa, “Optical Properties of Magnesium Fluoride in the Vacuum Ultraviolet,” J. Appl. Phys. 38, 1701 (1967).
    [Crossref]
  18. G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
    [Crossref]
  19. D. Fabre, J. Romand, B. Vodar, “A Contribution to the Study of the Optical Properties of Thin Films in the Far Ultraviolet,” Opt. Acta 9, 73 (1962).
    [Crossref]
  20. B. Vodar, “Absorption Spectra of Bases and Absorption and Reflection Spectra of Solids,” J. Quant. Spectrosc. Radiat. Transfer 2, 393 (1962).
    [Crossref]
  21. T. T. Cole, F. Oppenheimer, “Polarization by Reflection and Some Optical Constants in the Extreme Ultraviolet,” Appl. Opt. 1, 709 (1962).
    [Crossref]
  22. D. Fabre, J. Romand, B. Vodar, “Constants optiques et pouvoir réflecteur de couches minces de fluorures dans l’ultraviolet lointain,” J. Phys. 25, 55 (1964).
    [Crossref]
  23. N. F. Mott, E. A. Davis, Electronic Processes in Noncrystalline Materials (Clarendon, Oxford, 1979), p. 275.
  24. F. Urbach, “The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids,” Phys. Rev. 92, 1324 (1953).
    [Crossref]
  25. Y. Toyozowa, “On the Dynamical Behavior of an Exciton,” Prog. Theor. Phys. Suppl. 12, 111 (1959).
    [Crossref]
  26. H. Mahr, “Absorption Band Shape and Urbach’s Rule of Localized Excitons,” Phys. Rev. 132, 1880 (1963).
    [Crossref]
  27. J. D. Dow, D. Redfield, “Electroabsorption in Semiconductors: the Excitonic Absorption Edge,” Phys. Rev. B 1, 3358 (1970).
    [Crossref]
  28. E. Spiller, “Interference Filters for the Ultraviolet and the Surface Plasmon of Aluminum,” Appl. Opt. 13, 1209 (1974).
    [Crossref] [PubMed]
  29. H. E. Bennett, J. M. Bennett, Phys. Thin Films 4, 46 (1967).
  30. Yu. I. Dymshits, V. A. Korobitsyn, A. A. Metelnikov, “Effect of Heating on the Reflectivity of Aluminum Coatings in the Vacuum Ultraviolet,” Sov. J. Opt. Technol. 46, 649 (1979).

1982 (1)

W. A. Hargreaves, “Magnesium Fluoride Update and Summary of Optical Properties,” Laser Focus 18, 86 (1982).

1979 (1)

Yu. I. Dymshits, V. A. Korobitsyn, A. A. Metelnikov, “Effect of Heating on the Reflectivity of Aluminum Coatings in the Vacuum Ultraviolet,” Sov. J. Opt. Technol. 46, 649 (1979).

1977 (1)

1976 (1)

1974 (2)

1972 (2)

1970 (1)

J. D. Dow, D. Redfield, “Electroabsorption in Semiconductors: the Excitonic Absorption Edge,” Phys. Rev. B 1, 3358 (1970).
[Crossref]

1969 (2)

G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
[Crossref]

G. Hass, J. B. Ramsey, “Vacuum Deposition of Dielectric and Semiconductor Films by a CO2 Laser,” Appl. Opt. 8, 1115 (1969).
[Crossref] [PubMed]

1967 (3)

D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).

M. W. Williams, R. A. MacRae, E. T. Arakawa, “Optical Properties of Magnesium Fluoride in the Vacuum Ultraviolet,” J. Appl. Phys. 38, 1701 (1967).
[Crossref]

H. E. Bennett, J. M. Bennett, Phys. Thin Films 4, 46 (1967).

1966 (2)

1964 (2)

W. R. Hunter, “Optical Constants of Metals in EUV,” J. Opt. Soc. Am. 54, 208 (1964).
[Crossref]

D. Fabre, J. Romand, B. Vodar, “Constants optiques et pouvoir réflecteur de couches minces de fluorures dans l’ultraviolet lointain,” J. Phys. 25, 55 (1964).
[Crossref]

