Abstract

The dielectric function εε1 + 2 of evaporated SiO films is reported for the wavelength region from 8 to 33 μm. The data are based on spectrophotometric measurements of reflectance and transmittance for films evaporated onto KRS-5 and crystalline Si and on reflectance measurements on films evaporated onto opaque Al layers. The consistency in the results for ε and ε2 is verified by the Kramers-Kronig analysis.

© 1980 Optical Society of America

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References

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  1. G. Hass, J. Am. Ceram. Soc. 33, 353 (1950).
    [CrossRef]
  2. G. Hass, C. D Salzberg, J. Opt. Soc. Am. 44, 181 (1954).
    [CrossRef]
  3. G. Hass, J. Opt. Soc. Am. 45, 945 (1955).
    [CrossRef]
  4. G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.
  5. C. G. Granqvist, A. Hjortsberg, Appl. Phys. Lett. 36, 139 (1980).
    [CrossRef]
  6. F. Trombe, Rev. Gen. Therm. 6, 1285 (1967).
  7. S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
    [CrossRef]
  8. H. R. Philipp, J. Phys. Chem. Solids 32, 1935 (1971);J. Non-Cryst. Solids 8–10, 627 (1972).
    [CrossRef]
  9. D. Escolar, J. Morcillo, “Optical Constants of SiO in the IR Region,” Final Technical Report, contract DAJA 37-73-C-0468 (European Research Office, U.S. Army, London, July1974).
  10. Silicon monoxide EL chips manufactured by E. Merck AG, Darmstadt, Germany.
  11. L. Brewer, R. K. Edwards, J. Phys. Chem. 48, 351 (1954);L. Brewer, F. J. Greene, J. Phys. Chem. Solids 2, 286 (1957).
    [CrossRef]
  12. Thallium bromide-iodide; optical properties are given in American Institute of Physics Handbook, D. E. Gray, Ed. (McGraw-Hill, New York, 1972), p. 6–49.
  13. K. Hübner, Phys. Status Solidi A: 42, 501 (1977);Phys. Status Solidi A: 52, 541 (1979).
    [CrossRef]
  14. D. E. Aspnes, J. B. Theeten, J. Appl. Phys. 50, 4928 (1979).
    [CrossRef]
  15. E. Cremer, Th. Kraus, E. Ritter, Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) 62, 939 (1958).
  16. E. Ritter, Opt. Acta 9, 197 (1962).
    [CrossRef]
  17. I. R. Rawlings, J. Phys. D: 1, 733 (1968).
    [CrossRef]
  18. R. P. Howson, A. Taylor, Thin Solid Films 9, 109 (1971).
    [CrossRef]
  19. L. E. Howarth, W. G. Spitzer, J. Am. Ceram. Soc. 44, 26 (1961).
    [CrossRef]
  20. H. Garski, Z. Naturforsch. Teil A: 19, 1219 (1964).
  21. Y. Iguchi, Sci. Light Tokyo 13, 37 (1964).
  22. W. A. Pliskin, H. S. Lehman, J. Electrochem. Soc. 112, 1013 (1965);W. A. Pliskin, Thin Solid Films 2, 1 (1968).
    [CrossRef]
  23. C. Villemant, F. Kover, Rev. Phys. Appl. 1, 90 (1966).
    [CrossRef]
  24. A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
    [CrossRef]
  25. L. Popova, B. Jordanov, Izv. Otd. Khim. Nauki Bulg. Akad. Nauk 5, 121 (1972).
  26. G. Hass, J. B. Ramsey, J. B. Heaney, J. J. Triolo, Appl. Opt. 8, 275 (1969);A. P. Bradford, G. Hass, J. B. Heaney, J. J. Triolo, Appl. Opt. 9, 339 (1970).
    [CrossRef] [PubMed]
  27. See, for example, O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).
  28. P.-O. Nilsson, Appl. Opt. 7, 435 (1968).
    [CrossRef] [PubMed]
  29. A. Hjortsberg, to be published.
  30. J. T. Cox, G. Hass, W. R. Hunter, Appl. Opt. 14, 1247 (1975).
    [CrossRef] [PubMed]
  31. V. S. Vinogradov, Fiz. Tverd. Tela Leningrad 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].
  32. E. Schlömann, Phys. Rev. A: 135, 413 (1964).
  33. D. B. York, J. Electrochem. Soc. 110, 271 (1963).
    [CrossRef]
  34. H. Hirose, Y. Wada, Jpn. J. Appl. Phys. 3, 179 (1964).
    [CrossRef]
  35. R. J. Joyce, H. F. Sterling, J. H. Alexander, Thin Solid Films 1, 481 (1967/68).
    [CrossRef]

