A novel technique for the fabrication of binary-phase computer-generated
reflection holograms is described. By use of integrated circuit technology, the
holographic pattern is etched into a silicon wafer and then aluminum coated to
make a reflection hologram. Because these holograms reflect virtually all the
incident radiation, they may find application in machining with high-power
lasers. A number of possible modifications of the hologram fabrication procedure
© 1977 Optical Society of America
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