Abstract

The dielectric function = 1 + i∊2 has been determined for Al2O3 films prepared by electron beam evaporation, in the 5–50-μm wavelength range. The data were extracted from spectrophotometric recordings of transmittance and reflectance by use of a novel technique. Supplementary measurements were made of the refractive index for visible and near-infrared wavelengths and of the dielectric constant at 1 MHz. Kramers-Kronig analysis was employed to check the consistency of our results for 1 and 2.

© 1981 Optical Society of America

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  1. A. Hjortsberg, Thin Solid Films 69, L15 (1980);Appl. Opt. 20, 1254 (1981).
  2. R. E. Hahn, B. O. Seraphin, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 1.
  3. B. O. Seraphin, in Solar Energy Conversion: Solid State Physics Aspects, B. O. Seraphin, Ed. (Springer, Heidelberg, 1979), p. 5.
  4. R. E. Peterson, J. R. Ramsey, J. Vac. Sci. Technol. 12, 471 (1975).
  5. H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).
  6. R. C. Bastien, R. R. Austin, T. P. Pottenger, Proc. Soc. Photo-Opt. Instrum. Eng. 140, 140 (1978).
  7. Å. Andersson, O. Hunderi, C. G. Granqvist, J. Appl. Phys. 51, 754 (1980).
  8. C. G. Granqvist, A. Hjortsberg, J. Appl. Phys., to be published.
  9. L. Harris, J. Opt. Soc. Am. 45, 27 (1955).
  10. L. Harris, J. Piper, J. Opt. Soc. Am. 52, 223 (1962).
  11. A. S. Barker, Phys. Rev. 132, 1474 (1963).
  12. H. G. Häfele, Z. Naturforsch. 18a331 (1963).
  13. B. Piriou, C. R. Acad. Sci. 25, 250 (1964);Rev. Hautes Temp. Refract. 3, 109 (1966).
  14. K. N. Kuksenko, M. I. Musatov, V. I. Vettegren, Opt. Mekh. Promst. 43, 73 (1976) [Sov. J. Opt. Technol. 43, 62 (1976)].
  15. P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem. Soc. 125, 299 (1978).
  16. J. T. Cox, G. Hass, J. B. Ramsey, J. Phys. (Paris) 25, 250 (1964).The data are reproduced by J. T. Cox, G. Hass, in Physics of Thin Films, G. Hass, R. E. Thun, Eds. (Academic, New York, 1964), Vol. 2, p. 239and by G. Hass, E. Ritter, J. Vac. Sci. Technol. 4, 71 (1967).
  17. G. C. Wood, in Oxides and Oxide Films, J. W. Diggle, Ed. (Marcel Dekker, New York, 1973), Vol. 2, p. 167.
  18. V. Ya. Alvazov, B. O. Bertush, Neorg. Mater. 8, 259 (1972) [Inorg. Mater. (USSR) 8, 230 (1972)].
  19. D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 9, 326 (1972).
  20. C. Feldman, M. Hacskaylo, Rev. Sci. Instrum. 33, 1459 (1962).
  21. E. Ferrieu, B. Pruniaux, J. Electrochem. Soc. 116, 1008 (1969).
  22. C. A. T. Salama, J. Electrochem. Soc. 117, 913 (1970).
  23. D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 8, 107 (1971).
  24. G. A. Egorova, E. V. Potapov, A. V. Rakov, Opt. Spectrosk. 41, 643 (1976) [Opt. Spectrosc. 41, 377 (1976)].
  25. I. H. Malitson, F. V. Murphy, W. S. Rodney, J. Opt. Soc. Am. 48, 72 (1958);I. H. Malitson, J. Opt. Soc. Am. 52, 1377 (1962.)
  26. M. Hennig, Z. Physik 144, 296 (1956).
  27. I. H. Khan, J. S. Ll. Leach, N. J. M. Wilkins, Corros. Sci. 6, 483 (1966).
  28. G. Hass, J. Opt. Soc. Am. 39, 532 (1949).
  29. W. Ch. van Geel, B. J. J. Schelen, Philips Res. Rep.12, 240 (1957).
  30. A. C. Harkness, L. Young, Can. J. Chem. 44, 2409 (1966).
  31. R. M. Goldstein, R. J. Lederich, F. W. Leonhard, J. Electrochem. Soc. 117, 503 (1970).
  32. C. J. Dell'Oca, Thin Solid Films 26, 371 (1975).
  33. C. K. Dyer, R. S. Alwitt, Electrochim. Acta 23, 347 (1978).
  34. G. Hass, J. B. Ramsey, J. J. Triolo, H. T. Albright, in Thermophysics and Temperature Control of Spacecraft and Entry Vehicles, G. B. Heller, Ed. (Academic, New York, 1966), p. 47.The data are reproduced by G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.
  35. G. Hass, J. B. Heaney, J. J. Triolo, Opt. Commun. 8, 183 (1973).
  36. J. H. Weaver, Plating 51, 1165 (1964).
  37. Tran Thach Lan, F. Naudin, P. Robbe-Bourget, J. Phys. (Paris) 25, 11 (1964).
  38. A. B. Kiss, E. Szontágh, Acta Chim. (Budapest) 92, 129 (1977).
  39. J. Yamamoto, Cryogenics 19, 87 (1979).
  40. V. T. Belov, E. A. Kopylova, V. I. Antonyuk, Zh. Prikl. Khim. 52, 2663 (1979) [J. Appl. Chem. USSR 52, 2523 (1979)].
  41. M. Handke, C. Paluszkiewicz, W. Wyrwa, Mat. Chem. 5, 199 (1980).
  42. See, for example, O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).
  43. A. Hjortsberg, C. G. Granqvist, Appl. Opt. 19, 1694 (1980).
  44. V. S. Vinogradov, Fiz. Tverd. Tela 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].
  45. E. Schlömann, Phys. Rev. A: 135, 413 (1964).
  46. I. H. Pratt, Thin Solid Films 3, R23 (1969).
  47. H. Birey, J. Appl. Phys. 48, 5209 (1977).
  48. E. M. DaSilva, P. White, J. Electrochem. Soc. 109, 12 (1962).
  49. S. Wernick, R. Pinner, The Surface Treatment and Finishing of Aluminium (Robert Draper, Teddington, England), Vol. 2, p. 818.
  50. A. Waxman, K. H. Zaininger, Appl. Phys. Lett. 3, 109 (1968).
  51. M. T. Duffy, A. G. Revesz, J. Electrochem. Soc. 117, 372 (1970).
  52. V. F. Korzo, Neorg. Mater. 12, 1224 (1976) [Inorg. Mater. (USSR) 12, 1020 (1976)].
  53. B. A. Vishnyakov, B. L. Arutyunyan, Neorg. Mater. 10, 613 (1974) [Inorg. Mater. (USSR) 10, 523 (1974)].
  54. E. V. Loewenstein, J. Opt. Soc. Am. 51, 108 (1961).
  55. S. Roberts, D. D. Coon, J. Opt. Soc. Am. 52, 1023 (1962).
  56. E. E. Russell, E. E. Bell, J. Opt. Soc. Am. 57, 543 (1967).
  57. E. V. Loewenstein, D. R. Smith, R. L. Morgan, Appl. Opt. 12, 398 (1973).