1980 (1)

C. G. Granqvist, A. Hjortsberg, Appl. Phys. Lett. 36, 139 (1980).
[CrossRef]

1979 (1)

D. E. Aspnes, J. B. Theeten, J. Appl. Phys. 50, 4928 (1979).
[CrossRef]

1977 (1)

K. Hübner, Phys. Status Solidi A: 42, 501 (1977);Phys. Status Solidi A: 52, 541 (1979).
[CrossRef]

1975 (2)

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

J. T. Cox, G. Hass, W. R. Hunter, Appl. Opt. 14, 1247 (1975).
[CrossRef] [PubMed]

1972 (1)

L. Popova, B. Jordanov, Izv. Otd. Khim. Nauki Bulg. Akad. Nauk 5, 121 (1972).

1971 (3)

H. R. Philipp, J. Phys. Chem. Solids 32, 1935 (1971);J. Non-Cryst. Solids 8–10, 627 (1972).
[CrossRef]

R. P. Howson, A. Taylor, Thin Solid Films 9, 109 (1971).
[CrossRef]

A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
[CrossRef]

1969 (1)

1968 (2)

1967 (1)

F. Trombe, Rev. Gen. Therm. 6, 1285 (1967).

1966 (1)

C. Villemant, F. Kover, Rev. Phys. Appl. 1, 90 (1966).
[CrossRef]

1965 (1)

W. A. Pliskin, H. S. Lehman, J. Electrochem. Soc. 112, 1013 (1965);W. A. Pliskin, Thin Solid Films 2, 1 (1968).
[CrossRef]

1964 (4)

H. Garski, Z. Naturforsch. Teil A: 19, 1219 (1964).

Y. Iguchi, Sci. Light Tokyo 13, 37 (1964).

H. Hirose, Y. Wada, Jpn. J. Appl. Phys. 3, 179 (1964).
[CrossRef]

E. Schlömann, Phys. Rev. A: 135, 413 (1964).

1963 (1)

D. B. York, J. Electrochem. Soc. 110, 271 (1963).
[CrossRef]

1962 (1)

E. Ritter, Opt. Acta 9, 197 (1962).
[CrossRef]

1961 (1)

L. E. Howarth, W. G. Spitzer, J. Am. Ceram. Soc. 44, 26 (1961).
[CrossRef]

1960 (1)

V. S. Vinogradov, Fiz. Tverd. Tela Leningrad 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].

1958 (1)

E. Cremer, Th. Kraus, E. Ritter, Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) 62, 939 (1958).

1955 (1)

1954 (2)

G. Hass, C. D Salzberg, J. Opt. Soc. Am. 44, 181 (1954).
[CrossRef]

L. Brewer, R. K. Edwards, J. Phys. Chem. 48, 351 (1954);L. Brewer, F. J. Greene, J. Phys. Chem. Solids 2, 286 (1957).
[CrossRef]

1950 (1)

G. Hass, J. Am. Ceram. Soc. 33, 353 (1950).
[CrossRef]

Alexander, J. H.

R. J. Joyce, H. F. Sterling, J. H. Alexander, Thin Solid Films 1, 481 (1967/68).
[CrossRef]

Aspnes, D. E.

D. E. Aspnes, J. B. Theeten, J. Appl. Phys. 50, 4928 (1979).
[CrossRef]

Brewer, L.

