Low-loss GeO2 thin-film optical waveguides have been prepared using rf reactive sputtering with a GeO2 target, and the propagation properties of the waveguides prepared over a wide range of fabrication conditions have been investigated. We have found that the waveguide attenuation dramatically decreased when a very low deposition rate of rf reactive sputtering in an argon–oxygen atmosphere was used in conjunction with appropriate annealing. In particular, 3800-Å thick GeO2 thin-film optical waveguides have been prepared with propagation losses <0.7 dB/cm for the TE0 mode at a wavelength of 0.63 μm. The average refractive index of the GeO2 films was measured to be 1.6059 at λ = 5461 Å by an ellipsometer technique in good agreement with measurement on bulk materials. Propagation losses have also been measured at different wavelengths, which shows that GeO2 thin-film optical waveguides could be used over a very wide wavelength range from the visible to the near infrared.
© 1982 Optical Society of AmericaFull Article | PDF Article
OSA Recommended Articles
A. Chiasera, C. Macchi, S. Mariazzi, S. Valligatla, L. Lunelli, C. Pederzolli, D.N. Rao, A. Somoza, R.S. Brusa, and M. Ferrari
Opt. Mater. Express 3(9) 1561-1570 (2013)
Appl. Opt. 21(23) 4280-4289 (1982)
Rabi Rabady and Ivan Avrutsky
Appl. Opt. 44(3) 378-383 (2005)