1980 (4)

M. Handke, C. Paluszkiewicz, W. Wyrwa, Mat. Chem. 5, 199 (1980).

A. Hjortsberg, Thin Solid Films 69, L15 (1980);Appl. Opt. 20, 1254 (1981).

Å. Andersson, O. Hunderi, C. G. Granqvist, J. Appl. Phys. 51, 754 (1980).

A. Hjortsberg, C. G. Granqvist, Appl. Opt. 19, 1694 (1980).

1979 (3)

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

J. Yamamoto, Cryogenics 19, 87 (1979).

V. T. Belov, E. A. Kopylova, V. I. Antonyuk, Zh. Prikl. Khim. 52, 2663 (1979) [J. Appl. Chem. USSR 52, 2523 (1979)].

1978 (3)

P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem. Soc. 125, 299 (1978).

C. K. Dyer, R. S. Alwitt, Electrochim. Acta 23, 347 (1978).

R. C. Bastien, R. R. Austin, T. P. Pottenger, Proc. Soc. Photo-Opt. Instrum. Eng. 140, 140 (1978).

1977 (2)

A. B. Kiss, E. Szontágh, Acta Chim. (Budapest) 92, 129 (1977).

H. Birey, J. Appl. Phys. 48, 5209 (1977).

1976 (3)

