Abstract

The use of plasma chemical vapor deposition (PCVD) of silicon oxynitride (SixOyNz) thin films on Si substrates at the very low temperature of 200°C is reported. Such a low deposition temperature would allow these films to be deposited on substrates with low decomposition or melting temperature. This is particularly significant to some of the important III–V compounds such as GaAs and InP. Another advantage of this low temperature deposition process is that undesired diffusion of dopants already present in the semiconductor substrates is reduced during film deposition. The details on the deposition procedures and the optical characteristics of the films are reported in this paper.

© 1984 Optical Society of America

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References

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  1. P. G. McMullin, U.S. Patent4,186,409 (Jan.1980).
  2. L. D. Cornerford, U.S. Patent4,079,404 (Mar.1978).
  3. M. J. Rand, R. D. Standley, “Silicon Oxynitride Films on Fused Silica for Optical Waveguides,” Appl. Opt. 11, 2482 (1972).
    [CrossRef] [PubMed]
  4. M. J. Rand, U.S. Patent3,558,348 (Jan.1971).
  5. C. M. Drum, M. J. Rand, “A Low Stress Insulating Film on Silicon by Chemical Vapour Deposition,” J. Appl. Phys. 39, 4458 (1968).
    [CrossRef]
  6. D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
    [CrossRef]
  7. P. K. Tien, R. Ulrich, “Theory of Prism-Film Coupler and Guides,” J. Opt. Soc. Am. 60, 1325 (1970).
    [CrossRef]
  8. S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
    [CrossRef]
  9. S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering From a Glass Thin-Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512 (1980).
    [CrossRef]
  10. W. Stutius, W. Streifer, “Silicon Nitride Films on Silicon for Optical Waveguides,” Appl. Opt. 16, 3218 (1977).
    [CrossRef] [PubMed]
  11. D. Marcuse, Theory of Dielectric Optical Waveguides (Academic, New York, 1974).

1982 (1)

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

1980 (1)

S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering From a Glass Thin-Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512 (1980).
[CrossRef]

1977 (1)

1972 (1)

1970 (1)

1968 (2)

C. M. Drum, M. J. Rand, “A Low Stress Insulating Film on Silicon by Chemical Vapour Deposition,” J. Appl. Phys. 39, 4458 (1968).
[CrossRef]

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

Boyd, J. T.

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering From a Glass Thin-Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512 (1980).
[CrossRef]

Brown, D. M.

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

Cornerford, L. D.

L. D. Cornerford, U.S. Patent4,079,404 (Mar.1978).

Davies, R. L.

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

Drum, C. M.

C. M. Drum, M. J. Rand, “A Low Stress Insulating Film on Silicon by Chemical Vapour Deposition,” J. Appl. Phys. 39, 4458 (1968).
[CrossRef]

Dutta, S.

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering From a Glass Thin-Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512 (1980).
[CrossRef]

Gray, P. V.

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

Heumann, F. K.

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

Hickernell, F. S.

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

Jackson, H. E.

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering From a Glass Thin-Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512 (1980).
[CrossRef]

Marcuse, D.

D. Marcuse, Theory of Dielectric Optical Waveguides (Academic, New York, 1974).

McMullin, P. G.

P. G. McMullin, U.S. Patent4,186,409 (Jan.1980).

Philipp, H. P.

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

Rand, M. J.

M. J. Rand, R. D. Standley, “Silicon Oxynitride Films on Fused Silica for Optical Waveguides,” Appl. Opt. 11, 2482 (1972).
[CrossRef] [PubMed]

C. M. Drum, M. J. Rand, “A Low Stress Insulating Film on Silicon by Chemical Vapour Deposition,” J. Appl. Phys. 39, 4458 (1968).
[CrossRef]

M. J. Rand, U.S. Patent3,558,348 (Jan.1971).

Standley, R. D.

Streifer, W.

Stutius, W.

Taft, E. A.

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

Tien, P. K.

Ulrich, R.

Appl. Opt. (2)

Appl. Phys. Lett. (1)

S. Dutta, H. E. Jackson, J. T. Boyd, “Reduction of Scattering From a Glass Thin-Film Optical Waveguide by CO2 Laser Annealing,” Appl. Phys. Lett. 37, 512 (1980).
[CrossRef]

IEEE J. Quantum Electron. (1)

S. Dutta, H. E. Jackson, J. T. Boyd, R. L. Davies, F. S. Hickernell, “CO2 Laser Annealing of Si3N4, Nb2O5, and Ta2O5 Thin Film Optical Waveguides to Achieve Scattering Loss Reaction,” IEEE J. Quantum Electron. QE-18, 800 (1982).
[CrossRef]

J. Appl. Phys. (1)

C. M. Drum, M. J. Rand, “A Low Stress Insulating Film on Silicon by Chemical Vapour Deposition,” J. Appl. Phys. 39, 4458 (1968).
[CrossRef]

J. Electrochem. Soc. (1)

D. M. Brown, P. V. Gray, F. K. Heumann, H. P. Philipp, E. A. Taft, “Properties of SixOyNz Films on Si,” J. Electrochem. Soc. 115, 311 (1968).
[CrossRef]

J. Opt. Soc. Am. (1)

Other (4)

M. J. Rand, U.S. Patent3,558,348 (Jan.1971).

P. G. McMullin, U.S. Patent4,186,409 (Jan.1980).

L. D. Cornerford, U.S. Patent4,079,404 (Mar.1978).

D. Marcuse, Theory of Dielectric Optical Waveguides (Academic, New York, 1974).

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Figures (3)

Fig. 1
Fig. 1

Refractive index n of Si x O y N z thin films as a function of SiH4/N2O gas ratio (GR).

Fig. 2
Fig. 2

Growth rate of Si x O y N z thin films as a function of SiH4/N2O gas ratio.

Fig. 3
Fig. 3

Propagation loss measurement of Si x O y N z thin films with respect to the refractive index n. Curve (a) represents measurement immediately after deposition; curve (b) represents measurement after mild CO2 laser annealing; curve (c) represents measurement for Si x O y N z on fused quartz instead of Si substrate.

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