L. Brewer, R. K. Edwards, J. Phys. Chem. 48, 351 (1954);L. Brewer, F. J. Greene, J. Phys. Chem. Solids 2, 286 (1957).
[CrossRef]

Cachard, A.

A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
[CrossRef]

Catalanotti, S.

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Cox, J. T.

Cremer, E.

E. Cremer, Th. Kraus, E. Ritter, Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) 62, 939 (1958).

Cuomo, V.

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Dupuy, C. H. S.

A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
[CrossRef]

Edwards, R. K.

L. Brewer, R. K. Edwards, J. Phys. Chem. 48, 351 (1954);L. Brewer, F. J. Greene, J. Phys. Chem. Solids 2, 286 (1957).
[CrossRef]

Escolar, D.

D. Escolar, J. Morcillo, “Optical Constants of SiO in the IR Region,” Final Technical Report, contract DAJA 37-73-C-0468 (European Research Office, U.S. Army, London, July1974).

Garski, H.

H. Garski, Z. Naturforsch. Teil A: 19, 1219 (1964).

Granqvist, C. G.

C. G. Granqvist, A. Hjortsberg, Appl. Phys. Lett. 36, 139 (1980).
[CrossRef]

Hass, G.

Heaney, J. B.

Heavens, O. S.

See, for example, O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).

Hirose, H.

H. Hirose, Y. Wada, Jpn. J. Appl. Phys. 3, 179 (1964).
[CrossRef]

Hjortsberg, A.

C. G. Granqvist, A. Hjortsberg, Appl. Phys. Lett. 36, 139 (1980).
[CrossRef]

A. Hjortsberg, to be published.

Howarth, L. E.

L. E. Howarth, W. G. Spitzer, J. Am. Ceram. Soc. 44, 26 (1961).
[CrossRef]

Howson, R. P.

R. P. Howson, A. Taylor, Thin Solid Films 9, 109 (1971).
[CrossRef]

Hübner, K.

K. Hübner, Phys. Status Solidi A: 42, 501 (1977);Phys. Status Solidi A: 52, 541 (1979).
[CrossRef]

Hunter, W. R.

J. T. Cox, G. Hass, W. R. Hunter, Appl. Opt. 14, 1247 (1975).
[CrossRef] [PubMed]

G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

Iguchi, Y.

Y. Iguchi, Sci. Light Tokyo 13, 37 (1964).

Jordanov, B.

L. Popova, B. Jordanov, Izv. Otd. Khim. Nauki Bulg. Akad. Nauk 5, 121 (1972).

Joyce, R. J.

R. J. Joyce, H. F. Sterling, J. H. Alexander, Thin Solid Films 1, 481 (1967/68).
[CrossRef]

Kover, F.

C. Villemant, F. Kover, Rev. Phys. Appl. 1, 90 (1966).
[CrossRef]

Kraus, Th.

E. Cremer, Th. Kraus, E. Ritter, Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) 62, 939 (1958).

Lehman, H. S.

W. A. Pliskin, H. S. Lehman, J. Electrochem. Soc. 112, 1013 (1965);W. A. Pliskin, Thin Solid Films 2, 1 (1968).
[CrossRef]

Merck AG, E.

Silicon monoxide EL chips manufactured by E. Merck AG, Darmstadt, Germany.

Morcillo, J.

D. Escolar, J. Morcillo, “Optical Constants of SiO in the IR Region,” Final Technical Report, contract DAJA 37-73-C-0468 (European Research Office, U.S. Army, London, July1974).

Nilsson, P.-O.

Philipp, H. R.

H. R. Philipp, J. Phys. Chem. Solids 32, 1935 (1971);J. Non-Cryst. Solids 8–10, 627 (1972).
[CrossRef]

Piro, G.

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Pivot, J.

A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
[CrossRef]

Pliskin, W. A.

W. A. Pliskin, H. S. Lehman, J. Electrochem. Soc. 112, 1013 (1965);W. A. Pliskin, Thin Solid Films 2, 1 (1968).
[CrossRef]

Popova, L.