V. F. Korzo, Neorg. Mater. 12, 1224 (1976) [Inorg. Mater. (USSR) 12, 1020 (1976)].

G. A. Egorova, E. V. Potapov, A. V. Rakov, Opt. Spectrosk. 41, 643 (1976) [Opt. Spectrosc. 41, 377 (1976)].

K. N. Kuksenko, M. I. Musatov, V. I. Vettegren, Opt. Mekh. Promst. 43, 73 (1976) [Sov. J. Opt. Technol. 43, 62 (1976)].

1975 (2)

C. J. Dell'Oca, Thin Solid Films 26, 371 (1975).

R. E. Peterson, J. R. Ramsey, J. Vac. Sci. Technol. 12, 471 (1975).

1974 (1)

B. A. Vishnyakov, B. L. Arutyunyan, Neorg. Mater. 10, 613 (1974) [Inorg. Mater. (USSR) 10, 523 (1974)].

1973 (2)

G. Hass, J. B. Heaney, J. J. Triolo, Opt. Commun. 8, 183 (1973).

E. V. Loewenstein, D. R. Smith, R. L. Morgan, Appl. Opt. 12, 398 (1973).

1972 (2)

V. Ya. Alvazov, B. O. Bertush, Neorg. Mater. 8, 259 (1972) [Inorg. Mater. (USSR) 8, 230 (1972)].

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 9, 326 (1972).

1971 (1)

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 8, 107 (1971).

1970 (3)

R. M. Goldstein, R. J. Lederich, F. W. Leonhard, J. Electrochem. Soc. 117, 503 (1970).

M. T. Duffy, A. G. Revesz, J. Electrochem. Soc. 117, 372 (1970).

C. A. T. Salama, J. Electrochem. Soc. 117, 913 (1970).

1969 (2)

E. Ferrieu, B. Pruniaux, J. Electrochem. Soc. 116, 1008 (1969).

I. H. Pratt, Thin Solid Films 3, R23 (1969).

1968 (1)

A. Waxman, K. H. Zaininger, Appl. Phys. Lett. 3, 109 (1968).

1967 (1)

1966 (2)

I. H. Khan, J. S. Ll. Leach, N. J. M. Wilkins, Corros. Sci. 6, 483 (1966).

A. C. Harkness, L. Young, Can. J. Chem. 44, 2409 (1966).

1964 (5)

J. H. Weaver, Plating 51, 1165 (1964).

Tran Thach Lan, F. Naudin, P. Robbe-Bourget, J. Phys. (Paris) 25, 11 (1964).

J. T. Cox, G. Hass, J. B. Ramsey, J. Phys. (Paris) 25, 250 (1964).The data are reproduced by J. T. Cox, G. Hass, in Physics of Thin Films, G. Hass, R. E. Thun, Eds. (Academic, New York, 1964), Vol. 2, p. 239and by G. Hass, E. Ritter, J. Vac. Sci. Technol. 4, 71 (1967).

B. Piriou, C. R. Acad. Sci. 25, 250 (1964);Rev. Hautes Temp. Refract. 3, 109 (1966).

E. Schlömann, Phys. Rev. A: 135, 413 (1964).

1963 (2)

A. S. Barker, Phys. Rev. 132, 1474 (1963).

H. G. Häfele, Z. Naturforsch. 18a331 (1963).

1962 (4)

C. Feldman, M. Hacskaylo, Rev. Sci. Instrum. 33, 1459 (1962).

E. M. DaSilva, P. White, J. Electrochem. Soc. 109, 12 (1962).

L. Harris, J. Piper, J. Opt. Soc. Am. 52, 223 (1962).

S. Roberts, D. D. Coon, J. Opt. Soc. Am. 52, 1023 (1962).

1961 (1)

1960 (1)

V. S. Vinogradov, Fiz. Tverd. Tela 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].

1958 (1)

1956 (1)

M. Hennig, Z. Physik 144, 296 (1956).

1955 (1)

1949 (1)

Albright, H. T.

G. Hass, J. B. Ramsey, J. J. Triolo, H. T. Albright, in Thermophysics and Temperature Control of Spacecraft and Entry Vehicles, G. B. Heller, Ed. (Academic, New York, 1966), p. 47.The data are reproduced by G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

Alig, R. C.

P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem. Soc. 125, 299 (1978).

Alvazov, V. Ya.

V. Ya. Alvazov, B. O. Bertush, Neorg. Mater. 8, 259 (1972) [Inorg. Mater. (USSR) 8, 230 (1972)].

Alwitt, R. S.

C. K. Dyer, R. S. Alwitt, Electrochim. Acta 23, 347 (1978).

Andersson, Å.

