Abstract
A multiangle single-wavelength ellipsometric method has been applied to the
evaluation of anisotropy and stress in SiO2 films grown on silicon
substrate. The method is nondestructive, and it does not require a
priori knowledge of the dielectric functions of the oxide layer. A
novel theoretical anisotropic multiple-layer program is used to calculate the
Fresnel reflection coefficients at various angles of incidence; and an iterative
least-squares algorithm compares the theoretical calculations to the
experimental data. The data-fitting process yields the index, the thickness, and
the anisotropy of the oxide layer and also the index and thickness of the
SiOx transition layer.
© 1982 Optical Society of America
Full Article |
PDF Article
More Like This
References
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access OSA Member Subscription
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access OSA Member Subscription
Tables (1)
You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access OSA Member Subscription
Equations (13)
You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access OSA Member Subscription
Metrics
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access OSA Member Subscription