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  1. D. M. Mattox, “Influence of Oxygen on the Adherence of Gold Films to Oxide Substrates,” J. Appl. Phys. 37, 3613 (1966).
    [CrossRef]
  2. K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), p. 319.
  3. S. S. Nandra, F. G. Wilson, C. D. DesForges, “Modification of Gold Coatings by Ion Bombardment during Deposition,” Thin Solid Films 107, 335 (1983).
    [CrossRef]
  4. I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
    [CrossRef]
  5. P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
    [CrossRef] [PubMed]
  6. P. J. Martin, R. P. Netterfield, W. G. Sainty, “Modification of the Optical and Structural Properties of Dielectric ZrO2 Films by Ion-assisted Deposition,” J. Appl. Phys. 55, 235 (1984).
    [CrossRef]
  7. J. Hamershy, “Feststellung Optimaler Parameter bei Adhäsionomsmessungen unter Anwendung der Ritzmethode,” Thin Solid Films 3, 263 (1969).
    [CrossRef]
  8. P. J. Martin, W. G. Sainty, R. P. Netterfield, “Oxygen-Ion-Assisted Deposition of Thin Gold Films,” submitted to Vaccum.
  9. C. Weaver, “Adhesion of Thin Films,” J. Vac. Sci. Technol. 12, 18 (1975).
    [CrossRef]
  10. L. G. Schulz, F. R. Tangherlini, “Optical Constants of Silver, Gold, Copper, and Aluminum. II. The Index of Refraction n,” J. Opt. Soc. Am. 44, 362 (1954).
    [CrossRef]

1984 (2)

I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
[CrossRef]

P. J. Martin, R. P. Netterfield, W. G. Sainty, “Modification of the Optical and Structural Properties of Dielectric ZrO2 Films by Ion-assisted Deposition,” J. Appl. Phys. 55, 235 (1984).
[CrossRef]

1983 (2)

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

S. S. Nandra, F. G. Wilson, C. D. DesForges, “Modification of Gold Coatings by Ion Bombardment during Deposition,” Thin Solid Films 107, 335 (1983).
[CrossRef]

1975 (1)

C. Weaver, “Adhesion of Thin Films,” J. Vac. Sci. Technol. 12, 18 (1975).
[CrossRef]

1969 (1)

J. Hamershy, “Feststellung Optimaler Parameter bei Adhäsionomsmessungen unter Anwendung der Ritzmethode,” Thin Solid Films 3, 263 (1969).
[CrossRef]

1966 (1)

D. M. Mattox, “Influence of Oxygen on the Adherence of Gold Films to Oxide Substrates,” J. Appl. Phys. 37, 3613 (1966).
[CrossRef]

1954 (1)

Chopra, K. L.

K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), p. 319.

DesForges, C. D.

S. S. Nandra, F. G. Wilson, C. D. DesForges, “Modification of Gold Coatings by Ion Bombardment during Deposition,” Thin Solid Films 107, 335 (1983).
[CrossRef]

Elliman, R. G.

I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
[CrossRef]

Hamershy, J.

J. Hamershy, “Feststellung Optimaler Parameter bei Adhäsionomsmessungen unter Anwendung der Ritzmethode,” Thin Solid Films 3, 263 (1969).
[CrossRef]

Macleod, H. A.

Martin, P. J.

P. J. Martin, R. P. Netterfield, W. G. Sainty, “Modification of the Optical and Structural Properties of Dielectric ZrO2 Films by Ion-assisted Deposition,” J. Appl. Phys. 55, 235 (1984).
[CrossRef]

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, W. G. Sainty, R. P. Netterfield, “Oxygen-Ion-Assisted Deposition of Thin Gold Films,” submitted to Vaccum.

Mattox, D. M.

D. M. Mattox, “Influence of Oxygen on the Adherence of Gold Films to Oxide Substrates,” J. Appl. Phys. 37, 3613 (1966).
[CrossRef]

Mitchell, I. V.

I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
[CrossRef]

Nandra, S. S.