Å. Andersson, O. Hunderi, C. G. Granqvist, J. Appl. Phys. 51, 754 (1980).

Antonyuk, V. I.

V. T. Belov, E. A. Kopylova, V. I. Antonyuk, Zh. Prikl. Khim. 52, 2663 (1979) [J. Appl. Chem. USSR 52, 2523 (1979)].

Arutyunyan, B. L.

B. A. Vishnyakov, B. L. Arutyunyan, Neorg. Mater. 10, 613 (1974) [Inorg. Mater. (USSR) 10, 523 (1974)].

Austin, R. R.

R. C. Bastien, R. R. Austin, T. P. Pottenger, Proc. Soc. Photo-Opt. Instrum. Eng. 140, 140 (1978).

Barker, A. S.

A. S. Barker, Phys. Rev. 132, 1474 (1963).

Bartynski, R.

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

Bastien, R. C.

R. C. Bastien, R. R. Austin, T. P. Pottenger, Proc. Soc. Photo-Opt. Instrum. Eng. 140, 140 (1978).

Bell, E. E.

Belov, V. T.

V. T. Belov, E. A. Kopylova, V. I. Antonyuk, Zh. Prikl. Khim. 52, 2663 (1979) [J. Appl. Chem. USSR 52, 2523 (1979)].

Bertush, B. O.

V. Ya. Alvazov, B. O. Bertush, Neorg. Mater. 8, 259 (1972) [Inorg. Mater. (USSR) 8, 230 (1972)].

Birey, H.

H. Birey, J. Appl. Phys. 48, 5209 (1977).

Buhrman, R. A.

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

Coon, D. D.

Cox, J. T.

J. T. Cox, G. Hass, J. B. Ramsey, J. Phys. (Paris) 25, 250 (1964).The data are reproduced by J. T. Cox, G. Hass, in Physics of Thin Films, G. Hass, R. E. Thun, Eds. (Academic, New York, 1964), Vol. 2, p. 239and by G. Hass, E. Ritter, J. Vac. Sci. Technol. 4, 71 (1967).

Craighead, H. G.

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

DaSilva, E. M.

E. M. DaSilva, P. White, J. Electrochem. Soc. 109, 12 (1962).

Dell'Oca, C. J.

C. J. Dell'Oca, Thin Solid Films 26, 371 (1975).

Duffy, M. T.

P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem. Soc. 125, 299 (1978).

M. T. Duffy, A. G. Revesz, J. Electrochem. Soc. 117, 372 (1970).

Dyer, C. K.

C. K. Dyer, R. S. Alwitt, Electrochim. Acta 23, 347 (1978).

Egorova, G. A.

G. A. Egorova, E. V. Potapov, A. V. Rakov, Opt. Spectrosk. 41, 643 (1976) [Opt. Spectrosc. 41, 377 (1976)].

Feldman, C.

C. Feldman, M. Hacskaylo, Rev. Sci. Instrum. 33, 1459 (1962).

Ferrieu, E.

E. Ferrieu, B. Pruniaux, J. Electrochem. Soc. 116, 1008 (1969).

Goldstein, R. M.

R. M. Goldstein, R. J. Lederich, F. W. Leonhard, J. Electrochem. Soc. 117, 503 (1970).

Granqvist, C. G.

Å. Andersson, O. Hunderi, C. G. Granqvist, J. Appl. Phys. 51, 754 (1980).

A. Hjortsberg, C. G. Granqvist, Appl. Opt. 19, 1694 (1980).

C. G. Granqvist, A. Hjortsberg, J. Appl. Phys., to be published.

Hacskaylo, M.

C. Feldman, M. Hacskaylo, Rev. Sci. Instrum. 33, 1459 (1962).

Häfele, H. G.

H. G. Häfele, Z. Naturforsch. 18a331 (1963).

Hahn, R. E.

R. E. Hahn, B. O. Seraphin, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 1.

Handke, M.

M. Handke, C. Paluszkiewicz, W. Wyrwa, Mat. Chem. 5, 199 (1980).

Harkness, A. C.

A. C. Harkness, L. Young, Can. J. Chem. 44, 2409 (1966).

Harris, L.

Hass, G.

G. Hass, J. B. Heaney, J. J. Triolo, Opt. Commun. 8, 183 (1973).

J. T. Cox, G. Hass, J. B. Ramsey, J. Phys. (Paris) 25, 250 (1964).The data are reproduced by J. T. Cox, G. Hass, in Physics of Thin Films, G. Hass, R. E. Thun, Eds. (Academic, New York, 1964), Vol. 2, p. 239and by G. Hass, E. Ritter, J. Vac. Sci. Technol. 4, 71 (1967).