L. Popova, B. Jordanov, Izv. Otd. Khim. Nauki Bulg. Akad. Nauk 5, 121 (1972).

Ramsey, J. B.

Rawlings, I. R.

I. R. Rawlings, J. Phys. D: 1, 733 (1968).
[CrossRef]

Ritter, E.

E. Ritter, Opt. Acta 9, 197 (1962).
[CrossRef]

E. Cremer, Th. Kraus, E. Ritter, Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) 62, 939 (1958).

Roger, J. A.

A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
[CrossRef]

Ruggi, D.

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Salzberg, C. D

Schlömann, E.

E. Schlömann, Phys. Rev. A: 135, 413 (1964).

Silvestrini, V.

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Spitzer, W. G.

L. E. Howarth, W. G. Spitzer, J. Am. Ceram. Soc. 44, 26 (1961).
[CrossRef]

Sterling, H. F.

R. J. Joyce, H. F. Sterling, J. H. Alexander, Thin Solid Films 1, 481 (1967/68).
[CrossRef]

Taylor, A.

R. P. Howson, A. Taylor, Thin Solid Films 9, 109 (1971).
[CrossRef]

Theeten, J. B.

D. E. Aspnes, J. B. Theeten, J. Appl. Phys. 50, 4928 (1979).
[CrossRef]

Triolo, J. J.

Troise, G.

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Trombe, F.

F. Trombe, Rev. Gen. Therm. 6, 1285 (1967).

Villemant, C.

C. Villemant, F. Kover, Rev. Phys. Appl. 1, 90 (1966).
[CrossRef]

Vinogradov, V. S.

V. S. Vinogradov, Fiz. Tverd. Tela Leningrad 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].

Wada, Y.

H. Hirose, Y. Wada, Jpn. J. Appl. Phys. 3, 179 (1964).
[CrossRef]

York, D. B.

D. B. York, J. Electrochem. Soc. 110, 271 (1963).
[CrossRef]

Appl. Opt. (3)

Appl. Phys. Lett. (1)

C. G. Granqvist, A. Hjortsberg, Appl. Phys. Lett. 36, 139 (1980).
[CrossRef]

Fiz. Tverd. Tela Leningrad (1)

V. S. Vinogradov, Fiz. Tverd. Tela Leningrad 2, 2622 (1960) [Sov. Phys. Solid State 2, 2338 (1961)].

Izv. Otd. Khim. Nauki Bulg. Akad. Nauk (1)

L. Popova, B. Jordanov, Izv. Otd. Khim. Nauki Bulg. Akad. Nauk 5, 121 (1972).

J. Am. Ceram. Soc. (2)

G. Hass, J. Am. Ceram. Soc. 33, 353 (1950).
[CrossRef]

L. E. Howarth, W. G. Spitzer, J. Am. Ceram. Soc. 44, 26 (1961).
[CrossRef]

J. Appl. Phys. (1)

D. E. Aspnes, J. B. Theeten, J. Appl. Phys. 50, 4928 (1979).
[CrossRef]

J. Electrochem. Soc. (2)

W. A. Pliskin, H. S. Lehman, J. Electrochem. Soc. 112, 1013 (1965);W. A. Pliskin, Thin Solid Films 2, 1 (1968).
[CrossRef]

D. B. York, J. Electrochem. Soc. 110, 271 (1963).
[CrossRef]

J. Opt. Soc. Am. (2)

J. Phys. Chem. (1)

L. Brewer, R. K. Edwards, J. Phys. Chem. 48, 351 (1954);L. Brewer, F. J. Greene, J. Phys. Chem. Solids 2, 286 (1957).
[CrossRef]

J. Phys. Chem. Solids (1)

H. R. Philipp, J. Phys. Chem. Solids 32, 1935 (1971);J. Non-Cryst. Solids 8–10, 627 (1972).
[CrossRef]

J. Phys. D: (1)

I. R. Rawlings, J. Phys. D: 1, 733 (1968).
[CrossRef]

Jpn. J. Appl. Phys. (1)

