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Infrared interferometric analysis of thin films and optical surfaces

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Abstract

An interferometric method for the analysis of thin films is extended to the IR region. The method consists of the illumination of the sample from both sides by two coherent beams and the comparative inspection of two outgoing beams. The variation of the emerging beams induced by a relative phase variation of the incoming beams provides adequate information for determination of the thickness, refractive index, and absorption coefficient of a single layer.

© 1982 Optical Society of America

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