G. Hass, J. Opt. Soc. Am. 39, 532 (1949).

G. Hass, J. B. Ramsey, J. J. Triolo, H. T. Albright, in Thermophysics and Temperature Control of Spacecraft and Entry Vehicles, G. B. Heller, Ed. (Academic, New York, 1966), p. 47.The data are reproduced by G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

Heaney, J. B.

G. Hass, J. B. Heaney, J. J. Triolo, Opt. Commun. 8, 183 (1973).

Heavens, O. S.

See, for example, O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).

Hennig, M.

M. Hennig, Z. Physik 144, 296 (1956).

Hjortsberg, A.

A. Hjortsberg, C. G. Granqvist, Appl. Opt. 19, 1694 (1980).

A. Hjortsberg, Thin Solid Films 69, L15 (1980);Appl. Opt. 20, 1254 (1981).

C. G. Granqvist, A. Hjortsberg, J. Appl. Phys., to be published.

Hoffman, D.

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 9, 326 (1972).

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 8, 107 (1971).

Hunderi, O.

Å. Andersson, O. Hunderi, C. G. Granqvist, J. Appl. Phys. 51, 754 (1980).

Khan, I. H.

I. H. Khan, J. S. Ll. Leach, N. J. M. Wilkins, Corros. Sci. 6, 483 (1966).

Kiss, A. B.

A. B. Kiss, E. Szontágh, Acta Chim. (Budapest) 92, 129 (1977).

Kopylova, E. A.

V. T. Belov, E. A. Kopylova, V. I. Antonyuk, Zh. Prikl. Khim. 52, 2663 (1979) [J. Appl. Chem. USSR 52, 2523 (1979)].

Korzo, V. F.

V. F. Korzo, Neorg. Mater. 12, 1224 (1976) [Inorg. Mater. (USSR) 12, 1020 (1976)].

Kuksenko, K. N.

K. N. Kuksenko, M. I. Musatov, V. I. Vettegren, Opt. Mekh. Promst. 43, 73 (1976) [Sov. J. Opt. Technol. 43, 62 (1976)].

Leach, J. S. Ll.

I. H. Khan, J. S. Ll. Leach, N. J. M. Wilkins, Corros. Sci. 6, 483 (1966).

Lederich, R. J.

R. M. Goldstein, R. J. Lederich, F. W. Leonhard, J. Electrochem. Soc. 117, 503 (1970).

Leibowitz, D.

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 9, 326 (1972).

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 8, 107 (1971).

Leonhard, F. W.

R. M. Goldstein, R. J. Lederich, F. W. Leonhard, J. Electrochem. Soc. 117, 503 (1970).

Loewenstein, E. V.

Malitson, I. H.

Morgan, R. L.

Murphy, F. V.

Musatov, M. I.

K. N. Kuksenko, M. I. Musatov, V. I. Vettegren, Opt. Mekh. Promst. 43, 73 (1976) [Sov. J. Opt. Technol. 43, 62 (1976)].

Naudin, F.

Tran Thach Lan, F. Naudin, P. Robbe-Bourget, J. Phys. (Paris) 25, 11 (1964).

Paluszkiewicz, C.

M. Handke, C. Paluszkiewicz, W. Wyrwa, Mat. Chem. 5, 199 (1980).

Peterson, R. E.

R. E. Peterson, J. R. Ramsey, J. Vac. Sci. Technol. 12, 471 (1975).

Pinner, R.

S. Wernick, R. Pinner, The Surface Treatment and Finishing of Aluminium (Robert Draper, Teddington, England), Vol. 2, p. 818.

Piper, J.

Piriou, B.

B. Piriou, C. R. Acad. Sci. 25, 250 (1964);Rev. Hautes Temp. Refract. 3, 109 (1966).

Potapov, E. V.

G. A. Egorova, E. V. Potapov, A. V. Rakov, Opt. Spectrosk. 41, 643 (1976) [Opt. Spectrosc. 41, 377 (1976)].

Pottenger, T. P.

R. C. Bastien, R. R. Austin, T. P. Pottenger, Proc. Soc. Photo-Opt. Instrum. Eng. 140, 140 (1978).

Pratt, I. H.

I. H. Pratt, Thin Solid Films 3, R23 (1969).

Pruniaux, B.