S. S. Nandra, F. G. Wilson, C. D. DesForges, “Modification of Gold Coatings by Ion Bombardment during Deposition,” Thin Solid Films 107, 335 (1983).
[CrossRef]

Netterfield, R. P.

P. J. Martin, R. P. Netterfield, W. G. Sainty, “Modification of the Optical and Structural Properties of Dielectric ZrO2 Films by Ion-assisted Deposition,” J. Appl. Phys. 55, 235 (1984).
[CrossRef]

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, W. G. Sainty, R. P. Netterfield, “Oxygen-Ion-Assisted Deposition of Thin Gold Films,” submitted to Vaccum.

Pacey, C. G.

Sainty, W. G.

P. J. Martin, R. P. Netterfield, W. G. Sainty, “Modification of the Optical and Structural Properties of Dielectric ZrO2 Films by Ion-assisted Deposition,” J. Appl. Phys. 55, 235 (1984).
[CrossRef]

P. J. Martin, H. A. Macleod, R. P. Netterfield, C. G. Pacey, W. G. Sainty, “Ion-Beam-Assisted Deposition of Thin Films,” Appl. Opt. 22, 178 (1983).
[CrossRef] [PubMed]

P. J. Martin, W. G. Sainty, R. P. Netterfield, “Oxygen-Ion-Assisted Deposition of Thin Gold Films,” submitted to Vaccum.

Schulz, L. G.

Smith, P.

I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
[CrossRef]

Tangherlini, F. R.

Weaver, C.

C. Weaver, “Adhesion of Thin Films,” J. Vac. Sci. Technol. 12, 18 (1975).
[CrossRef]

Williams, J. S.

I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
[CrossRef]

Wilson, F. G.

S. S. Nandra, F. G. Wilson, C. D. DesForges, “Modification of Gold Coatings by Ion Bombardment during Deposition,” Thin Solid Films 107, 335 (1983).
[CrossRef]

Appl. Opt. (1)

Appl. Phys. Lett. (1)

I. V. Mitchell, J. S. Williams, P. Smith, R. G. Elliman, “Thin-film Adhesion Changes Induced by Electron Irradiation,” Appl. Phys. Lett. 44, 193 (1984).
[CrossRef]

J. Appl. Phys. (2)

D. M. Mattox, “Influence of Oxygen on the Adherence of Gold Films to Oxide Substrates,” J. Appl. Phys. 37, 3613 (1966).
[CrossRef]

P. J. Martin, R. P. Netterfield, W. G. Sainty, “Modification of the Optical and Structural Properties of Dielectric ZrO2 Films by Ion-assisted Deposition,” J. Appl. Phys. 55, 235 (1984).
[CrossRef]

J. Opt. Soc. Am. (1)

J. Vac. Sci. Technol. (1)

C. Weaver, “Adhesion of Thin Films,” J. Vac. Sci. Technol. 12, 18 (1975).
[CrossRef]

Thin Solid Films (2)

J. Hamershy, “Feststellung Optimaler Parameter bei Adhäsionomsmessungen unter Anwendung der Ritzmethode,” Thin Solid Films 3, 263 (1969).
[CrossRef]

S. S. Nandra, F. G. Wilson, C. D. DesForges, “Modification of Gold Coatings by Ion Bombardment during Deposition,” Thin Solid Films 107, 335 (1983).
[CrossRef]

Other (2)

K. L. Chopra, Thin Film Phenomena (McGraw-Hill, New York, 1969), p. 319.

P. J. Martin, W. G. Sainty, R. P. Netterfield, “Oxygen-Ion-Assisted Deposition of Thin Gold Films,” submitted to Vaccum.

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Figures (1)

Fig. 1
Fig. 1

Reflectivity of gold films produced by evaporation (solid line) and oxygen ion-assisted deposition (broken line). Dashed line is the data of Schulz and Tangherlini.10 Partially assisted film is the same as evaporated film reflectance.

Tables (1)

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Table I Critical Loadings for Films Produced by Various Methods

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