1963 (2)

1962 (3)

D. Fabre, J. Romand, B. Vodar, “A Contribution to the Study of the Optical Properties of Thin Films in the Far Ultraviolet,” Opt. Acta 9, 73 (1962).
[Crossref]

B. Vodar, “Absorption Spectra of Bases and Absorption and Reflection Spectra of Solids,” J. Quant. Spectrosc. Radiat. Transfer 2, 393 (1962).
[Crossref]

T. T. Cole, F. Oppenheimer, “Polarization by Reflection and Some Optical Constants in the Extreme Ultraviolet,” Appl. Opt. 1, 709 (1962).
[Crossref]

1961 (1)

D. Fabre, J. Romand, “Mesures des constantes optiques de dépote évaporés de fluorure de magnesium dans l’ultraviolet de Schumann,” J. Phys. Radium 22, 324 (1961).
[Crossref]

1960 (1)

1959 (2)

G. Hass, R. Tousey, “Reflecting Coatings for the Extreme Ultraviolet,” J. Opt. Soc. Am. 49, 593 (1959).
[Crossref]

Y. Toyozowa, “On the Dynamical Behavior of an Exciton,” Prog. Theor. Phys. Suppl. 12, 111 (1959).
[Crossref]

1958 (1)

A. Duncanson, R. W. H. Stevenson, “Some Properties of Magnesium Fluoride Crystallized from the Melt,” Proc. Phys. Soc. London, 72, 1001 (1958).
[Crossref]

1953 (1)

F. Urbach, “The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids,” Phys. Rev. 92, 1324 (1953).
[Crossref]

Arakawa, E. T.

M. W. Williams, R. A. MacRae, E. T. Arakawa, “Optical Properties of Magnesium Fluoride in the Vacuum Ultraviolet,” J. Appl. Phys. 38, 1701 (1967).
[Crossref]

Baldini, G.

G. Baldini, L. Rigaldi, “Thin Films in Vacuum Ultraviolet Spectroscopy,” Thin Solid Films 13, 143 (1972).
[Crossref]

Barriere, A. S.

Bennett, H. E.

H. E. Bennett, J. M. Bennett, Phys. Thin Films 4, 46 (1967).

Bennett, J. M.

H. E. Bennett, J. M. Bennett, Phys. Thin Films 4, 46 (1967).

Berning, P. H.

Canfield, L. R.

Cole, T. T.

Cox, J. T.

Davis, E. A.

N. F. Mott, E. A. Davis, Electronic Processes in Noncrystalline Materials (Clarendon, Oxford, 1979), p. 275.

Dow, J. D.

J. D. Dow, D. Redfield, “Electroabsorption in Semiconductors: the Excitonic Absorption Edge,” Phys. Rev. B 1, 3358 (1970).
[Crossref]

Duncanson, A.

A. Duncanson, R. W. H. Stevenson, “Some Properties of Magnesium Fluoride Crystallized from the Melt,” Proc. Phys. Soc. London, 72, 1001 (1958).
[Crossref]

Dymshits, Yu. I.

Yu. I. Dymshits, V. A. Korobitsyn, A. A. Metelnikov, “Effect of Heating on the Reflectivity of Aluminum Coatings in the Vacuum Ultraviolet,” Sov. J. Opt. Technol. 46, 649 (1979).

Fabre, D.

D. Fabre, J. Romand, B. Vodar, “Constants optiques et pouvoir réflecteur de couches minces de fluorures dans l’ultraviolet lointain,” J. Phys. 25, 55 (1964).
[Crossref]

D. Fabre, J. Romand, B. Vodar, “A Contribution to the Study of the Optical Properties of Thin Films in the Far Ultraviolet,” Opt. Acta 9, 73 (1962).
[Crossref]

D. Fabre, J. Romand, “Mesures des constantes optiques de dépote évaporés de fluorure de magnesium dans l’ultraviolet de Schumann,” J. Phys. Radium 22, 324 (1961).
[Crossref]

Forbes, F. F.