E. Ferrieu, B. Pruniaux, J. Electrochem. Soc. 116, 1008 (1969).

Rakov, A. V.

G. A. Egorova, E. V. Potapov, A. V. Rakov, Opt. Spectrosk. 41, 643 (1976) [Opt. Spectrosc. 41, 377 (1976)].

Ramsey, J. B.

J. T. Cox, G. Hass, J. B. Ramsey, J. Phys. (Paris) 25, 250 (1964).The data are reproduced by J. T. Cox, G. Hass, in Physics of Thin Films, G. Hass, R. E. Thun, Eds. (Academic, New York, 1964), Vol. 2, p. 239and by G. Hass, E. Ritter, J. Vac. Sci. Technol. 4, 71 (1967).

G. Hass, J. B. Ramsey, J. J. Triolo, H. T. Albright, in Thermophysics and Temperature Control of Spacecraft and Entry Vehicles, G. B. Heller, Ed. (Academic, New York, 1966), p. 47.The data are reproduced by G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

Ramsey, J. R.

R. E. Peterson, J. R. Ramsey, J. Vac. Sci. Technol. 12, 471 (1975).

Revesz, A. G.

M. T. Duffy, A. G. Revesz, J. Electrochem. Soc. 117, 372 (1970).

Robbe-Bourget, P.

Tran Thach Lan, F. Naudin, P. Robbe-Bourget, J. Phys. (Paris) 25, 11 (1964).

Roberts, S.

Rodney, W. S.

Russell, E. E.

Salama, C. A. T.

C. A. T. Salama, J. Electrochem. Soc. 117, 913 (1970).

Schelen, B. J. J.

W. Ch. van Geel, B. J. J. Schelen, Philips Res. Rep.12, 240 (1957).

Schlömann, E.

E. Schlömann, Phys. Rev. A: 135, 413 (1964).

Seraphin, B. O.

R. E. Hahn, B. O. Seraphin, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 1.

B. O. Seraphin, in Solar Energy Conversion: Solid State Physics Aspects, B. O. Seraphin, Ed. (Springer, Heidelberg, 1979), p. 5.

Sievers, A. J.

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

Smith, D. R.

Szontágh, E.

A. B. Kiss, E. Szontágh, Acta Chim. (Budapest) 92, 129 (1977).

Thach Lan, Tran

Tran Thach Lan, F. Naudin, P. Robbe-Bourget, J. Phys. (Paris) 25, 11 (1964).

Triolo, J. J.

G. Hass, J. B. Heaney, J. J. Triolo, Opt. Commun. 8, 183 (1973).

G. Hass, J. B. Ramsey, J. J. Triolo, H. T. Albright, in Thermophysics and Temperature Control of Spacecraft and Entry Vehicles, G. B. Heller, Ed. (Academic, New York, 1966), p. 47.The data are reproduced by G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

van Geel, W. Ch.

W. Ch. van Geel, B. J. J. Schelen, Philips Res. Rep.12, 240 (1957).

Vettegren, V. I.

K. N. Kuksenko, M. I. Musatov, V. I. Vettegren, Opt. Mekh. Promst. 43, 73 (1976) [Sov. J. Opt. Technol. 43, 62 (1976)].

Vinogradov, V. S.

V. S. Vinogradov, Fiz. Tverd. Tela 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].

Vishnyakov, B. A.

B. A. Vishnyakov, B. L. Arutyunyan, Neorg. Mater. 10, 613 (1974) [Inorg. Mater. (USSR) 10, 523 (1974)].

Waxman, A.

A. Waxman, K. H. Zaininger, Appl. Phys. Lett. 3, 109 (1968).

Weaver, J. H.

J. H. Weaver, Plating 51, 1165 (1964).

Wernick, S.

S. Wernick, R. Pinner, The Surface Treatment and Finishing of Aluminium (Robert Draper, Teddington, England), Vol. 2, p. 818.

White, P.

E. M. DaSilva, P. White, J. Electrochem. Soc. 109, 12 (1962).

Wilkins, N. J. M.

I. H. Khan, J. S. Ll. Leach, N. J. M. Wilkins, Corros. Sci. 6, 483 (1966).

Wojcik, L.

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

Wood, G. C.

G. C. Wood, in Oxides and Oxide Films, J. W. Diggle, Ed. (Marcel Dekker, New York, 1973), Vol. 2, p. 167.

Wyrwa, W.

