Abstract

The properties of the Shipley AZ-1350B positive photoresist used with the Shipley AZ-303A developer were investigated. It was found that the use of AZ-303A developer results in a significant improvement of the sensitivity and the linearity of the photoresist. The unexposed etch rate of the photoresist was 35 Å ± 5 Å/sec. Gratings of high efficiency have been successfully fabricated using the above combination of photoresist and developer.

© 1977 Optical Society of America

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References

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    [CrossRef]

1977 (1)

A. C. Livanos, A. Katzir, A. Yariv, Opt. Commun. 20, 179 (1977).
[CrossRef]

1976 (2)

1975 (1)

1974 (1)

1973 (1)

1972 (1)

1971 (1)

F. J. Loprest, E. A. Fitzgerald, Photogr. Sci. Eng. 15, 260 (1971).

1968 (1)

M. S. Htoo, Photogr. Sci. Eng. 12, 169 (1968).

Austin, S.

Bartolini, R. A.

Fitzgerald, E. A.

F. J. Loprest, E. A. Fitzgerald, Photogr. Sci. Eng. 15, 260 (1971).

Garmire, E.

Garvin, H. L.

Htoo, M. S.

M. S. Htoo, Photogr. Sci. Eng. 12, 169 (1968).

Katzir, A.

A. C. Livanos, A. Katzir, A. Yariv, Opt. Commun. 20, 179 (1977).
[CrossRef]

Livanos, A. C.

A. C. Livanos, A. Katzir, A. Yariv, Opt. Commun. 20, 179 (1977).
[CrossRef]

Loprest, F. J.

F. J. Loprest, E. A. Fitzgerald, Photogr. Sci. Eng. 15, 260 (1971).

Norman, S. L.

Singh, M. P.

Somekh, S.

Stoll, H.

Stone, F. T.

Yariv, A.

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