Abstract

A detailed experimental and theoretical study of narrow ridge waveguides in glass films formed by ion-etching of patterns in photoresist has been carried out. Because the resultant waveguide profiles are trapezoidal a numerical approach, the finite-element method, has been used to compute theoretical dispersion curves. Experimental dispersion curves were obtained from measurements of output m-lines. Agreement between experiment and theory varies from moderately good to excellent over the range of waveguide profiles studied.

© 1978 Optical Society of America

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