M. Handke, C. Paluszkiewicz, W. Wyrwa, Mat. Chem. 5, 199 (1980).

Yamamoto, J.

J. Yamamoto, Cryogenics 19, 87 (1979).

Young, L.

A. C. Harkness, L. Young, Can. J. Chem. 44, 2409 (1966).

Zaininger, K. H.

A. Waxman, K. H. Zaininger, Appl. Phys. Lett. 3, 109 (1968).

Zanzucchi, P. J.

P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem. Soc. 125, 299 (1978).

Acta Chim. (Budapest) (1)

A. B. Kiss, E. Szontágh, Acta Chim. (Budapest) 92, 129 (1977).

Appl. Opt. (2)

Appl. Phys. Lett. (1)

A. Waxman, K. H. Zaininger, Appl. Phys. Lett. 3, 109 (1968).

C. R. Acad. Sci. (1)

B. Piriou, C. R. Acad. Sci. 25, 250 (1964);Rev. Hautes Temp. Refract. 3, 109 (1966).

Can. J. Chem. (1)

A. C. Harkness, L. Young, Can. J. Chem. 44, 2409 (1966).

Corros. Sci. (1)

I. H. Khan, J. S. Ll. Leach, N. J. M. Wilkins, Corros. Sci. 6, 483 (1966).

Cryogenics (1)

J. Yamamoto, Cryogenics 19, 87 (1979).

Electrochim. Acta (1)

C. K. Dyer, R. S. Alwitt, Electrochim. Acta 23, 347 (1978).

Fiz. Tverd. Tela (1)

V. S. Vinogradov, Fiz. Tverd. Tela 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].

J. Appl. Phys. (2)

Å. Andersson, O. Hunderi, C. G. Granqvist, J. Appl. Phys. 51, 754 (1980).

H. Birey, J. Appl. Phys. 48, 5209 (1977).

J. Electrochem. Soc. (6)

E. M. DaSilva, P. White, J. Electrochem. Soc. 109, 12 (1962).

M. T. Duffy, A. G. Revesz, J. Electrochem. Soc. 117, 372 (1970).

P. J. Zanzucchi, M. T. Duffy, R. C. Alig, J. Electrochem. Soc. 125, 299 (1978).

R. M. Goldstein, R. J. Lederich, F. W. Leonhard, J. Electrochem. Soc. 117, 503 (1970).

E. Ferrieu, B. Pruniaux, J. Electrochem. Soc. 116, 1008 (1969).

C. A. T. Salama, J. Electrochem. Soc. 117, 913 (1970).

J. Opt. Soc. Am. (7)

J. Phys. (Paris) (2)

Tran Thach Lan, F. Naudin, P. Robbe-Bourget, J. Phys. (Paris) 25, 11 (1964).

J. T. Cox, G. Hass, J. B. Ramsey, J. Phys. (Paris) 25, 250 (1964).The data are reproduced by J. T. Cox, G. Hass, in Physics of Thin Films, G. Hass, R. E. Thun, Eds. (Academic, New York, 1964), Vol. 2, p. 239and by G. Hass, E. Ritter, J. Vac. Sci. Technol. 4, 71 (1967).

J. Vac. Sci. Technol. (3)

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 9, 326 (1972).

R. E. Peterson, J. R. Ramsey, J. Vac. Sci. Technol. 12, 471 (1975).

D. Hoffman, D. Leibowitz, J. Vac. Sci. Technol. 8, 107 (1971).

Mat. Chem. (1)

M. Handke, C. Paluszkiewicz, W. Wyrwa, Mat. Chem. 5, 199 (1980).

Neorg. Mater. (3)

V. Ya. Alvazov, B. O. Bertush, Neorg. Mater. 8, 259 (1972) [Inorg. Mater. (USSR) 8, 230 (1972)].

V. F. Korzo, Neorg. Mater. 12, 1224 (1976) [Inorg. Mater. (USSR) 12, 1020 (1976)].

B. A. Vishnyakov, B. L. Arutyunyan, Neorg. Mater. 10, 613 (1974) [Inorg. Mater. (USSR) 10, 523 (1974)].

Opt. Commun. (1)

G. Hass, J. B. Heaney, J. J. Triolo, Opt. Commun. 8, 183 (1973).

Opt. Mekh. Promst. (1)

K. N. Kuksenko, M. I. Musatov, V. I. Vettegren, Opt. Mekh. Promst. 43, 73 (1976) [Sov. J. Opt. Technol. 43, 62 (1976)].

Opt. Spectrosk. (1)