H. Hirose, Y. Wada, Jpn. J. Appl. Phys. 3, 179 (1964).
[CrossRef]

Opt. Acta (1)

E. Ritter, Opt. Acta 9, 197 (1962).
[CrossRef]

Phys. Rev. A: (1)

E. Schlömann, Phys. Rev. A: 135, 413 (1964).

Phys. Status Solidi (1)

A. Cachard, J. A. Roger, J. Pivot, C. H. S. Dupuy, Phys. Status Solidi 5, 637 (1971).
[CrossRef]

Phys. Status Solidi A: (1)

K. Hübner, Phys. Status Solidi A: 42, 501 (1977);Phys. Status Solidi A: 52, 541 (1979).
[CrossRef]

Rev. Gen. Therm. (1)

F. Trombe, Rev. Gen. Therm. 6, 1285 (1967).

Rev. Phys. Appl. (1)

C. Villemant, F. Kover, Rev. Phys. Appl. 1, 90 (1966).
[CrossRef]

Sci. Light Tokyo (1)

Y. Iguchi, Sci. Light Tokyo 13, 37 (1964).

Sol. Energy (1)

S. Catalanotti, V. Cuomo, G. Piro, D. Ruggi, V. Silvestrini, G. Troise, Sol. Energy 17, 83 (1975).
[CrossRef]

Thin Solid Films (2)

R. P. Howson, A. Taylor, Thin Solid Films 9, 109 (1971).
[CrossRef]

R. J. Joyce, H. F. Sterling, J. H. Alexander, Thin Solid Films 1, 481 (1967/68).
[CrossRef]

Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) (1)

E. Cremer, Th. Kraus, E. Ritter, Z. Elektrochem. (Ber. Bunsenges. Phys. Chem.) 62, 939 (1958).

Z. Naturforsch. Teil A: (1)

H. Garski, Z. Naturforsch. Teil A: 19, 1219 (1964).

Other (6)

D. Escolar, J. Morcillo, “Optical Constants of SiO in the IR Region,” Final Technical Report, contract DAJA 37-73-C-0468 (European Research Office, U.S. Army, London, July1974).

Silicon monoxide EL chips manufactured by E. Merck AG, Darmstadt, Germany.

G. Hass, W. R. Hunter, in Physics of Thin Films, G. Hass, M. H. Francombe, Eds. (Academic, New York, 1978), Vol. 10, p. 71.

Thallium bromide-iodide; optical properties are given in American Institute of Physics Handbook, D. E. Gray, Ed. (McGraw-Hill, New York, 1972), p. 6–49.

A. Hjortsberg, to be published.

See, for example, O. S. Heavens, Optical Properties of Thin Solid Films (Dover, New York, 1965).

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Figures (3)

Fig. 1
Fig. 1

Absorption coefficient vs wavelength for films of noncrystalline SiOx(0 ≤ x ≤ 2). Solid curves are reproduced from Philipp (Fig. 3 of Ref. 8). Circles and triangles were obtained for our films with a thickness of 1.0 and 1.2 μm, respectively, evaporated onto glass substrates. Two curves are shown for SiOx(x ∼ 1.5) since these films, which were produced by slow evaporation of silicon monoxide in the presence of some oxygen, do not have an exactly known stoichiometry.

Fig. 2
Fig. 2

Spectral infrared reflectance (R) and transmittance (T) for evaporated SiO films Two sample configurations were used, as sketched in the insets. The incidence angle for the reflectance measurements was 15°.

Fig. 3
Fig. 3

Real and imaginary parts of the dielectric function for evaporated SiO films. Results from Hass and Salzberg2 were obtained by use of the tabulated optical constants in Ref. 30. Kramers-Kronig data for ε1 were derived by assuming a linear variation of ε2 with frequency at low frequencies.

Equations (1)

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ɛ 1 ( ω ) = c + 2 π 0 ω ɛ 2 ( ω ) ω 2 ω 2 d ω ,

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