D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).

Hargreaves, W. A.

W. A. Hargreaves, “Magnesium Fluoride Update and Summary of Optical Properties,” Laser Focus 18, 86 (1982).

Hass, G.

Heath, D. F.

Hunter, W. R.

Hutcheson, E. T.

Korobitsyn, V. A.

Yu. I. Dymshits, V. A. Korobitsyn, A. A. Metelnikov, “Effect of Heating on the Reflectivity of Aluminum Coatings in the Vacuum Ultraviolet,” Sov. J. Opt. Technol. 46, 649 (1979).

Lachter, A.

LeCalvez, Y.

G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
[Crossref]

Lemonier, J. C.

G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
[Crossref]

MacRae, R. A.

M. W. Williams, R. A. MacRae, E. T. Arakawa, “Optical Properties of Magnesium Fluoride in the Vacuum Ultraviolet,” J. Appl. Phys. 38, 1701 (1967).
[Crossref]

Madden, R. P.

Mahr, H.

H. Mahr, “Absorption Band Shape and Urbach’s Rule of Localized Excitons,” Phys. Rev. 132, 1880 (1963).
[Crossref]

Malherbe, A.

Metelnikov, A. A.

Yu. I. Dymshits, V. A. Korobitsyn, A. A. Metelnikov, “Effect of Heating on the Reflectivity of Aluminum Coatings in the Vacuum Ultraviolet,” Sov. J. Opt. Technol. 46, 649 (1979).

Mott, N. F.

N. F. Mott, E. A. Davis, Electronic Processes in Noncrystalline Materials (Clarendon, Oxford, 1979), p. 275.

Oppenheimer, F.

Patterson, D. A.

Phillips, W. G.

D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).

Ramsey, J. B.

Redfield, D.

J. D. Dow, D. Redfield, “Electroabsorption in Semiconductors: the Excitonic Absorption Edge,” Phys. Rev. B 1, 3358 (1970).
[Crossref]

Rigaldi, L.

G. Baldini, L. Rigaldi, “Thin Films in Vacuum Ultraviolet Spectroscopy,” Thin Solid Films 13, 143 (1972).
[Crossref]

Robin, S.

G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
[Crossref]

Romand, J.

D. Fabre, J. Romand, B. Vodar, “Constants optiques et pouvoir réflecteur de couches minces de fluorures dans l’ultraviolet lointain,” J. Phys. 25, 55 (1964).
[Crossref]

D. Fabre, J. Romand, B. Vodar, “A Contribution to the Study of the Optical Properties of Thin Films in the Far Ultraviolet,” Opt. Acta 9, 73 (1962).
[Crossref]

D. Fabre, J. Romand, “Mesures des constantes optiques de dépote évaporés de fluorure de magnesium dans l’ultraviolet de Schumann,” J. Phys. Radium 22, 324 (1961).
[Crossref]

Sacher, P. A.

Spiller, E.

Steinmetz, D. L.

D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).

Stephan, G.

G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
[Crossref]

Stevenson, R. W. H.

A. Duncanson, R. W. H. Stevenson, “Some Properties of Magnesium Fluoride Crystallized from the Melt,” Proc. Phys. Soc. London, 72, 1001 (1958).
[Crossref]

Tousey, R.

Toyozowa, Y.

Y. Toyozowa, “On the Dynamical Behavior of an Exciton,” Prog. Theor. Phys. Suppl. 12, 111 (1959).
[Crossref]

Urbach, F.

F. Urbach, “The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids,” Phys. Rev. 92, 1324 (1953).
[Crossref]

Vaughan, W. H.

Vodar, B.

D. Fabre, J. Romand, B. Vodar, “Constants optiques et pouvoir réflecteur de couches minces de fluorures dans l’ultraviolet lointain,” J. Phys. 25, 55 (1964).
[Crossref]

D. Fabre, J. Romand, B. Vodar, “A Contribution to the Study of the Optical Properties of Thin Films in the Far Ultraviolet,” Opt. Acta 9, 73 (1962).
[Crossref]

B. Vodar, “Absorption Spectra of Bases and Absorption and Reflection Spectra of Solids,” J. Quant. Spectrosc. Radiat. Transfer 2, 393 (1962).
[Crossref]

Waylonis, J. E.

