Abstract

It has been possible to obtain mirrors of very high reflectivity by following the simple four-step procedure described herein. The key to success is the ability to measure the scattering and other losses of the substrates and dielectric coatings to ensure that the specifications are being met. These measurements are especially critical in the important cleaning process. The cavity-attenuated phase-shift (CAPS) method is ideally suited for performing these important measurements, permitting us to obtain mirrors with reflectivities of R = 0.99975 ± 0.00005.

© 1981 Optical Society of America

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References

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  1. J. M. Herbelin, J. A. McKay, M. A. Kwok, R. H. Ueunten, D. S. Urevig, D. J. Spencer, D. J. Benard, Appl. Opt. 19, 144 (1980).
    [CrossRef] [PubMed]
  2. V. E. Sanders, Appl. Opt. 16, 19 (1977).
    [CrossRef] [PubMed]

1980 (1)

1977 (1)

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Figures (6)

Fig. 1
Fig. 1

Photograph of a quartz substrate before cleaning as observed through a dark-field microscope at 400× magnification. The field of view is 0.5 mm.

Fig. 2
Fig. 2

Photograph of a cleaned quartz substrate as viewed through a dark-field microscope at 400× magnification. The field of view is 0.5 mm.

Fig. 3
Fig. 3

Physical layout of the optic train and phase shift measurement equipment used to measure the average lifetime of photons in the optical resonator.

Fig. 4
Fig. 4

These figures show the two specific orientations of the quartz substrate sample at Brewster’s angle and at normal (perpendicular) incidence with the optical resonator.

Fig. 5
Fig. 5

Mounting block and cover used for transporting and coating of the cleaned substrate. The container can be evacuated and filled with an invert gas for storage.

Fig. 6
Fig. 6

Alternate three-mirror optical resonator configuration for use with nontransparent substrate mirror reflectance measurement at angle θ.

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