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References

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  1. H. R. Kaufman, J. Vac. Sci. Technol. 15, 272 (1978).
    [CrossRef]
  2. G. K. Wehner, D. J. Hajicek, J. Appl. Phys. 42, 1145 (1971).
    [CrossRef]
  3. J. E. Houston, R. D. Bland, J. Appl. Phys. 44, 2504 (1973).
    [CrossRef]

1978

H. R. Kaufman, J. Vac. Sci. Technol. 15, 272 (1978).
[CrossRef]

1973

J. E. Houston, R. D. Bland, J. Appl. Phys. 44, 2504 (1973).
[CrossRef]

1971

G. K. Wehner, D. J. Hajicek, J. Appl. Phys. 42, 1145 (1971).
[CrossRef]

Bland, R. D.

J. E. Houston, R. D. Bland, J. Appl. Phys. 44, 2504 (1973).
[CrossRef]

Hajicek, D. J.

G. K. Wehner, D. J. Hajicek, J. Appl. Phys. 42, 1145 (1971).
[CrossRef]

Houston, J. E.

J. E. Houston, R. D. Bland, J. Appl. Phys. 44, 2504 (1973).
[CrossRef]

Kaufman, H. R.

H. R. Kaufman, J. Vac. Sci. Technol. 15, 272 (1978).
[CrossRef]

Wehner, G. K.

G. K. Wehner, D. J. Hajicek, J. Appl. Phys. 42, 1145 (1971).
[CrossRef]

J. Appl. Phys.

G. K. Wehner, D. J. Hajicek, J. Appl. Phys. 42, 1145 (1971).
[CrossRef]

J. E. Houston, R. D. Bland, J. Appl. Phys. 44, 2504 (1973).
[CrossRef]

J. Vac. Sci. Technol.

H. R. Kaufman, J. Vac. Sci. Technol. 15, 272 (1978).
[CrossRef]

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Figures (4)

Fig. 1
Fig. 1

Experimental arrangement of ion beam mill, optical monitor, and optical sample.

Fig. 2
Fig. 2

Reflection vs wavelength characteristics at 45° angle of incidence of two three-layer antireflection coatings.

Fig. 3
Fig. 3

Reflection vs time characteristics of two coatings being ion beam milled; current density at film surface is 0.25 mA/cm2. (a) Film 1 is centered at ∼λ0 = 525 nm, and (b) Film 2 is centered at ∼λ0 = 485 nm.

Fig. 4
Fig. 4

Computer calculated reflection characteristics for a three-layer (quarter-half-quarter wave) film structure vs physical thickness; wavelength of the optical monitor was used as a parameter. The center wavelength of the film structure was ∼λ0 = 525 nm.

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