Williams, M. W.

M. W. Williams, R. A. MacRae, E. T. Arakawa, “Optical Properties of Magnesium Fluoride in the Vacuum Ultraviolet,” J. Appl. Phys. 38, 1701 (1967).
[Crossref]

Wirick, M.

D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).

A Polarizer for the VUV (1)

D. L. Steinmetz, W. G. Phillips, M. Wirick, F. F. Forbes, “A Polarizer for the VUV,” 6, 1001 (1967).

Appl. Opt. (9)

L. R. Canfield, G. Hass, J. E. Waylonis, “Further Studies on MgF2-Overcoated Aluminum Mirrors with Highest Reflectance in the Vacuum Ultraviolet,” Appl. Opt. 5, 45 (1966).
[Crossref] [PubMed]

E. T. Hutcheson, G. Hass, J. T. Cox, “Effect of Deposition Rate and Substrate Temperature on the VUV Reflectance of MgF2- and LiF-Overcoated Aluminum Mirrors,” Appl. Opt. 11, 2245 (1972).
[Crossref] [PubMed]

G. Hass, J. B. Ramsey, “Vacuum Deposition of Dielectric and Semiconductor Films by a CO2 Laser,” Appl. Opt. 8, 1115 (1969).
[Crossref] [PubMed]

E. Spiller, “Reflective Multilayer Coatings for the Far UV Region,” Appl. Opt. 15, 2333 (1976).
[Crossref] [PubMed]

A. Malherbe, “Interference Filters for the Far Ultraviolet,” Appl. Opt. 13, 1275 (1974).
[Crossref] [PubMed]

A. S. Barriere, A. Lachter, “Optical Transitions in Disordered Thin Films of the Ionic Compounds MgF2 and AlF3 as a Function of Their Conditions of Preparation,” Appl. Opt. 16, 2865 (1977).
[Crossref] [PubMed]

D. F. Heath, P. A. Sacher, “Effects of a Simulated High-Energy Space Environment on the Ultraviolet Transmittance of Optical Materials Between 1050 Å and 3000 A,” Appl. Opt. 5, 937 (1966).
[Crossref] [PubMed]

T. T. Cole, F. Oppenheimer, “Polarization by Reflection and Some Optical Constants in the Extreme Ultraviolet,” Appl. Opt. 1, 709 (1962).
[Crossref]

E. Spiller, “Interference Filters for the Ultraviolet and the Surface Plasmon of Aluminum,” Appl. Opt. 13, 1209 (1974).
[Crossref] [PubMed]

J. Appl. Phys. (1)

M. W. Williams, R. A. MacRae, E. T. Arakawa, “Optical Properties of Magnesium Fluoride in the Vacuum Ultraviolet,” J. Appl. Phys. 38, 1701 (1967).
[Crossref]

J. Opt. Soc. Am. (4)

J. Phys. (1)

D. Fabre, J. Romand, B. Vodar, “Constants optiques et pouvoir réflecteur de couches minces de fluorures dans l’ultraviolet lointain,” J. Phys. 25, 55 (1964).
[Crossref]

J. Phys. Chem. Solids (1)

G. Stephan, Y. LeCalvez, J. C. Lemonier, S. Robin, “Properties optiques et spectre electronique du MgF2 et du CaF2 de 10 à 48 eV,” J. Phys. Chem. Solids 30, 601 (1969).
[Crossref]

J. Phys. Radium (1)

D. Fabre, J. Romand, “Mesures des constantes optiques de dépote évaporés de fluorure de magnesium dans l’ultraviolet de Schumann,” J. Phys. Radium 22, 324 (1961).
[Crossref]

J. Quant. Spectrosc. Radiat. Transfer (1)

B. Vodar, “Absorption Spectra of Bases and Absorption and Reflection Spectra of Solids,” J. Quant. Spectrosc. Radiat. Transfer 2, 393 (1962).
[Crossref]

