Abstract

A method of obtaining accurate values for the optical parameters of thin film substrates is described. Calculations for reflected and transmitted fluxes in substrate sets are developed allowing for double reflection. A simple procedure to fit measurements is also illustrated. Values for substrate parameters are extracted and used to correct for substrate influence in thin film spectrophotometric measurements. Corrected thin film measurements and data calculated with obtained optical constants are compared.

© 1983 Optical Society of America

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