G. A. Egorova, E. V. Potapov, A. V. Rakov, Opt. Spectrosk. 41, 643 (1976) [Opt. Spectrosc. 41, 377 (1976)].

Phys. Rev. (1)

A. S. Barker, Phys. Rev. 132, 1474 (1963).

Phys. Rev. A: (1)

E. Schlömann, Phys. Rev. A: 135, 413 (1964).

Plating (1)

J. H. Weaver, Plating 51, 1165 (1964).

Proc. Soc. Photo-Opt. Instrum. Eng. (1)

R. C. Bastien, R. R. Austin, T. P. Pottenger, Proc. Soc. Photo-Opt. Instrum. Eng. 140, 140 (1978).

Rev. Sci. Instrum. (1)

C. Feldman, M. Hacskaylo, Rev. Sci. Instrum. 33, 1459 (1962).

Sol. Energy Mater. (1)

H. G. Craighead, R. Bartynski, R. A. Buhrman, L. Wojcik, A. J. Sievers, Sol. Energy Mater. 1, 105 (1979).

Thin Solid Films (3)

A. Hjortsberg, Thin Solid Films 69, L15 (1980);Appl. Opt. 20, 1254 (1981).

I. H. Pratt, Thin Solid Films 3, R23 (1969).

C. J. Dell'Oca, Thin Solid Films 26, 371 (1975).

Z. Naturforsch. (1)

H. G. Häfele, Z. Naturforsch. 18a331 (1963).

Z. Physik (1)

M. Hennig, Z. Physik 144, 296 (1956).

Zh. Prikl. Khim. (1)

V. T. Belov, E. A. Kopylova, V. I. Antonyuk, Zh. Prikl. Khim. 52, 2663 (1979) [J. Appl. Chem. USSR 52, 2523 (1979)].

Other (8)

See, for example, O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).

G. Hass, J. B. Ramsey, J. J. Triolo, H. T. Albright, in Thermophysics and Temperature Control of Spacecraft and Entry Vehicles, G. B. Heller, Ed. (Academic, New York, 1966), p. 47.The data are reproduced by G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

W. Ch. van Geel, B. J. J. Schelen, Philips Res. Rep.12, 240 (1957).

C. G. Granqvist, A. Hjortsberg, J. Appl. Phys., to be published.

R. E. Hahn, B. O. Seraphin, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 1.

B. O. Seraphin, in Solar Energy Conversion: Solid State Physics Aspects, B. O. Seraphin, Ed. (Springer, Heidelberg, 1979), p. 5.

G. C. Wood, in Oxides and Oxide Films, J. W. Diggle, Ed. (Marcel Dekker, New York, 1973), Vol. 2, p. 167.

S. Wernick, R. Pinner, The Surface Treatment and Finishing of Aluminium (Robert Draper, Teddington, England), Vol. 2, p. 818.

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Figures (4)

Fig. 1
Fig. 1

Wavelength-dependent refractive index of Al2O3. Solid curve denotes the present data, dashed curves are reproduced from Ref. 16, dash–dot curve is taken from Ref. 25 (ordinary ray, 24°C), and dotted curves pertain to barrier-type anodic films prepared in ammonium citrate (lower curve, from Ref. 26) and in ammonium borate (upper curve, from Ref. 27).

Fig. 2
Fig. 2

Spectral transmittance of two Al2O3 layers with different thicknesses t deposited onto substrates KRS-5 and crystalline Si.

Fig. 3
Fig. 3

Spectral reflectance of Al2O3 + Al layers with the configuration sketched in the inset. The main figure depicts data for Al2O3 films with different thicknesses t, incidence angles θ, and polarizations s and p. The dotted curve is replotted from Ref. 34.

Fig. 4
Fig. 4

Real and imaginary parts of the dielectric function for Al2O3 films. Solid curves denote our determination, which is accurate to within the shaded areas. Filled circles in the upper part show results for 1 obtained from a Kramers-Kronig (KK) analysis of the measured 2 data together with the extrapolation indicated by the dotted line in the lower part of the figure. Dash–dot curves are taken from Harris (Refs. 9 and 10). His error bars become so large for the lowest frequencies that it is doubtful whether the data are meaningful below ∼250 cm−1.

Equations (1)

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1 ( ω ) = C + 2 π 0 ω 2 ( ω ) ω 2 ω 2 d ω .

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