Laser Focus (1)

W. A. Hargreaves, “Magnesium Fluoride Update and Summary of Optical Properties,” Laser Focus 18, 86 (1982).

Opt. Acta (1)

D. Fabre, J. Romand, B. Vodar, “A Contribution to the Study of the Optical Properties of Thin Films in the Far Ultraviolet,” Opt. Acta 9, 73 (1962).
[Crossref]

Phys. Rev. (2)

F. Urbach, “The Long-Wavelength Edge of Photographic Sensitivity and of the Electronic Absorption of Solids,” Phys. Rev. 92, 1324 (1953).
[Crossref]

H. Mahr, “Absorption Band Shape and Urbach’s Rule of Localized Excitons,” Phys. Rev. 132, 1880 (1963).
[Crossref]

Phys. Rev. B (1)

J. D. Dow, D. Redfield, “Electroabsorption in Semiconductors: the Excitonic Absorption Edge,” Phys. Rev. B 1, 3358 (1970).
[Crossref]

Phys. Thin Films (1)

H. E. Bennett, J. M. Bennett, Phys. Thin Films 4, 46 (1967).

Proc. Phys. Soc. London (1)

A. Duncanson, R. W. H. Stevenson, “Some Properties of Magnesium Fluoride Crystallized from the Melt,” Proc. Phys. Soc. London, 72, 1001 (1958).
[Crossref]

Prog. Theor. Phys. Suppl. (1)

Y. Toyozowa, “On the Dynamical Behavior of an Exciton,” Prog. Theor. Phys. Suppl. 12, 111 (1959).
[Crossref]

Sov. J. Opt. Technol. (1)

Yu. I. Dymshits, V. A. Korobitsyn, A. A. Metelnikov, “Effect of Heating on the Reflectivity of Aluminum Coatings in the Vacuum Ultraviolet,” Sov. J. Opt. Technol. 46, 649 (1979).

Thin Solid Films (1)

G. Baldini, L. Rigaldi, “Thin Films in Vacuum Ultraviolet Spectroscopy,” Thin Solid Films 13, 143 (1972).
[Crossref]

Other (1)

N. F. Mott, E. A. Davis, Electronic Processes in Noncrystalline Materials (Clarendon, Oxford, 1979), p. 275.

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Figures (6)

Fig. 1
Fig. 1

Transmittance of bare LiF (upper curve) coated with 1000 Å of MgF2, deposited at substrate temperatures of 400°C (middle curve) and 22°C (lower curve), in the wavelength region from 1050 to 1600 Å.

Fig. 2
Fig. 2

Extinction coefficient at a wavelength of 1216 Å for 10000-Å thick MgF2 films deposited onto LiF substrates at ~5.5 Å/sec as a function of the substrate temperature during deposition.

Fig. 3
Fig. 3

TEM photographs of 1000-Å thick MgF2 films deposited on 3-mm diam copper electron microscope grids at (a) 295 K, (b) 573 K, and (c) 823 K.

Fig. 4
Fig. 4

Average grain size for the polycrystalline MgF2 films shown in Fig. 2.

Fig. 5
Fig. 5

Absorption coefficient of (a) single crystal MgF2 plate from Ref. 17, (b) thin MgF2 films deposited onto room temperature substrates from Ref. 22 (solid curve), and this work (solid points).

Fig. 6
Fig. 6

Absorption coefficient of thin MgF2 films deposited onto LiF substrates at 22°C (solid points) and 400°C (solid triangles) as a function of photon energy.

Tables (1)

Tables Icon

Table I Optical Constants of MgF2 Film Deposited onto Room Temperature LiF Substrate Vs Deposition Rate

Equations (3)

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R = R f + T f 2 R 0 exp ( - 2 α l ) 1 - R 0 R exp ( - 2 α l ) ,
T = T f ( 1 - R 0 ) exp ( - α l ) 1 - R 0 R exp ( - 2 α l ) ,
α = α 0 exp [ - σ ( E g - E ) ] .

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